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    Apparatus for transferring a substrate in a lithography system
    83.
    发明授权
    Apparatus for transferring a substrate in a lithography system 有权
    用于在光刻系统中传送衬底的装置

    公开(公告)号：US09575418B2

    公开(公告)日：2017-02-21

    申请号：US14850997

    申请日：2015-09-11

    Applicant: Mapper Lithography IP B.V.

    Inventor： Vincent Sylvester Kuiper ,  Erwin Slot ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer ,  Hendrik Jan De Jong

    IPC: G03B27/60 ,  G03B27/58 ,  G03F7/20 ,  H01L21/67 ,  H01L21/677

    CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

    Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

    Abstract translation: 一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。 该装置包括用于将目标物输入和离开真空室的装载锁定室。 所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及 用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。

    Method and apparatus for predicting a growth rate of deposited contaminants
    84.
    发明授权
    Method and apparatus for predicting a growth rate of deposited contaminants 有权
    预测沉积污染物生长速率的方法和装置

    公开(公告)号：US09506881B2

    公开(公告)日：2016-11-29

    申请号：US14345656

    申请日：2012-09-19

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Marc Smits

    IPC: G01N23/22 ,  G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  G01N33/00

    CPC classification number: G01N23/22 ,  B82Y10/00 ,  B82Y40/00 ,  G01N33/0004 ,  G03F7/70608 ,  G03F7/70916 ,  H01J37/304 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/31796

    Abstract: A lithography system (10) comprising a radiation projection system (20) for projecting radiation onto a substrate, a substrate transport system (30) for loading and positioning the substrate to be processed in the path of the projected radiation, a control system (40) for controlling the substrate transport system to move the substrate, and a resist characterization system (50) arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system (50) may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.

    Abstract translation: 一种光刻系统（10），包括用于将辐射投射到基板上的辐射投影系统（20），用于在投影辐射的路径中加载和定位待处理基板的基板输送系统（30），控制系统 ），用于控制衬底传输系统以移动衬底;以及抗蚀剂表征系统（50），其布置成用于确定特定类型的抗蚀剂是否适于通过光刻系统内的辐射曝光。 抗蚀剂表征系统（50）可以布置成用一个或多个辐射束将抗蚀剂暴露在衬底的表面上，测量从抗蚀剂发射的分子片段的质量分布，从而预测基于沉积的分子片段的生长速率 的增长率模型和测量的质量分布，并将预期增长率与预定的阈值增长率进行比较。

    Modulation device and power supply arrangement
    87.
    发明授权
    Modulation device and power supply arrangement 有权
    调制装置和电源装置

    公开(公告)号：US09455122B2

    公开(公告)日：2016-09-27

    申请号：US14400561

    申请日：2013-05-08

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Teunis Van De Peut ,  Hendrik Den Boer

    IPC: H01J37/317 ,  H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/0437 ,  H01J2237/2485 ,  H01J2237/31754 ,  H01J2237/31774

    Abstract: The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).

    Abstract translation: 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，​​子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。

    Network architecture and protocol for cluster of lithography machines
    88.
    发明申请
    Network architecture and protocol for cluster of lithography machines 有权
    光刻机集群的网络架构和协议

    公开(公告)号：US20150309424A1

    公开(公告)日：2015-10-29

    申请号：US14738962

    申请日：2015-06-15

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER

    IPC: G03F7/20

    CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

    Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.

    Abstract translation: 具有一个或多个光刻元件的光刻系统每个光刻元件具有多个光刻子系统。 光刻系统还具有形成多个光刻子系统之间的控制网络路径的控制网络和用于通信控制信息的至少一个元件控制单元。 光刻系统被布置为：向至少一个元件控制单元发出控制信息，以控制用于一个或多个晶片曝光的一个或多个光刻子系统的操作; 向元件控制单元发出处理程序。 过程程序具有一组预定义的命令和相关参数。 元件控制单元布置成将处理程序的命令发送到光刻子系统以由光刻子系统执行，而不管传送到光刻子系统的先前命令的执行状态如何。

    Charged particle lithography system with sensor assembly
    90.
    发明授权
    Charged particle lithography system with sensor assembly 有权
    带传感器组件的带电粒子光刻系统

    公开(公告)号：US09153415B2

    公开(公告)日：2015-10-06

    申请号：US14581728

    申请日：2014-12-23

    Applicant: Mapper Lithography IP B.V.

    Inventor： Paul IJmert Scheffers

    IPC: G21K5/10 ,  G21K5/00 ,  G21K4/00 ,  H01J37/22 ,  H01J37/20

    CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

    Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

    Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

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