公开(公告)号：JP2001188347A

公开(公告)日：2001-07-10

申请号：JP2000137757

申请日：2000-05-10

Applicant: JSR CORP

Inventor： ISHII HIROYUKI ,  DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L33/14 ,  C08L45/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in shelf stability, having high transparency to radiation and excellent also in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape. SOLUTION: The radiation sensitive resin composition contains (A) an acid- dissociable group-containing resin having repeating units derived from a (meth) acrylic acid derivative having an alicyclic skeleton containing an oxygen- or nitrogen-containing polar group typified by 3-hydroxy-1-adamantyl (meth)acrylate or 3-(8'-cyanotetracyclo[4.4.0.12,5.17,10]dodecyl (meth)acrulate and repeating units derived from another (meth)acrylic acid derivative having an alicyclic skeleton typified by 2-methyl-2-adamantyl (meth)acrylate and convertible to an alkali- soluble resin when the acid-dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001166474A

公开(公告)日：2001-06-22

申请号：JP34491199

申请日：1999-12-03

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  KOBAYASHI HIDEKAZU ,  SHIOTANI TAKEO ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  C08L33/06 ,  G03F7/004 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as an excellent chemical amplification type resist which prevents a change of the line width of a resist pattern and the formation of T shape due to the time elapsed from exposure until heating after exposure [post-exposure delay(PED)], reduces the difference in light exposure between the upper and lower parts of a resist film by making the absorption of the composition to radiation as small as possible and retains rectangularity even in a very small pattern size. SOLUTION: The radiation sensitive resin composition contains a copolymer containing repeating units of formula 1 (where R1 is H or methyl; and R2 is a >=10C alicyclic alkyl having a functional group) and

公开(公告)号：JP2001147535A

公开(公告)日：2001-05-29

申请号：JP32973999

申请日：1999-11-19

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in dry etching resistance, sensitivity, resolution, etc., as a chemical amplification type resist, capable of avoiding a change of the line width of a resist pattern due to a change of the time elapsed from exposure to post-exposure heating and having superior process stability. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent. The component A is typified by a copolymer of a norbornene derivative typified by 8- hydroxytetracyclo[4.4.0.12,5.17,10]dodec-3-ene, itaconic anhydride and a (meth) acrylic acid derivative typified by a compound of formula 1.

公开(公告)号：JP2001109157A

公开(公告)日：2001-04-20

申请号：JP29129199

申请日：1999-10-13

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition having high transparency to radiation as a chemical amplification type resist, excellent in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape, causing no development defects in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or hardly alkali-soluble acid-dissociable group-containing resin typified by a resin having repeating units of the below formula 1 and (B) a radiation sensitive acid generating agent. The resin A is made alkali-soluble when the acid-dissociable group is dissociated.

公开(公告)号：JP2001042335A

公开(公告)日：2001-02-16

申请号：JP21582699

申请日：1999-07-29

Applicant: SEIKO EPSON CORP ,  JSR CORP

Inventor： YAZAKI MASAYUKI ,  YAMADA KENICHI ,  MUTSUKA YASUAKI ,  SHIMOKAWA TSUTOMU ,  BESSHO NOBUO

IPC: C08J5/18 ,  C08G73/10 ,  G02F1/1337

Abstract: PROBLEM TO BE SOLVED: To suppress deterioration of an alignment film against light while suppressing manufacturing costs by forming the specified alignment film on a liquid crystal layer side surface of a substrate in a liquid crystal device having liquid crystal interposed between a pair of substrates opposedly disposed. SOLUTION: This liquid crystal device is provided with a TFT array substrate 10 constituting a sample of one transparent substrate and an counter substrate 20 disposed being opposed to the substrate 10 and constituting a sample of the other transparent substrate. And the TFT array substrate 10 is provided with a picture element electrode 9a and an alignment film 16 subjected to a prescribed alignment treatment such as the rubbing treatment is provided on an upper side of the picture element electrode. On the other hand, the counter substrate 20 is provided with a counter electrode 21 over all the surface thereof and an alignment film 22 subjected to a prescribed alignment treatment such as the rubbing treatment is provided on the lower side of the counter electrode 21. Polyimide as an alignment material is applied on the surfaces to film-form the films 16 and 22 and then they are subjected to the rubbing treatment. At this time, aromatic group concentration in the polyimide is specified to be 0-30 wt.%, more preferably 2-25 wt.%.

公开(公告)号：JP2001040293A

公开(公告)日：2001-02-13

申请号：JP22042999

申请日：1999-08-03

Applicant: JSR CORP

Inventor： KAWAGUCHI KAZUO ,  SAITO AKIO ,  OTA YOSHIHISA ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  C08F299/02 ,  C08G10/02 ,  C08L61/18 ,  C09D161/18 ,  C09D201/00 ,  G03F7/11

Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition capable of forming a resist pattern having a high antireflection effect, not causing an inter mixing, having excellent resolution, accuracy, etc. by including a polymer containing a bifunctional group shown by a specific chemical structure and a solvent. SOLUTION: This composition comprises a polymer containing a bifunctional group of the formula (R1 is a monovalent atom or a monofunctional group; n is 0-4; plural R1 groups may be the same or different when n is 2-4; R2 and R3 are each a monovalent atom or a monofunctional group), a solvent such as ethylene glycol monomethyl ether, etc., (the amount of the solvent mixed is an amount to make the solid concentration of the obtained composition 0.1-50 wt.%) and preferably a curing agent such as tolylene diisocyanate, etc. The polymer is obtained, for example, by a condensation reaction between an acenaphthylene and an aldehyde.

公开(公告)号：JP2000063515A

公开(公告)日：2000-02-29

申请号：JP23612998

申请日：1998-08-21

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  MUTSUKA YASUAKI ,  NAKADA SHOICHI ,  YASUDA YOSHITOMO

IPC: G02F1/1337 ,  C08G73/06 ,  C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a polyamic acid good in liquid crystal aligning when made into a liquid crystal film, and useful as a liquid crystal aligning agent with a wide pretilt angle by reaction between a specific tetracarboxylic acid dianhydride and a specific diamine compound. SOLUTION: This polyamic acid is obtained by reaction between (A) a tetracarboxylic acid dianhydride including a compound of formula I (R1 is a 5-30C alkyl, halogen, 1-30C haloalkyl or a univalent organic group having steroidal skeleton; X is a single bond or bivalent bond group; R2 and R3 are each H or a univalent organic group; (a) is 1-4; (b) is 0-3) and (B) a diamine compound of the formula H2N-R4-NH2 (R4 is a bivalent organic group). By the way, the compound of formula I is prepared by ene reaction between maleic anhydride and the reaction product formed by Diels-Alder reaction between maleic anhydride and a styrene derivative of formula II.

公开(公告)号：JPH11312860A

公开(公告)日：1999-11-09

申请号：JP11755498

申请日：1998-04-27

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  MASUKO HIDEAKI ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01L21/3205 ,  H05K1/03 ,  H05K1/09 ,  H05K3/02 ,  H05K3/06 ,  H05K3/20

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing electrodes by which a high- difinition pattern can be formed and the workability be improved substantially, in comparison to the conventional method by using a transfer film when forming electrodes constituting an electrode wiring or projecting electrode, in a printed circuit board, multilayer circuit board, multi-chip module, LCD, LSI, PDP, EL, FED, etc. SOLUTION: In this manufacturing method, a conductive paste layer formed on a supporting film is transferred to a substrate 11, and a resist film is formed on the conductive paste layer 21, and then the resist film is exposed to form the latent image of a resist pattern. The resist film is developed to form a resist pattern 35, and the conductive paste layer 21 is etched to form the pattern thereof corresponding to the resist pattern, and then the pattern is made to thermoset.

公开(公告)号：JPH11255832A

公开(公告)日：1999-09-21

申请号：JP6254498

申请日：1998-03-13

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: C07F9/40 ,  C08F2/50 ,  C08F30/02 ,  C08F299/04 ,  C08G63/692 ,  C08G79/04 ,  C09D4/00

Abstract: PROBLEM TO BE SOLVED: To provide phosphorus atom-containing polymerizable compounds, a method for preparing the same and photocurable compositions. SOLUTION: Desired phosphorus atom-containing polymerizable compounds are represented by the formula (wherein R is phenyl, phenoxy or propyl; R is 1-4C alkyl; and X is Cl, chlorophenoxy or nitrophenoxy). These compounds can be prepared by the addition reaction of a 1-alkenyl glycidyl ether to an phosphonic acid ester. Polycondensation reaction products of these phosphorus atom-containing polymerizable compounds with dicarboxylic acids or (meth) acrylic acid are included in these phosphorus atom-containing polymerizable compounds. Photocurable compositions comprise said phosphorus atom-containing polymerizable compounds and a photo-acid generator which generates an acid with light.

公开(公告)号：JP2012185945A

公开(公告)日：2012-09-27

申请号：JP2011046974

申请日：2011-03-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAZAKI MASAHIRO ,  YASUDA YOSHITOMO ,  SHIMOKAWA TSUTOMU

IPC: H01M14/00 ,  H01L31/04

CPC classification number: Y02E10/52 ,  Y02E10/542 ,  Y02P70/521

Abstract: PROBLEM TO BE SOLVED: To provide a compact photoelectric conversion device having a high photoelectric conversion efficiency and capable of forming dye-sensitized solar cells of various shapes, and to provide a solar cell equipped with it.SOLUTION: The photoelectric conversion device comprise a cell body and first and second linear electrodes arranged in the cell body, separately, a light diffusion body diffusing the light guided from the outside of the cell body in the cell body, and an electrolyte filling the cell body. The first electrode is in close proximity to the light diffusion body, and is covered with a porous metal oxide semiconductor carrying sensitized dye.

Abstract translation: 解决的问题：提供具有高光电转换效率并且能够形成各种形状的染料敏化太阳能电池的紧凑型光电转换装置，并提供配备有它的太阳能电池。 解决方案：光电转换装置包括电池体和布置在电池体中的第一和第二线性电极，单独地，将从电池体中的电池体外部引导的光扩散的光漫射体和电解质 填充细胞体。 第一电极靠近光扩散体，并被带有敏化染料的多孔金属氧化物半导体覆盖。 版权所有（C）2012，JPO＆INPIT