公开(公告)号：US20220392753A1

公开(公告)日：2022-12-08

申请号：US17770147

申请日：2020-10-21

Applicant: LAM RESEARCH CORPORATION

Inventor： Lin XU ,  Douglas DETERT ,  John DAUGHERTY ,  Pankaj HAZARIKA ,  Satish SRINIVASAN ,  Nash W. ANDERSON ,  John Michael KERNS ,  Robin KOSHY ,  David Joseph WETZEL ,  Lei LIU ,  Eric A. PAPE

IPC: H01J37/32

Abstract: A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.

公开(公告)号：US20230411124A1

公开(公告)日：2023-12-21

申请号：US18034635

申请日：2021-11-01

Applicant: Lam Research Corporation

Inventor： John Michael KERNS ,  David Joseph WETZEL ,  Lin XU ,  Pankaj HAZARIKA ,  Douglas DETERT ,  Lei LIU ,  Eric A. PAPE

IPC: H01J37/32 ,  C04B41/00 ,  C04B35/01

CPC classification number: H01J37/32477 ,  C04B41/0054 ,  H01J37/32467 ,  C04B2235/94 ,  C04B2235/666 ,  C04B2235/6028 ,  C04B35/01

Abstract: A method for forming a component for a plasma processing chamber is provided. An internal mold is provided. An external mold is provided around the internal mold. The external mold is filled with a ceramic powder, wherein the ceramic powder surrounds the internal mold. The ceramic powder is sintered to form a solid part. The solid part is removed from the external mold.