公开(公告)号：US20220392753A1

公开(公告)日：2022-12-08

申请号：US17770147

申请日：2020-10-21

Applicant: LAM RESEARCH CORPORATION

Inventor： Lin XU ,  Douglas DETERT ,  John DAUGHERTY ,  Pankaj HAZARIKA ,  Satish SRINIVASAN ,  Nash W. ANDERSON ,  John Michael KERNS ,  Robin KOSHY ,  David Joseph WETZEL ,  Lei LIU ,  Eric A. PAPE

IPC: H01J37/32

Abstract: A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.

公开(公告)号：US20160379806A1

公开(公告)日：2016-12-29

申请号：US14750714

申请日：2015-06-25

Applicant: Lam Research Corporation

Inventor： Lin XU ,  Nash W. ANDERSON ,  John DAUGHERTY ,  Thomas R. STEVENSON ,  John Michael KERNS

IPC: H01J37/32 ,  H02N13/00 ,  C23C16/06 ,  H01L21/683 ,  B32B37/12 ,  C23C16/455

CPC classification number: H01J37/32495 ,  B32B37/18 ,  B32B2311/24 ,  B32B2315/02 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  H01J37/32513 ,  H01J37/32642 ,  H01J37/32715 ,  H01L21/6833 ,  H02N13/00

Abstract: In accordance with this disclosure, there are provided several inventions, including an apparatus and method for depositing plasma resistant coatings on polymer materials used in a plasma processing chamber. In a particular example, such a coating may be made on a portion of an electrostatic chuck, where the polymer material is a bead surrounding an adhesive between a chuck base and a ceramic top plate.

Abstract translation: 根据本公开，提供了若干发明，包括用于在等离子体处理室中使用的聚合物材料上沉积耐等离子体涂层的装置和方法。 在一个具体实例中，这样的涂层可以在静电卡盘的一部分上制成，其中聚合物材料是围绕卡盘基底和陶瓷顶板之间的粘合剂的珠粒。

公开(公告)号：US20160312351A1

公开(公告)日：2016-10-27

申请号：US14697454

申请日：2015-04-27

Applicant: Lam Research Corporation

Inventor： Chin-Yi LIU ,  Russell ORMOND ,  Nash W. ANDERSON ,  David M. SCHAEFER

IPC: C23C4/134 ,  C23C4/06 ,  C23C4/11 ,  H01L21/66 ,  H01L21/67

CPC classification number: C23C4/134 ,  C23C4/06 ,  C23C4/11 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32972 ,  H01J37/3299 ,  H01L21/67069 ,  H01L21/67253 ,  H01L22/10

Abstract: In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).

Abstract translation: 根据本公开，提供了若干发明，包括具有多层表面的基板处理装置，其被配置为面对等离子体并抵抗腐蚀。 这些多层表面可以在一个实例中包括铝的基底层，阳极氧化的铝或石英，第二层稳定的氧化锆，以及第二层钇 - 铝复合物如钇铝石榴石（YAG）。