公开(公告)号：US20190214222A1

公开(公告)日：2019-07-11

申请号：US16325613

申请日：2016-08-23

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kotoko URANO ,  Zhaohui CHENG ,  Takeyoshi OHASHI ,  Hideyuki KAZUMI

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/153 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/1534 ,  H01J2237/2448

Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculated correction amount.

公开(公告)号：US20180269032A1

公开(公告)日：2018-09-20

申请号：US15983346

申请日：2018-05-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Zhaohui CHENG ,  Hikaru KOYAMA ,  Yoshinobu KIMURA ,  Hiroyuki SHINADA ,  Osamu KOMURO

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/2803

Abstract: A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning condition according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.

公开(公告)号：US20180190469A1

公开(公告)日：2018-07-05

申请号：US15741038

申请日：2015-07-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Zhaohui CHENG ,  Tomonori NAKANO ,  Kotoko URANO ,  Takeyoshi OHASHI ,  Yasunari SOHDA ,  Hideyuki KAZUMI

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/141 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/153 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1474 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/221 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/2809

Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.