公开(公告)号：DE69401689D1

公开(公告)日：1997-03-20

申请号：DE69401689

申请日：1994-07-20

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  TANAKA YUTAKA ,  FUJIOKA HIDEHIKO

IPC: C23C14/56 ,  B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/205 ,  H01L21/67

公开(公告)号：DE69033791T2

公开(公告)日：2002-05-23

申请号：DE69033791

申请日：1990-10-19

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  AMEMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.

公开(公告)号：DE68927482D1

公开(公告)日：1997-01-09

申请号：DE68927482

申请日：1989-01-27

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  TANAKA YUTAKA ,  EBINUMA RYUICHI

IPC: G12B5/00 ,  B23Q1/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/00

Abstract: A positioning device includes a movable table supported by a rectilinear guide mechanism or rotary mechanism, the movable table being moved by a driving mechanism so as to position a member, to be conveyed, placed on the movable table, with respect to a predetermined site. After the member being conveyed is conveyed to the predetermined site, the conveyed member is contacted intimately to a stationary table which provides a reference with respect to the attitude of the conveyed member, such that the attitude correction of the conveyed member is attained.

公开(公告)号：DE68926873D1

公开(公告)日：1996-08-29

申请号：DE68926873

申请日：1989-10-04

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMEMIYA MITSUAKI ,  KARIYA TAKAO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE68925604D1

公开(公告)日：1996-03-21

申请号：DE68925604

申请日：1989-09-04

Applicant: CANON KK

Inventor： UDA KOJI ,  TANAKA YUTAKA ,  MORI TETSUZO ,  SHIMODA ISAMU ,  UZAWA SCHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

公开(公告)号：DE69033791D1

公开(公告)日：2001-10-11

申请号：DE69033791

申请日：1990-10-19

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  AMEMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.

公开(公告)号：DE69401689T2

公开(公告)日：1997-06-19

申请号：DE69401689

申请日：1994-07-20

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  TANAKA YUTAKA ,  FUJIOKA HIDEHIKO

IPC: C23C14/56 ,  B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/205 ,  H01L21/67

公开(公告)号：DE68926873T2

公开(公告)日：1996-12-12

申请号：DE68926873

申请日：1989-10-04

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMEMIYA MITSUAKI ,  KARIYA TAKAO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE68925604T2

公开(公告)日：1996-07-11

申请号：DE68925604

申请日：1989-09-04

Applicant: CANON KK

Inventor： UDA KOJI ,  TANAKA YUTAKA ,  MORI TETSUZO ,  SHIMODA ISAMU ,  UZAWA SCHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

公开(公告)号：DE69110698D1

公开(公告)日：1995-08-03

申请号：DE69110698

申请日：1991-02-08

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  OZAWA KUNITAKA ,  KARIYA TAKAO ,  UZAWA SHUNICHI

IPC: F16K3/18 ,  H01L21/027

Abstract: A gate valve device including a partition wall (41) having an opening (13); a valve member (14) movable along the partition wall to openably close the opening; a driving system means for moving the valve member (14); and a pressing mechanism (26) for pressing the valve member toward the partition wall, the pressing mechanism having a pressing member (33) projectable toward and retractable from the valve member, wherein the pressing mechanism presses the valve member against the partition wall when the valve member is in a position closing the opening.