公开(公告)号：EP3203494A4

公开(公告)日：2018-06-06

申请号：EP15843731

申请日：2015-09-17

Applicant: NAT INSTITUTE FOR MATERIALS SCIENCE

Inventor： SEKIGUCHI TAKASHI ,  IWAI HIDEO

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/05 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/2448 ,  H01J2237/24485

Abstract: When an electrode (29) such as a grid applied with a negative voltage is installed in front of an objective lens (23), low energy electrons among secondary electrons (25) generated from a sample (24) by an electron beam or the like is reflected by the electrode to come into a detector (22) installed in the sample (24) side, while electrons of higher energy are not detected, since they are not reflected by the electrode. Accordingly, since only the electrons of lower energy of the secondary electrons can be detected by discriminating the secondary electrons by the energy, it is possible to obtain a detection signal, e.g., rich in the information on the surface state of the sample.

公开(公告)号：EP2058834A4

公开(公告)日：2011-05-18

申请号：EP07791379

申请日：2007-07-26

Applicant: NAT UNIV CORP NARA INST

Inventor： MATSUDA HIROYUKI ,  DAIMON HIROSHI

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/285

CPC classification number: H01J37/12 ,  H01J37/252 ,  H01J2237/05 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/244 ,  H01J2237/2511 ,  H01J2237/2538

公开(公告)号：EP2138603A1

公开(公告)日：2009-12-30

申请号：EP08738991.2

申请日：2008-03-27

Applicant: Ferrotec Corporation

Inventor： SHIINA, Yuichi

IPC: C23C14/32 ,  H05H1/32

CPC classification number: H01J37/32633 ,  H01J37/147 ,  H01J37/3178 ,  H01J37/32055 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/3142 ,  H05H1/48

Abstract: There is provided a plasma generating apparatus having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing portion can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of a cathode (407) of said plasma gun is surrounded by an enclosure member (420) and a droplet removing device (406) constituted by laying a plurality of droplet collecting members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the collecting member (411) and a plasma advancing path (402) have no relation connected with an arc power supply (409) and are held in an electrically neutral floating state.

Abstract translation: 提供了一种具有等离子体枪的等离子体发生装置，其能够有效地除去与等离子体混合的液滴，而不会减少由真空电弧放电产生的等离子体的有效量，并且其中可以容易且廉价地构成液滴除去部分，并且表面处理的精度 可以提高高纯度等离子体的薄膜。 所述等离子体枪的阴极（407）的周边由封闭构件（420）围绕，并且通过将多个液滴收集构件（411）铺设在多层中而构成的液滴去除装置（406）设置在外壳的内部 会员（420）。 封闭构件（420），收集构件（411）和等离子体行进路径（402）与电弧电源（409）没有关联，并且保持在电中性浮动状态。

公开(公告)号：EP1801844A2

公开(公告)日：2007-06-27

申请号：EP06021534.0

申请日：2006-10-13

Applicant: Carl Zeiss NTS GmbH

Inventor： Walter, Gero ,  Härle, Rainer

IPC: H01J37/28 ,  H01J37/304

CPC classification number: H01J37/26 ,  H01J37/21 ,  H01J2237/047 ,  H01J2237/05 ,  H01J2237/216 ,  H01J2237/24507 ,  H01J2237/2485 ,  H01J2237/28 ,  H01J2237/2802

Abstract: Die Erfindung betrifft ein Verfahren und eine Vorrichtung zur Bestimmung des Abstands (Z) einer zu untersuchenden Probe (12) von mindestens einem Referenzpunkt (19, 21). Der Erfindung liegt die Aufgabe zugrunde, ein Verfahren und eine Vorrichtung anzugeben, die unabhängig von der Art der Probe arbeiten, wobei das Verfahren einfach durchzuführen sowie die Vorrichtung einfach ausgestaltet ist. Die Erfindung schlägt hierzu vor, einem ersten Potential einer Probe (12) ein Signal aufzumodulieren und der Probe (12) einen Primärteilchenstrahl zuzuführen, wobei aufgrund einer Wechselwirkung ein Sekundärteilchenstrahl erzeugt wird, dessen Teilchen das aufmodulierte Signal aufweisen. Die Teilchen des Sekundärteilchenstrahls sowie das dem Potential der Teilchen des Sekundärteilchenstrahls aufmodulierte Signal werden detektiert. Durch Vergleichen des detektierten aufmodulierten Signals mit einem Referenzsignal wird aus einer Relation zwischen dem Referenzsignal und dem detektierten aufmodulierten Signal der Abstand (Z) bestimmt. Die erfindungsgemäße Vorrichtung weist die entsprechenden Bauteile zur Durchführung des Verfahrens auf.

Abstract translation: 该方法包括在待检查的样品（12）的电位上调制正弦信号，并在样品上施加一次粒子束。 在将一次粒子束撞击在样品上时产生二次粒子束，其中二次粒子束被从样品引出。 检测二次粒子束的粒子，并检测用二次粒子束的粒子的电位调制的信号。 将检测到的信号与用于确定样品的距离的参考信号进行比较。 还包括用于确定样品与参考点的距离的装置的独立权利要求。

公开(公告)号：EP1788613A2

公开(公告)日：2007-05-23

申请号：EP06005290.9

申请日：2006-03-15

Applicant: Lee, Bing-Huan

Inventor： Chao, Chih-Yu ,  Hsieh, Wen-Jiunn

IPC: H01J37/26

CPC classification number: H01J37/26 ,  G01N23/2251 ,  H01J37/20 ,  H01J2237/05 ,  H01J2237/2004 ,  H01J2237/2608 ,  H01J2237/262 ,  H01J2237/2802 ,  H01J2237/2809

Abstract: A method of observing a live unit under an electron microscope includes the steps of (A) preparing a live environment inside the electron microscope, wherein the live environment is provided with at least one live unit and a predetermined environmental condition keeping basic physiology of the live unit functional, at least one pair of view windows is located opposite to each other, and the live unit includes at least two objects that can bear different critical charge densities respectively; and (B) irradiating the live unit with a particle beam of predetermined intensity through the view windows, and then display the live unit on an imaging device of the electron microscope, wherein the product of the predetermined intensity of the particle beam and the predetermined duration equals the predetermined charge density that is smaller than or equal to the critical charge density of the object of the live unit.

Abstract translation: 在电子显微镜下观察活单元的方法包括以下步骤：（A）在电子显微镜内制备活环境，其中活环境具有至少一个活单元和保持活的基本生理学的预定环境条件 单元功能，至少一对观察窗彼此相对设置，并且带电单元包括至少两个分别能够承载不同临界电荷密度的物体; 和（B）通过观察窗用预定强度的粒子束照射带电单元，然后在电子显微镜的成像装置上显示带电单元，其中粒子束的预定强度与预定持续时间的乘积 等于小于或等于带电单元的物体的临界电荷密度的预定电荷密度。

公开(公告)号：EP1547122A2

公开(公告)日：2005-06-29

申请号：EP03755859.0

申请日：2003-09-23

Applicant: Axcelis Technologies Inc.

Inventor： SCHERER, Ernst

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  G04F10/00 ,  G04F10/10 ,  H01J2237/05 ,  H01J2237/30472

Abstract: Apparatus and methods are disclosed for measuring time delays between pulse streams or other input signals and for measuring ion beam energies in an ion implantation system. A variable delay apparatus is applied to one input signal, and the signals are correlated or compared in a correlator apparatus providing a minimum, maximum, or other ascertainable output signal value when a delay value of the variable delay is representative of the time delay between the first and second input signals. By adjusting or sweeping the variable delay until the ascertainable correlator apparatus output value is obtained, the actual time delay is determined as the dialed-in value of the variable delay that produces the ascertainable correlator output value. The variable delay measurement apparatus and methods may be employed in ion implantation system for measuring ion beam energies using time of flight probes, wherein the system and the time delay measurement apparatus may be calibrated to remove any residual delays of the system, such as delay offsets related to channel imbalance in the system and connecting devices. In addition, a unique error correction method is disclosed, which may be applied to the time delay measurement system measurement to minimize or mitigate errors introduced by electronic components of the system.

公开(公告)号：EP0701269B1

公开(公告)日：1997-03-26

申请号：EP95115720.5

申请日：1990-08-17

Applicant: MITSUBISHI DENKI KABUSHIKI KAISHA ,  NISSHIN DENKI KABUSHIKI KAISHA

Inventor： Shono, Kazuhiro, c/o Mitsubishi Denki K.K. ,  Sasaki, Shigeo, c/o Mitsubishi Denki K.K. ,  Katoh, Susumu, c/o c/o Mitsubishi Denki K.K. ,  Naitou, Masao, c/o Nisshin Denki K.K. ,  Nakanishi, Tetsuya, c/o Mitsubishi Denki K.K. ,  Fujishita, Naomitsu, c/o Mitsubishi Denki K.K. ,  Noguchi, Kazuhiko, c/o Mitsubishi Denki K.K. ,  Tanjo, Masayasu, c/o Nisshin Denki K.K.

IPC: H01J37/317

CPC classification number: H01J37/302 ,  H01J37/3171 ,  H01J2237/05

公开(公告)号：EP3164880A4

公开(公告)日：2018-03-07

申请号：EP15814328

申请日：2015-07-01

Applicant: ATOMNAUT INC

Inventor： LIDDICOAT PETER V

IPC: H01J37/26 ,  H01J37/285

CPC classification number: H01J37/285 ,  H01J37/226 ,  H01J49/0004 ,  H01J49/40 ,  H01J2237/04 ,  H01J2237/05 ,  H01J2237/2067 ,  H01J2237/2855

Abstract: An imaging system that selectively alternates a first, non-destructive imaging mode and a second, destructive imaging mode to analyze a specimen so as to determine an atomic structure and composition of the specimen is provided. The field ionization mode can be used to acquire first images of ionized atoms of an imaging gas present in a chamber having the specimen disposed therein, and the field evaporation mode can be used to acquire second images of ionized specimen atoms evaporated from a surface of the specimen with the imaging gas remaining in the chamber. The first and second image data can be analyzed in real time, during the specimen analysis, and results can be used to dynamically adjust operating parameters of the imaging system.

公开(公告)号：EP2959502A1

公开(公告)日：2015-12-30

申请号：EP14753831.8

申请日：2014-02-25

Applicant: Exogenesis Corporation

Inventor： KIRKPATRICK, Sean, R.

IPC: H01L21/30 ,  H01L21/46 ,  H01L23/48

CPC classification number: G03F1/80 ,  G03F1/50 ,  G03F1/82 ,  H01J2237/0041 ,  H01J2237/05 ,  H01L21/02046 ,  H01L21/02065 ,  H01L2924/0002 ,  H01L2924/00012

Abstract: A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates. One embodiment provides a method of treating a surface of a substrate that contains one or more embedded particles or contains sub-surface damage, comprising the steps of: providing a reduced pressure chamber; forming a gas-cluster ion-beam comprising gas-cluster ions within the reduced pressure chamber; accelerating the gas-cluster ions to form an accelerated gas-duster ion-beam along a beam path within the reduced pressure chamber; promoting fragmentation and/or dissociation of at least a portion of the accelerated gas-cluster ions along the beam path; removing charged particles from the beam path to form an accelerated neutral beam along the beam path in the reduced pressure chamber; holding the surface in the beam path; and treating at least a portion of the surface of the substrate by irradiation.

Abstract translation: 用于处理基板表面的方法使用源自气体簇离子束的中性束照射和由其制造的制品包括光刻光掩模基板。 一个实施方案提供了一种处理含有一种或多种嵌入颗粒或含有亚表面损伤的基材表面的方法，包括以下步骤：提供减压室; 在所述减压室内形成包含气体簇离子的气体簇离子束; 加速气团离子，以在减压室内沿光束路径形成加速气团离子束; 促进沿着光束路径的加速气团离子的至少一部分的碎裂和/或解离; 从所述光束路径去除带电粒子以在所述减压室中沿着所述光束路径形成加速的中性光束; 将表面保持在光束路径中; 以及通过照射处理所述基材表面的至少一部分。

公开(公告)号：EP2434521A3

公开(公告)日：2015-08-05

申请号：EP11181316.8

申请日：2011-09-15

Applicant: IMEC

Inventor： Vandervorst, Wilfried

IPC: H01J37/285 ,  H01J37/22 ,  H01J49/00 ,  B82Y35/00

CPC classification number: H01J37/226 ,  H01J37/285 ,  H01J49/0004 ,  H01J2237/04 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/248 ,  H01J2237/2855

Abstract: The invention is related to a laser atom probe system comprising a specimen holder (7) whereon a specimen (2) to be analyzed may be mounted, the specimen having a tip shape, a detector (3), an electrode (1), arranged between the specimen holder (7) and the detector (3), a voltage source (4) configured to apply a voltage difference between the specimen tip and the electrode, at least one laser system (5,8), configured to direct a laser beam laterally at the specimen tip, and a tip shape monitoring means (10) configured to detect and monitor the tip shape, and/or a means for altering and/or controlling one or more laser parameters of said laser beam(s) so as to maintain, restore or control said specimen tip shape.