公开(公告)号：US20050263712A1

公开(公告)日：2005-12-01

申请号：US11174916

申请日：2005-07-01

Applicant: Sang Choi ,  Dae Kim

Inventor： Sang Choi ,  Dae Kim

IPC: G02B3/00 ,  H01J1/02 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J3/26

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

Abstract translation: 本发明提供一种用于微柱电子束装置的电子束透镜及其制造方法。 使用感光性玻璃基板作为基底隔离基板，通过电镀法生长金属薄膜。 在种子金属层上形成形成为孔的抗蚀剂图案并镀覆薄金属膜之后，通过剥离法形成电子束通过的孔。

公开(公告)号：US06965153B1

公开(公告)日：2005-11-15

申请号：US09819737

申请日：2001-03-29

Applicant: Haruhito Ono ,  Masato Muraki

Inventor： Haruhito Ono ,  Masato Muraki

IPC: G03F7/20 ,  G01N23/00 ,  G21G5/00 ,  G21K5/10 ,  H01J9/14 ,  H01J9/18 ,  H01J37/04 ,  H01J37/12 ,  H01J37/24 ,  H01J37/30 ,  H01J37/305 ,  H01L21/027 ,  H01L31/00

CPC classification number: H01J37/12 ,  G01N23/00 ,  H01J9/14 ,  H01J9/18 ,  H01J37/3007 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1534 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: This invention relates to an electrooptic system array having a plurality of electron lenses. The electrooptic system array includes upper, middle, and lower electrodes arranged along the paths of a plurality of charged-particle beams, the upper, middle, and lower electrodes having pluralities of apertures on the paths of the plurality of charged-particle beams, an upper shield electrode which is interposed between the upper and middle electrodes and has a plurality of shields corresponding to the respective paths of the charged-particle beams, and a lower shield electrode which is interposed between the lower and middle electrodes and has a plurality of shields corresponding to the respective paths of the charged-particle beams.

Abstract translation: 本发明涉及具有多个电子透镜的电光系统阵列。 电光系统阵列包括沿着多个带电粒子束的路径布置的上电极，中电极和下电极，上电极，中电极和下电极在多个带电粒子束的路径上具有多个孔， 上屏蔽电极，其插入在上电极和中间电极之间，并且具有对应于带电粒子束的各个路径的多个屏蔽，以及插入在下电极和中间电极之间的下屏蔽电极，并且具有多个屏蔽 对应于带电粒子束的相应路径。

公开(公告)号：US20050087696A1

公开(公告)日：2005-04-28

申请号：US10817779

申请日：2004-04-02

Applicant: Sang Choi ,  Dae Kim

Inventor： Sang Choi ,  Dae Kim

IPC: G02B3/00 ,  H01J1/02 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J3/14 ,  G21K1/08

CPC classification number: H01J9/02 ,  H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31754 ,  Y10T29/49117

Abstract: Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

公开(公告)号：US06872951B2

公开(公告)日：2005-03-29

申请号：US09819672

申请日：2001-03-29

Applicant: Takayuki Yagi ,  Haruhito Ono ,  Yasuhiro Shimada

Inventor： Takayuki Yagi ,  Haruhito Ono ,  Yasuhiro Shimada

IPC: G03F7/20 ,  G21K1/087 ,  H01J37/04 ,  H01J37/12 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/087 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/1205

Abstract: An electron optical system array has a plurality of electron lenses, the system array having at least two electrodes structures which respectively have membranes and are arranged along an optical axis, each of the membranes having a plurality of apertures through which charged-particle beams pass. There is also a spacer which is interposed between the facing membranes and adjacent to the aperture and which determines a gap between the facing membranes.

Abstract translation: 电子光学系统阵列具有多个电子透镜，所述系统阵列具有分别具有膜并且沿着光轴布置的至少两个电极结构，每个膜具有多个孔，带电粒子束通过该孔。 还有一个间隔件插在面对的膜之间并与孔相邻并且确定面对膜之间的间隙。

公开(公告)号：US20030010934A1

公开(公告)日：2003-01-16

申请号：US09414004

申请日：1999-10-07

Inventor： VICTOR KATSAP ,  PIETER KRUIT ,  DANIEL MOONEN ,  WARREN KAZMIR WASKIEWICZ

IPC: H01J003/14

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical nullfly's eyenull lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US06333508B1

公开(公告)日：2001-12-25

申请号：US09580530

申请日：2000-05-30

Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

IPC: H01J37302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US20010028043A1

公开(公告)日：2001-10-11

申请号：US09824875

申请日：2001-04-04

Inventor： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

IPC: G21G005/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/1205

Abstract: An electron beam exposure apparatus for exposing a wafer of the present invention includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and an illumination switching unit operable to switch whether or not electron beams are to be incident on the wafer, for each electron beam independently of other electron beams.

Abstract translation: 本发明的用于曝光晶片的电子束曝光装置包括：多轴电子透镜，可操作以彼此独立地会聚多个电子束; 以及照明切换单元，其可操作以切换电子束是否要入射到晶片上，对于每个电子束，与其它电子束无关。

公开(公告)号：US06281508B1

公开(公告)日：2001-08-28

申请号：US09246573

申请日：1999-02-08

Applicant: Kim Y. Lee ,  Ho-Seob Kim ,  Stephen A. Rishton ,  Tai-Hon Philip Chang

Inventor： Kim Y. Lee ,  Ho-Seob Kim ,  Stephen A. Rishton ,  Tai-Hon Philip Chang

IPC: G21K108

CPC classification number: B82Y15/00 ,  H01J9/18 ,  H01J37/12 ,  H01J2237/1205

Abstract: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

Abstract translation: 用于对准和组装微透镜和微柱的方法和相关联的装置，其中使用诸如刚性纤维的对准结构来精确对准多个微透镜组件。 在微透镜部件中形成对准开口，并且当它们堆叠时，标准光纤穿过每个微透镜部件中的开口。 纤维为结构提供足够的刚度和稳定性，以精确地对准微透镜部件的孔，从而相对于传统的微透镜和微柱接合技术允许提高组装效率。

公开(公告)号：US11961697B2

公开(公告)日：2024-04-16

申请号：US18144131

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/15 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：US20230411110A1

公开(公告)日：2023-12-21

申请号：US18144131

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Xuedong LIU ,  Weiming REN ,  Zhong-wei CHEN

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.