-
-
公开(公告)号：KR1019970011528B1
公开(公告)日：1997-07-11
申请号：KR1019930027344
申请日：1993-12-11
Applicant: 한국전자통신연구원
IPC: G02B27/10
Abstract: The optoisolator formed by isotropic etching and substrate binding and manufacturing method thereof comprising the first step isotropic etching a directional Si substrate(201) by KOH to form a pyramid type etching hole(200) inclined against the substrate bottom surface; the second step forming a optical reflection layer(202) on said etching hole(200) to enhance reflection rate and then forming a deposit layer(203) to flatten the surface for binding substrates; the third step grinding said deposit layer(203) and then binding a substrate(204) having the same direction as said substrate(201) on said deposit layer(203); and the forth step removing said substrate(201) to form a optical reflection surface(205) is disclosed. Thereby, it is possible to provide a small optoisolator which optic signal inputted during optic signal process can be divided.
Abstract translation: 通过各向同性蚀刻和衬底粘合形成的光隔离器及其制造方法包括：通过KOH对第一步骤各向同性蚀刻<410方向的Si衬底（201），形成倾斜于衬底底面的金字塔型蚀刻孔（200）; 第二步骤，在所述蚀刻孔（200）上形成光反射层（202），以提高反射率，然后形成沉积层（203）以平坦化用于粘结基片的表面; 第三步骤研磨所述沉积层（203），然后将具有与所述基底（201）相同方向的基底（204）结合在所述沉积层（203）上; 并且公开了去除所述衬底（201）以形成光学反射表面（205）的第四步骤。 由此，可以提供在光信号处理期间输入的光信号可以被分割的小型光隔离器。
-
公开(公告)号：KR1019970009972B1
公开(公告)日：1997-06-19
申请号：KR1019930028480
申请日：1993-12-18
Applicant: 한국전자통신연구원
IPC: H01L21/30
Abstract: The present invention provides a method of making an ink jet nozzle by using anisotropic etching and hetero junction. This method includes the steps of joining a substrate (101) with a crystal direction (100) and a substrate (102) with a different crystal direction (101), and making the substrate (102) thin to a given thickness; forming an etching protecting mask on the substrate (101), selectively etching the same by anisotropic etching to form a region (105) in an inverted pyramid shape, and exposing the substrate (102)'s given portion to form an etching protecting window (107); and anisotropic etching the substrate (102) through the opened window (107) to form a removed region (108) of rectangular shape.
Abstract translation: 本发明提供一种通过使用各向异性蚀刻和异质结制造喷墨嘴的方法。 该方法包括以下步骤：使晶体方向（100）的衬底（101）与具有不同晶体方向（101）的衬底（102）接合，并使衬底（102）变薄至给定厚度; 在所述基板（101）上形成蚀刻保护掩模，通过各向异性蚀刻选择性地蚀刻所述蚀刻保护掩模，以形成倒金字塔形状的区域（105），并暴露所述基板（102）的给定部分以形成蚀刻保护窗口 107）; 并通过打开的窗口（107）对衬底（102）进行各向异性蚀刻，以形成矩形形状的去除区域（108）。
-
-
-
Patent Agency Ranking
公开(公告)号：KR1019960008901B1
公开(公告)日：1996-07-05
申请号：KR1019920023360
申请日：1992-12-04
IPC: H01L21/31
Abstract: forming a porous silicon layer (2) on the silicon substrate (1) by applying the current of 10 - 100 mA/cm2 to the HF solution where the silicon substrate (1) is dipped and wet etching the surface of the silicon substrate (1); depositing a diamond thin film over the porous silicon layer (2).
Abstract translation: 在硅衬底（1）上形成多孔硅层（2），通过将10-100mA / cm 2的电流施加到浸入硅衬底（1）的HF溶液中，湿法蚀刻硅衬底（1）的表面 ）; 在多孔硅层（2）上沉积金刚石薄膜。
-
公开(公告)号：KR1019950021153A
公开(公告)日：1995-07-26
申请号：KR1019930028480
申请日：1993-12-18
Applicant: 한국전자통신연구원
IPC: H01L21/30
Abstract: 본 발명은 이방성 식각 및 이종기판 접합기술에 의한 잉크 제트노즐(ink jet nozzle)제작 방법에 관한 것으로서, 종래에 단순하게 기판을 이방성 식각하였기 때문에 아주 작은 노즐을 제작할 수 없고, 다양한 구조를 적절하게 응용할 수 없는 문제점을 해결하기 위하여 본 발명은 기판결정 방향에 따라 식각 특성이 다른것을 이용하여, 결정방향이 다른 기판을 접합시키고, 접합된 기판을 이방성 식긱을 하면 한번의 사진전사공정에 의해서도 다양한 모양의 노즐을 용이하게 제작할 수 있다.
-
-
-
-
-
-
-
Search Results
77
records
(took 0.02 seconds)
