Surface acoustic wave device and method of manufacturing the same

    公开(公告)号:US11522517B2

    公开(公告)日:2022-12-06

    申请号:US16581901

    申请日:2019-09-25

    Abstract: A surface acoustic wave device includes a piezoelectric substrate, a supportive layer, a cover layer and a pillar bump. The supportive layer is disposed on the piezoelectric substrate and around a transducer, the cover layer covers the supportive layer, and the pillar bump is located in a lower via hole of the supportive layer and an upper via hole of the cover layer. The upper via hole has a lateral opening located on a lateral surface of the cover layer, and the pillar bump in the cover layer protrudes from the lateral surface of the cover layer via the lateral opening.

    SURFACE ACOUSTIC WAVE DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210013865A1

    公开(公告)日:2021-01-14

    申请号:US16581901

    申请日:2019-09-25

    Abstract: A surface acoustic wave device includes a piezoelectric substrate, a supportive layer, a cover layer and a pillar bump. The supportive layer is disposed on the piezoelectric substrate and around a transducer, the cover layer covers the supportive layer, and the pillar bump is located in a lower via hole of the supportive layer and an upper via hole of the cover layer. The upper via hole has a lateral opening located on a lateral surface of the cover layer, and the pillar bump in the cover layer protrudes from the lateral surface of the cover layer via the lateral opening.

    Surface acoustic wave device and method of manufacturing the same

    公开(公告)号:US12224734B2

    公开(公告)日:2025-02-11

    申请号:US17856036

    申请日:2022-07-01

    Abstract: A surface acoustic wave device includes a piezoelectric substrate, a supportive layer, a cover layer and a pillar bump. The supportive layer is disposed on the piezoelectric substrate and around a transducer, the cover layer covers the supportive layer, and the pillar bump is located in a lower via hole of the supportive layer and an upper via hole of the cover layer. The upper via hole has a lateral opening located on a lateral surface of the cover layer, and the pillar bump in the cover layer protrudes from the lateral surface of the cover layer via the lateral opening.

    SURFACE ACOUSTIC WAVE DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220337216A1

    公开(公告)日:2022-10-20

    申请号:US17856036

    申请日:2022-07-01

    Abstract: A surface acoustic wave device includes a piezoelectric substrate, a supportive layer, a cover layer and a pillar bump. The supportive layer is disposed on the piezoelectric substrate and around a transducer, the cover layer covers the supportive layer, and the pillar bump is located in a lower via hole of the supportive layer and an upper via hole of the cover layer. The upper via hole has a lateral opening located on a lateral surface of the cover layer, and the pillar bump in the cover layer protrudes from the lateral surface of the cover layer via the lateral opening.

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