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公开(公告)号:US11842917B2
公开(公告)日:2023-12-12
申请号:US17216439
申请日:2021-03-29
Applicant: Applied Materials, Inc.
Inventor: Leon Volfovski , Andreas Schmid , Denis Martin Koosau , Nicholas Michael Kopec , Steven Babayan , Douglas R. McAllister , Helder Lee , Jeffrey Hudgens , Damon K. Cox
IPC: H01L21/68 , H01L21/687 , H01L21/683 , H01L21/677
CPC classification number: H01L21/68735 , H01L21/68 , H01L21/6838 , H01L21/68707 , H01L21/68721 , H01L21/68742 , H01L21/677
Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.
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公开(公告)号:US20230307273A1
公开(公告)日:2023-09-28
申请号:US18127278
申请日:2023-03-28
Applicant: Applied Materials, Inc.
Inventor: Nicholas Michael Kopec , Damon K. Cox , Leon Volfovski
IPC: H01L21/67 , H01L21/677 , B25J9/16 , G06T1/00
CPC classification number: H01L21/67265 , H01L21/67742 , H01L21/67201 , H01L21/67196 , B25J9/1679 , G06T1/0014
Abstract: A robotic object handling system comprises a robot arm, an image sensor, a first station, and a computing device. The computing device is to cause the robot arm to pick up an object on an end effector, cause the image sensor to generate sensor data of the object, determine at least one of (i) a rotational error of the object or (ii) a positional error of the object based on the sensor data, cause an adjustment to the robot arm to approximately remove at least one of the rotational error or the positional error, and cause the robot arm to place the object at the first station without at least one of the rotational error or the positional error.
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公开(公告)号:US20210217650A1
公开(公告)日:2021-07-15
申请号:US17216439
申请日:2021-03-29
Applicant: Applied Materials, Inc.
Inventor: Leon Volfovski , Andreas Schmid , Denis Martin Koosau , Nicholas Michael Kopec , Steven Babayan , Douglas R. McAllister , Helder Lee , Jeffrey Hudgens , Damon K. Cox
IPC: H01L21/687 , H01L21/68 , H01L21/683
Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.
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公开(公告)号:US20210057256A1
公开(公告)日:2021-02-25
申请号:US16990839
申请日:2020-08-11
Applicant: APPLIED MATERIALS, INC.
Inventor: Nicholas Michael Bergantz , Andreas Schmid , Leon Volfovski , Sanggyum Kim , Damon Cox , Paul Wirth
IPC: H01L21/68 , G01B11/27 , B25J11/00 , H01L21/67 , H01L21/687
Abstract: A method for calibrating an aligner station of an electronics processing system is provided. A calibration is retrieved, by a first robot arm of a transfer chamber, from a processing chamber connected to the transfer chamber. The calibration object has a target orientation in the processing chamber. The calibration is placed, by the first robot art, in a load lock connected to the transfer chamber. The calibration is retrieved from the load lock by a second robot arm of a factory interface connected to the load lock. The calibration object is placed, by the second robot arm, at an aligner station housed in or connected to the factory interface. The calibration object has a first orientation at the aligner station. A difference is determined between the first orientation at the aligner station and an initial target orientation at the aligner station. The initial target orientation at the aligner station is associated with the target orientation in the processing chamber. A first characteristic error value associated with the processing chamber is determined based on the difference between the first orientation and the initial target orientation. The first characteristic error value is recorded in a storage medium. The aligner station is to use the first characteristic error value for alignment of objects to be placed in the processing chamber.
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公开(公告)号:US20140251375A1
公开(公告)日:2014-09-11
申请号:US13785903
申请日:2013-03-05
Applicant: APPLIED MATERIALS, INC.
Inventor: JAMES MATTHEW HOLDEN , SONG-MOON SUH , TODD EGAN , Kalyanjit Ghosh , Leon Volfovski , Michael R. Rice , Richard Giljum
CPC classification number: H01L21/67028 , B01D39/12 , B08B5/00 , B08B7/00 , H01L21/02076 , H01L21/02087 , H01L21/0209 , H01L21/67051
Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.
Abstract translation: 基板清洁装置可以包括具有支撑表面以支撑要清洁的基板的基板支撑件,其中基板支撑件可绕垂直于支撑表面的中心轴线旋转; 第一喷嘴,用于当所述基板由所述基板支撑件的支撑表面支撑时,将第一清洁气体提供到所述内部体积的与所述基板的边缘的位置相对应的区域; 第一环形体,其通过间隙与衬底支撑件的支撑表面相对设置并间隔开,第一环形体具有由内壁限定的中心开口,内壁被成形为提供第一环形体和第二环形体之间的间隙的减小尺寸 支撑表面沿径向向外的方向; 以及第一气体入口,用于向第一环形体的中心开口提供第一气体。
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公开(公告)号:US11626305B2
公开(公告)日:2023-04-11
申请号:US16452091
申请日:2019-06-25
Applicant: Applied Materials, Inc.
Inventor: Nicholas Michael Kopec , Damon K. Cox , Leon Volfovski
IPC: B25J9/16 , H01L21/67 , H01L21/677 , G06T1/00
Abstract: A robotic object handling system comprises a robot arm, a non-contact sensor, a first station, and a computing device. The computing device is to cause the robot arm to pick up an object on an end effector, cause the robot arm to position the object within a detection area of the non-contact sensor, cause the non-contact sensor to generate sensor data of the object, determine at least one of a rotational error of the object relative to a target orientation or a positional error of the object relative to a target position based on the sensor data, cause an adjustment to the robot arm to approximately remove at least one of the rotational error or the positional error from the object, and cause the robot arm to place the object at the first station, wherein the placed object lacks at least one of the rotational error or the positional error.
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公开(公告)号:US11211269B2
公开(公告)日:2021-12-28
申请号:US16923903
申请日:2020-07-08
Applicant: Applied Materials, Inc.
Inventor: Andrew Paul Harbert , Michael C Kuchar , Nicholas Michael Bergantz , Leon Volfovski , Sivakumar Ramalingam , Karuppasamy Muthukamatchi , Douglas R McAllister
IPC: H01L21/67 , H01L21/687 , H01L21/677 , H01L21/673
Abstract: A method includes receiving, by a first loadlock chamber of the loadlock system, a first object from a factory interface via a first opening. The first object is transferred into the first loadlock chamber via a first robot arm. The factory interface is at a first state. The first loadlock chamber is configured to receive different types of objects. The method further includes sealing a first loadlock door against the first opening to create a first sealed environment at the first state in the first loadlock chamber and causing the first sealed environment of the first loadlock chamber to be changed to a second state. The method further includes actuating a second loadlock door to provide a second opening between the first loadlock chamber and a transfer chamber. The first object is to be transferred from the first loadlock chamber to the transfer chamber via a second robot arm.
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公开(公告)号:US20200273826A1
公开(公告)日:2020-08-27
申请号:US16798997
申请日:2020-02-24
Applicant: Applied Materials, Inc.
Inventor: Whitney Kroetz , Damon Keith Cox , Leon Volfovski , Jeffrey C. Hudgens , Balamurali Murugaraj
Abstract: Replaceable contact pads of end effectors are provided. The contact pads support substrates in electronic device manufacturing. The contact pad includes a contact pad head having a contact surface configured to contact a substrate, a shaft coupled to the contact pad head, the shaft including a shaft indent formed between an underside of the contact pad head and a shaft end, and a circular securing member received around the shaft and seated in the shaft indent and configured to secure the contact pad to the end effector body. End effectors including replaceable contact pads and maintenance methods are described, as are additional aspects.
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公开(公告)号:US20240021458A1
公开(公告)日:2024-01-18
申请号:US18476223
申请日:2023-09-27
Applicant: APPLIED MATERIALS, INC.
Inventor: Nicholas Michael Bergantz , Andreas Schmid , Leon Volfovski , Sanggyum Kim , Damon Cox , Paul Wirth
IPC: H01L21/68 , B25J11/00 , H01L21/687 , H01L21/67 , B25J9/16
CPC classification number: H01L21/681 , B25J11/0095 , H01L21/68707 , H01L21/67201 , H01L21/67259 , H01L21/67196 , B25J9/1692
Abstract: A calibration object is transferred from a processing chamber to an aligner station by one or more robot arms. The calibration object has a first processing chamber orientation in the processing chamber and a second orientation at the aligner station. A first characteristic error value associated with a transfer path between the processing chamber and the aligner is determined based on the first processing chamber orientation and the second orientation of the calibration object at the aligner station. In response to detecting an object at the aligner station to be transferred to the processing chamber along the transfer path, the object is aligned by the aligner station to be placed in the processing chamber according to a target processing chamber orientation based on a target aligner orientation as adjusted by the first characteristic error value determined for the transfer path between the processing chamber and the aligner station.
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公开(公告)号:US11600580B2
公开(公告)日:2023-03-07
申请号:US16798997
申请日:2020-02-24
Applicant: Applied Materials, Inc.
Inventor: Whitney Kroetz , Damon Keith Cox , Leon Volfovski , Jeffrey C. Hudgens , Balamurali Murugaraj
IPC: H01L23/66 , H01L23/00 , H01L21/687 , H01L21/67
Abstract: Replaceable contact pads of end effectors are provided. The contact pads support substrates in electronic device manufacturing. The contact pad includes a contact pad head having a contact surface configured to contact a substrate, a shaft coupled to the contact pad head, the shaft including a shaft indent formed between an underside of the contact pad head and a shaft end, and a circular securing member received around the shaft and seated in the shaft indent and configured to secure the contact pad to the end effector body. End effectors including replaceable contact pads and maintenance methods are described, as are additional aspects.
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