公开(公告)号：US20110168886A1

公开(公告)日：2011-07-14

申请号：US13119689

申请日：2010-07-16

Applicant: Khashayar Shadman ,  Robert Haynes ,  Gabor D. Toth ,  Christopher Sears ,  Mehran Nasser Ghodsi

Inventor： Khashayar Shadman ,  Robert Haynes ,  Gabor D. Toth ,  Christopher Sears ,  Mehran Nasser Ghodsi

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J49/486 ,  H01J2237/0535 ,  H01J2237/2446 ,  H01J2237/24485

Abstract: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

Abstract translation: 一个实施例涉及一种带电粒子能量分析装置。 布置第一网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且第一电极被布置成使得第一空腔形成在第一网格的第二侧和第一电极之间。 布置第二网以接收第二侧上的带电粒子并将带电粒子传递到第一侧，并且第二电极被布置成使得在第二网格的第一侧和第二电极之间形成第二腔。 最后，设置第三网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且位置敏感带电粒子检测器布置成在带电粒子通过第三侧之后接收带电粒子 网格。

公开(公告)号：US07141791B2

公开(公告)日：2006-11-28

申请号：US10935834

申请日：2004-09-07

Applicant: Douglas K. Masnaghetti ,  Eric Munro ,  Gabor D. Toth ,  Jeffrey Keister

Inventor： Douglas K. Masnaghetti ,  Eric Munro ,  Gabor D. Toth ,  Jeffrey Keister

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/053 ,  H01J2237/15 ,  H01J2237/1536 ,  H01J2237/2446 ,  H01J2237/24485

Abstract: One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

Abstract translation: 公开的一个实施例涉及包括物镜，扫描偏转器，去扫描偏转器，能量滤波器漂移管和分段检测器的扫描电子束装置。 物镜可以是配置有高提取场的浸没透镜，以便保留从样本表面散射的电子的方位角鉴别。 去扫描偏转器可以用于补偿入射电子束的扫描。 能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

公开(公告)号：US08421030B2

公开(公告)日：2013-04-16

申请号：US13119689

申请日：2010-07-16

Applicant: Khashayar Shadman ,  Robert Haynes ,  Gabor D. Toth ,  Christopher Sears ,  Mehran Nasser Ghodsi

Inventor： Khashayar Shadman ,  Robert Haynes ,  Gabor D. Toth ,  Christopher Sears ,  Mehran Nasser Ghodsi

IPC: G01K1/08

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J49/486 ,  H01J2237/0535 ,  H01J2237/2446 ,  H01J2237/24485

Abstract: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

Abstract translation: 一个实施例涉及一种带电粒子能量分析装置。 布置第一网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且第一电极被布置成使得第一空腔形成在第一网格的第二侧和第一电极之间。 布置第二网以接收第二侧上的带电粒子并将带电粒子传递到第一侧，并且第二电极被布置成使得在第二网格的第一侧和第二电极之间形成第二腔。 最后，设置第三网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且位置敏感带电粒子检测器布置成在带电粒子通过第三侧之后接收带电粒子 网格。

公开(公告)号：US07247849B1

公开(公告)日：2007-07-24

申请号：US11366306

申请日：2006-03-01

Applicant: Gabor D. Toth ,  Varoujan Chakarian ,  Douglas K. Masnaghetti

Inventor： Gabor D. Toth ,  Varoujan Chakarian ,  Douglas K. Masnaghetti

IPC: H01J49/00

CPC classification number: H01J37/21 ,  G01R31/307 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24485 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.

Abstract translation: 所公开的一个实施例涉及一种用于电子图像的自动聚焦的方法。 确定EF截止电压。 为了补偿EF截止电压的变化，调整聚焦条件。 调整聚焦条件可以包括例如根据截止电压的变化来调整晶片偏置电压。 所公开的另一实施例涉及一种用于扫描电子成像设备中的电子图像的自动聚焦的方法。 改变第一图像平面中的一次电子束的聚焦条件，从而使通过第二图像平面中的孔的二次电子束的强度最大化。

公开(公告)号：US06828571B1

公开(公告)日：2004-12-07

申请号：US10699708

申请日：2003-11-03

Applicant: Mark A. McCord ,  Jan A. Lauber ,  Paul Petric ,  Ross W. Thompson ,  Jason Lim ,  Frank Y. H. Fan ,  Gabor D. Toth

Inventor： Mark A. McCord ,  Jan A. Lauber ,  Paul Petric ,  Ross W. Thompson ,  Jason Lim ,  Frank Y. H. Fan ,  Gabor D. Toth

IPC: H01L2100

CPC classification number: G01R31/307 ,  G01R31/2653 ,  H01J37/026 ,  H01J37/21 ,  H01J2237/0048 ,  H01J2237/20 ,  H01J2237/216 ,  H01J2237/2817

Abstract: One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the stage is controlled. A flood of electrons is directed to the area. The stage bias voltage is controlled such that the surface charge of the area reaches an equilibrium at the desired level. Another embodiment disclosed relates to a method of auto-focusing a main electron beam incident upon an imaging area of a substrate. A monitor electron beam is generated and directed towards a monitoring area of the substrate at a non-perpendicular incidence angle. An in-focus band in data collected from the monitor beam is detected. The focal length of an objective lens focusing the main beam is adjusted based upon a position of the in-focus band.

Abstract translation: 公开的一个实施例涉及一种将衬底上的区域的表面电荷设置到期望水平的方法。 将基板保持在平台上，并且控制施加到载物台的载物台偏置电压。 大量的电子被引导到该地区。 阶段偏置电压被控制使得该区域的表面电荷达到期望水平的平衡。 公开的另一实施例涉及一种自动聚焦入射到基板的成像区域上的主电子束的方法。 产生监视电子束并以非垂直入射角朝向基板的监视区域。 检测从监视器束收集的数据中的对焦带。 聚焦主光束的物镜的焦距基于对焦带的位置进行调整。

公开(公告)号：US06797955B1

公开(公告)日：2004-09-28

申请号：US10607224

申请日：2003-06-26

Applicant: David L. Adler ,  Luca Grella ,  Gabor D. Toth

Inventor： David L. Adler ,  Luca Grella ,  Gabor D. Toth

IPC: H01J37147

CPC classification number: H01J37/28 ,  H01J2237/281 ,  H01J2237/2815

Abstract: The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.

Abstract translation: 本公开涉及过滤的电子束检查和审查。 一个实施例涉及具有高纵横比特征的样本的过滤检查或检查。 有利地，能量和/或角度滤波改善了与样本上的高纵横比特征有关的信息。 另一个实施例涉及一种用于能量过滤的电子束检查的方法，其中通过确定第一高通能量滤波图像数据集和第二高通能量滤波图像之间的差异来生成带通能量滤波图像数据 数据集。

公开(公告)号：US07164139B1

公开(公告)日：2007-01-16

申请号：US11048378

申请日：2005-02-01

Applicant: Gabor D. Toth ,  Douglas K. Masnaghetti ,  Jeffrey Keister ,  Eric Munro

Inventor： Gabor D. Toth ,  Douglas K. Masnaghetti ,  Jeffrey Keister ,  Eric Munro

IPC: H01J1/50

CPC classification number: H01J37/05 ,  H01J2237/057

Abstract: One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及一种用于带电粒子束装置的维恩滤波器。 带电粒子束在第一方向通过维恩滤波器传输。 磁场产生机构被配置为在与第一方向垂直的第二方向上产生磁场，并且静电场产生机构被配置为在与第一和第二方向垂直的第三方向上产生静电场 。 场产生机构被进一步配置为具有沿着第一方向的磁场和静电场的位置之间的偏移。 所公开的另一实施例涉及一种Wien过滤器型装置，其中与静电力相比，磁力的强度大约是两倍。 还公开了其他实施例。

公开(公告)号：US06952653B2

公开(公告)日：2005-10-04

申请号：US10705059

申请日：2003-11-10

Applicant: Gabor D. Toth ,  David R. Bakker

Inventor： Gabor D. Toth ,  David R. Bakker

IPC: G01N21/95 ,  G06T7/00 ,  G01B5/28 ,  G06K9/00

CPC classification number: H01L22/20 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/014

Abstract: Methods and apparatus for efficiently analyzing defects in-line on a wafer by wafer basis are provided. In general terms, embodiments of the present invention provide a simple interface for setting up the entire inspection and defect analysis process in a single set up procedure. The apparatus includes an inspection station for inspecting a specimen for potential defects and a review station for analyzing a sample of the potential defects to determine a classification of such potential defects. The apparatus further includes a computer system having an application interface operable to allow a user to set up the inspection station and the review station during a same setup phase so as to allow the inspection station and the review station to then operate automatically to provide defect information for one or more specimens based on the user set up.

Abstract translation: 提供了通过晶片来有效地分析晶片上的在线缺陷的方法和装置。 一般来说，本发明的实施例提供了用于在单个设置过程中建立整个检查和缺陷分析过程的简单界面。 该装置包括用于检查潜在缺陷的样本的检查站和用于分析潜在缺陷的样本的检查站，以确定这种潜在缺陷的分类。 该装置还包括具有应用接口的计算机系统，其可操作以允许用户在相同的建立阶段期间建立检查站和审查站，以便允许检查站和审查站自动地进行操作以提供缺陷信息 基于用户设置的一个或多个标本。

公开(公告)号：US06812462B1

公开(公告)日：2004-11-02

申请号：US10435011

申请日：2003-05-09

Applicant: Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

Inventor： Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/281 ,  H01J2237/2814 ,  H01J2237/2815

Abstract: Method and apparatus for imaging at multiple perspectives of a specimen are disclosed. In one embodiment, an apparatus for generating a multi-perspective image using multiple charged particle beams (e.g., electron beams) is disclosed. In one embodiment, the apparatus generally includes a charged particle beam generator system arranged to generate and control a first charged particle beam directed substantially at a first angle towards the specimen and a second charged particle beam directed substantially at a second angle towards the specimen. The apparatus also includes an image generator arranged to generate one or more images based on charged particles emitted from the specimen in response to the first and second charged particle beams and a controller arranged to cause the charged particle beam generator to direct both the first charged particle beam and the second charged particle beam at a first area of the specimen. In a specific implementation, the charged particles are in the form of electrons and the apparatus is a dual electron beam scanning electron microscope (SEM).

Abstract translation: 公开了用于在样本的多个观点进行成像的方法和装置。 在一个实施例中，公开了一种使用多个带电粒子束（例如电子束）产生多视角图像的装置。 在一个实施例中，装置通常包括带电粒子束发生器系统，其被布置成产生并控制基本上以第一角度朝向试样的第一带电粒子束和基本上以第二角度朝向试样的第二带电粒子束。 该装置还包括图像发生器，其被布置为响应于第一和第二带电粒子束而基于从样本发射的带电粒子产生一个或多个图像;以及控制器，布置成使带电粒子束发生器引导第一带电粒子 光束和第二带电粒子束在样品的第一区域。 在具体实施方案中，带电粒子是电子的形式，并且该装置是双电子束扫描电子显微镜（SEM）。

公开(公告)号：US07792351B1

公开(公告)日：2010-09-07

申请号：US12710076

申请日：2010-02-22

Applicant: Gabor D. Toth ,  Douglas K. Masnaghetti

Inventor： Gabor D. Toth ,  Douglas K. Masnaghetti

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01R31/307 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01L21/67288

Abstract: One embodiment pertains to a method for reviewing a potential defect on a substrate from one electron image. An image of an area containing the potential defect is obtained using a charged-particle apparatus. At least three image segments within the image are determined. The three segments are transformably identical to each other, and one of said three segments includes the potential defect. Another embodiment pertains to a method for reviewing a potential defect on a substrate by obtaining an electron-beam image of a relatively large field of view containing a first image segment. The first image segment is substantially smaller than the field of view and includes a location of the potential defect. A comparison image segment within the field of view is determined. The comparison image segment is transformably identical to the first image segment. Other embodiments and features are also disclosed.

Abstract translation: 一个实施例涉及从一个电子图像检查衬底上的潜在缺陷的方法。 使用带电粒子装置获得含有潜在缺陷的区域的图像。 确定图像内至少三个图像片段。 这三个段可变地彼此相同，并且所述三个段之一包括潜在的缺陷。 另一个实施例涉及通过获得包含第一图像片段的相对较大的视场的电子束图像来检查衬底上的潜在缺陷的方法。 第一图像段显着小于视场，并且包括潜在缺陷的位置。 确定视野内的比较图像段。 比较图像段可变地与第一图像段相同。 还公开了其它实施例和特征。