QUARTZ UPPER AND LOWER DOMES
    1.
    发明申请
    QUARTZ UPPER AND LOWER DOMES 有权
    QUARTZ UPPER和更低的国家

    公开(公告)号:US20140199056A1

    公开(公告)日:2014-07-17

    申请号:US14132215

    申请日:2013-12-18

    CPC classification number: H01L21/67115 C23C16/45504

    Abstract: Embodiments of the invention relate to a dome assembly. The dome assembly includes an upper dome comprising a central window, and an upper peripheral flange engaging the central window at a circumference of the central window, wherein a tangent line on an inside surface of the central window that passes through an intersection of the central window and the upper peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange, a lower dome comprising a lower peripheral flange and a bottom connecting the lower peripheral flange with a central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the lower peripheral flange is at an angle of about 8° to about 16° with respect to a planar bottom surface of the lower peripheral flange.

    Abstract translation: 本发明的实施例涉及一种圆顶组件。 圆顶组件包括上拱顶,其包括中心窗,以及在中心窗的圆周处接合中心窗的上周缘,其中中心窗的内表面上的切线穿过中心窗的交点 并且上周缘相对于周缘凸缘的平面上表面成大约8°至大约16°的​​角度,下圆顶包括下周边凸缘和将下周边凸缘连接到中心开口的底部, 其中穿过底部和下部周边凸缘的交叉点的底部外表面上的切线相对于下部周边凸缘的平坦底面成约8°至约16°的​​角度。

    EPI BASE RING
    3.
    发明申请
    EPI BASE RING 审中-公开
    EPI基座

    公开(公告)号:US20160230276A1

    公开(公告)日:2016-08-11

    申请号:US15136119

    申请日:2016-04-22

    Abstract: Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

    Abstract translation: 本文所述的实施例涉及用于衬底处理室中的基座环组件。 在一个实施例中,基环组件包括尺寸适于容纳在基板处理室的内圆周内的环体,环体包括用于通过基板的装载口,气体入口和气体出口,其中, 气体入口和气体出口设置在环体的相对端,并且配置成设置在环体的顶表面上的上环和被配置为设置在环体的底表面上的下环,其中, 一旦组装,上环,下环和环体大致同心或同轴。

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