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公开(公告)号：US20220035239A1
公开(公告)日：2022-02-03
申请号：US17278356
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan VAN ZWOL , Sander BALTUSSEN , Dennis DE GRAAF , Johannes Christiaan Leonardus FRANKEN , Adrianus Johannes Maria GIESBERS , Alexander Ludwig KLEIN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Alexey Sergeevich KUZNETSOV , Arnoud Willem NOTENBOOM , Mahdiar VALEFI , Marcus Adrianus VAN DE KERKHOF , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Ties Wouter VAN DER WOORD , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.
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公开(公告)号：US20250004362A1
公开(公告)日：2025-01-02
申请号：US18293851
申请日：2022-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Franciscus Theodorus AGRICOLA , Lourdes FERRE LLIN , Dennis DE GRAAF , Chaitanya Krishna ANDE , Inci DONMEZ NOYAN , Fai Tong SI , Ties Wouter VAN DER WOORD , Anne-Sophie ROLLIER , Maxime BIRON , Adrianus Johannes Maria GIESBERS
Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
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公开(公告)号：US20220121111A1
公开(公告)日：2022-04-21
申请号：US17548944
申请日：2021-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Mária PÉTER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
IPC: G03F1/64
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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4.发明申请公开(公告)号：US20200159107A1
公开(公告)日：2020-05-21
申请号：US16634910
申请日：2018-06-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Evgenia KURGANOVA , Adrianus Johannes Maria GIESBERS , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Pieter-Jan VAN ZWOL , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
IPC: G03F1/62 , G03F1/38 , G03F7/20 , C01B32/186 , G02B5/08 , H01L21/027
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.
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公开(公告)号：US20240027893A1
公开(公告)日：2024-01-25
申请号：US18220799
申请日：2023-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Mária PÉTER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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Patent Agency Ranking
公开(公告)号：US20210181618A1
公开(公告)日：2021-06-17
申请号：US16761683
申请日：2018-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan VAN ZWOL , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Evgenia KURGANOVA , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Leonid Aizikovitsj SJMAENOK , Ties Wouter VAN DER WOORD , David Ferdinand VLES
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：US20240411222A1
公开(公告)日：2024-12-12
申请号：US18699574
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Inci DONMEZ NOYAN , Ties Wouter VAN DER WOORD , Johan REININK , Tim Willem Johan VAN DE GOOR , Alexander Ludwig KLEIN , Zomer Silvester HOUWELING , Paul Alexander VERMEULEN , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Lambertus Idris Johannes Catharina BERGERS
Abstract: A pellicle membrane includes a population of metal silicide crystals in a silicon-based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
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公开(公告)号：US20230050613A1
公开(公告)日：2023-02-16
申请号：US17792464
申请日：2020-12-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Ties Wouter VAN DER WOORD , Volker Dirk HILDENBRAND , Inci DONMEZ NOYAN , Adrianus Johannes Maria GIESBERS , Alexander Ludwig KLEIN
Abstract: A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.
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公开(公告)号：US20220269165A1
公开(公告)日：2022-08-25
申请号：US17629849
申请日：2020-07-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul JANSSEN , Maxime BIRON , Inci DONMEZ NOYAN , Lourdes FERRE LLIN , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Jan Hendrik Willem KUNTZEL , Arnoud Willem NOTENBOOM , Anne-Sophie ROLLIER , Ties Wouter VAN DER WOORD , Pieter-Jan VAN ZWOL
Abstract: A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.
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公开(公告)号：US20200209736A1
公开(公告)日：2020-07-02
申请号：US16614815
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Flendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Maria PETER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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