Multiband Spatial Heterodyne Spectrometer And Associated Methods
    1.
    发明申请
    Multiband Spatial Heterodyne Spectrometer And Associated Methods 有权
    多频带空间异步光谱仪及相关方法

    公开(公告)号:US20140029004A1

    公开(公告)日:2014-01-30

    申请号:US13442574

    申请日:2012-04-09

    Applicant: Andrew Bodkin

    Inventor: Andrew Bodkin

    Abstract: A multiband spatial heterodyne spectrometer for determining spectra in first and second wavelength bands has a beamsplitter configured to split incident light and to direct the incident light upon a first and a second diffraction grating. The gratings are configured for Littrow reflection of incident light of the first wavelength band at a first order and Littrow reflection of incident light of the second wavelength band at a second order. Light reflected by the first and the second diffraction grating forms diffraction patterns imaged by an electronic camera. A dispersive device separates the imaged interference patterns onto separate groups of pixel sensors corresponding to the wavelength bands. A processing device receives information from the detector and computes spectra therefrom. The second diffraction grating is split spatially or temporally to provide two different responses, so the system can disambiguate spectra. In embodiments, the spectrometer computes hyperspectral images of a target.

    Abstract translation: 用于确定第一和第二波长带中的光谱的多频带空间外差光谱仪具有被配置为分离入射光并将入射光引导到第一和第二衍射光栅上的分束器。 光栅被配置为以第一阶次的第一波长带的入射光和第二波长带的入射光的Littrow反射的二次反射。 由第一和第二衍射光栅反射的光形成由电子照相机成像的衍射图案。 分散装置将成像的干涉图案分离成对应于波长带的单独的像素传感器组。 处理装置从检测器接收信息并从其计算光谱。 第二个衍射光栅在空间上或时间上分裂以提供两种不同的响应,因此系统可以消除光谱的歧义。 在实施例中,光谱仪计算目标的高光谱图像。

    Time-resolved spectroscopic measurement apparatus
    2.
    发明授权
    Time-resolved spectroscopic measurement apparatus 有权
    时间分辨光谱测量装置

    公开(公告)号:US08059272B2

    公开(公告)日:2011-11-15

    申请号:US11662680

    申请日:2005-09-16

    CPC classification number: G01J3/2889 G01J3/04 G01J3/22

    Abstract: Light dispersing device comprising a slit element having a slit for exposure to electromagnetic radiation, wherein the slit element is configured and disposed for turning the slit between at least two positions. The light dispersing device is used together with a streak camera, whereby in a first position the slit is adjusted to influence the temporal resolution of the streak camera and in a second postion the slit is adjusted to influence the spectral resolution of the streak camera.

    Abstract translation: 光分配装置包括具有用于暴露于电磁辐射的狭缝的狭缝元件,其中,所述狭缝元件构造和设置用于在至少两个位置之间转动狭缝。 光分散装置与条纹相机一起使用,由此在第一位置调整狭缝以影响条纹相机的时间分辨率,并且在第二位置中,调节狭缝以影响条纹相机的光谱分辨率。

    Spectrometer
    3.
    发明授权
    Spectrometer 有权
    光谱仪

    公开(公告)号:US06573989B2

    公开(公告)日:2003-06-03

    申请号:US09801001

    申请日:2001-03-08

    CPC classification number: G01J3/1809 G01J3/1838 G01J3/22

    Abstract: A spectrometer measures a spectrum of a light beam supplied from a light source so as to obtain fine information and coarse information of the spectrum easily. This spectrometer has a holographic grating, an Echelle grating, a rotation stage and a line sensor. In the case where a single pass beam is to be detected, a control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle &dgr;1. On the other hand, in the case where a double pass beam is to be detected, the control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle &dgr;2.

    Abstract translation: 光谱仪测量从光源提供的光束的光谱,以便容易地获得光谱的精细信息和粗略信息。 该光谱仪具有全息光栅,Echelle光栅,旋转台和线传感器。 在要检测单程光束的情况下,控制处理单元控制旋转阶段,以使Echelle光栅从Littrow布置旋转预定角度δ1。 另一方面,在要检测双通光束的情况下,控制处理单元控制旋转台,以便将梯形光栅从Littrow布置旋转预定角度δ2。

    High resolution etalon-grating spectrometer

    公开(公告)号:US06538737B2

    公开(公告)日:2003-03-25

    申请号:US10003513

    申请日:2001-10-31

    CPC classification number: G01J3/12 G01J1/4257 G01J3/22 G01J3/26 G01J9/02

    Abstract: A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution
    7.
    发明授权
    Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution 有权
    弯曲光栅光谱仪和具有非常高波长分辨率的波长多路复用器或解复用器

    公开(公告)号:US08462338B1

    公开(公告)日:2013-06-11

    申请号:US12623750

    申请日:2009-11-23

    Abstract: The present application discloses a system comprising a compact curved grating (CCG) and its associated compact curved grating spectrometer (CCGS) or compact curved grating wavelength multiplexer/demultiplexer (WMDM) module and a method for making the same. The system is capable of achieving a very small (resolution vs. size) RS factor. In the invention, the location of the entrance slit and detector can be adjusted in order to have the best performance for a particular design goal. The initial groove spacing is calculated using a prescribed formula dependent on operation wavelength. The location of the grooves is calculated based on two conditions. The first one being that the path-difference between adjacent grooves should be an integral multiple of the wavelength in the medium to achieve aberration-free grating focusing at the detector or output slit (or output waveguide) even with large beam diffraction angle from the entrance slit or input slit (or input waveguide). The second one being specific for a particular design goal of a curved-grating spectrometer. In an embodiment, elliptical mirrors each with focal points at the slit and detector are used for each groove to obtain aberration-free curved mirrors.

    Abstract translation: 本申请公开了一种包括紧凑弯曲光栅(CCG)及其相关联的紧凑弯曲光栅光谱仪(CCGS)或紧凑弯曲光栅波长多路复用器/解复用器(WMDM)模块的系统及其制造方法。 该系统能够实现非常小的(分辨率vs.尺寸)RS因子。 在本发明中,可以调整入口狭缝和检测器的位置,以便为特定设计目标具有最佳性能。 使用取决于工作波长的规定公式计算初始槽间距。 基于两个条件计算凹槽的位置。 第一个是相邻槽之间的路径差应该是介质中波长的整数倍,以便即使在入口处具有较大的光束衍射角,也可以在检测器或输出狭缝(或输出波导)处聚焦的无像差光栅 狭缝或输入狭缝(或输入波导)。 第二个特定于曲面光栅光谱仪的特定设计目标。 在一个实施例中,每个具有狭缝和检测器处的​​焦点的椭圆镜用于每个凹槽,以获得无像差的曲面镜。

    Spectrometer Assembly
    8.
    发明申请
    Spectrometer Assembly 有权
    光谱仪组装

    公开(公告)号:US20100171953A1

    公开(公告)日:2010-07-08

    申请号:US12665665

    申请日:2008-05-09

    Abstract: The invention relates to a spectrometer arrangement (10) having a spectrometer for producing a spectrum of radiation from a radiation source on a detector (34), comprising an optical imaging Littrow arrangement (18, 20) for imaging the radiation entering the spectrometer arrangement (16) in an image plane, a first dispersion arrangement (28, 30) for the spectral decomposition of a first wavelength range of the radiation entering the spectrometer arrangement, a second dispersion arrangement (58, 60) for the spectral decomposition of a second wavelength range of the radiation entering the spectrometer arrangement, and a common detector (34) arranged in the image plane of the imagine optics, characterized in that the imaging optical arrangement (18, 20) comprises an element (20) that can be moved between two positions (20, 50), wherein the radiation entering the spectrometer arrangement in the first position is guided via the first dispersion arrangement and in the second position via the second dispersion arrangement.

    Abstract translation: 本发明涉及一种具有用于在检测器(34)上产生来自辐射源的辐射光谱的光谱仪的光谱仪装置(10),该光谱仪包括用于对进入光谱仪装置的辐射进行成像的光学成像Littrow布置(18,20) 16),用于对进入光谱仪装置的辐射的第一波长范围进行光谱分解的第一色散装置(28,30),用于第二波长的光谱分解的第二色散装置(58,60) 进入光谱仪布置的辐射的范围以及布置在想象光学器件的图像平面中的公共检测器(34),其特征在于,成像光学装置(18,20)包括可在两者之间移动的元件(20) 位置(20,50),其中在第一位置进入分光计装置的辐射经由第一分散装置被引导,并且经由 第二分散布置。

    Gas cell
    9.
    发明授权
    Gas cell 有权
    气室

    公开(公告)号:US07564558B2

    公开(公告)日:2009-07-21

    申请号:US11192465

    申请日:2005-07-18

    Abstract: The present invention relates to a gas cell which is included in a gas sensor and adapted to establish the presence of a gas and/or for determining the concentration of one such gas (G), comprising a cavity (2′) which is delimited by wall portions that have light reflecting properties and which is intended to enclose a volume ((G)) of said gas, and further comprising a light source (3) which is adapted to emit a light bundle (3a′) directed for reflection between cavity-associated and opposing wall portions, wherein a light bundle (3a″) is comprised of light rays which are reflected in a concave wall mirror surface (2b′) and adapted to be directed onto one or more light receivers (4, 5) which function to detect an absorption wavelength corresponding to the gas sample ((G)). The concave curved wall mirror surface (2b′) is adapted to reflect an obliquely received divergent light bundle (3a′) from the light source (3) onto a flat grating-allocated cavity-associated wall surface (2g′) whose reflecting surface includes or is structured as a Littrow arrangement (2g″). The light bundle (3a″) is adapted to fall onto the flat wall surface (2g′) at an angle which lies close to the Blaze angle of the grating wherewith, inter alia, an absorption wavelength corresponding to the chosen gas sample ((G)) and present in the light bundle (3a″) is caused to be reflected and diffracted ((3a″)) by said flat wall surface (2g″) in a straight opposite direction so as to be reflected again in said curved mirror surface (2b′) and directed diffracted towards each of said light receivers (4, 5).

    Abstract translation: 本发明涉及一种气室,其包括在气体传感器中并且适于建立气体的存在和/或用于确定一种这样的气体(G)的浓度,包括空腔(2'),所述腔(2')由 具有光反射性能并且旨在包围所述气体的体积((G))的壁部分,并且还包括光源(3),其适于发射指向用于在腔体(3)之间反射的光束(3a') 相关壁和相对的壁部分,其中光束(3a“)包括被反射在凹壁反射镜表面(2b')中并适于被引导到一个或多个光接收器(4,5)上的光线, 其用于检测对应于气体样品((G))的吸收波长。 所述凹曲面壁反射镜表面(2b')适于将倾斜接收的发散光束(3a')从光源(3)反射到平面光栅分配的空腔相关壁表面(2g')上,其反射表面包括 或者被构造为Littrow安排(2g“)。 光束(3a“)适于以与光栅的Blaze角接近的角度落在平坦壁表面(2g')上,其特别地,对应于所选气体样品的吸收波长(( G))并且存在于光束(3a“)中,由所述平壁面(2g”)沿直线相反的方向被反射和衍射((3a“)),以便再次被反射 所述弯曲镜面(2b')并且被引导朝向每个所述光接收器(4,5)衍射。

    High resolution etalon-grating monochromator
    10.
    发明授权
    High resolution etalon-grating monochromator 有权
    高分辨率标准光栅单色仪

    公开(公告)号:US06480275B2

    公开(公告)日:2002-11-12

    申请号:US09772293

    申请日:2001-01-29

    CPC classification number: G01J3/12 G01J1/4257 G01J3/22 G01J3/26 G01J9/02

    Abstract: A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

    Abstract translation: 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

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