公开(公告)号：KR1020040044798A

公开(公告)日：2004-05-31

申请号：KR1020020072975

申请日：2002-11-22

Applicant: 한국전자통신연구원

Inventor： 최상국 ,  김대용 ,  강동열

IPC: H01J37/147

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: PURPOSE: A deflector and a method are provided to achieve improved accuracy of alignment of deflection plates and structural stability by directly forming deflection plates, wire and pad on the substrate. CONSTITUTION: A deflector comprises an isolating substrate(11) having a hole formed at the center of the isolating substrate; a plurality of deflection plates arranged on the top and bottom of the isolating substrate along the circumference of the hole; a plurality of pads arranged along the edges of the top and bottom of the isolating substrate; and a plurality of wires for connecting the deflecting plates and the pads. The deflecting plates, wire, and the pad are integrally formed into a single unit. A method for manufacturing a deflector comprises a step of forming a hole at the center of a substrate, filling the hole with a polymer(13), and solidifying the resultant structure; a step of forming seed metal layers(14a,14b) on both sides of the substrate, and forming a first mask pattern in such a manner that the seed metal layer of the portion where a deflecting plate, wire and a pad are to be formed is exposed; a step of forming a first metal layer(16a) on the seed metal layer of the exposed portion; a step of forming second mask patterns on both sides of the substrate in such a manner that the first metal layer of the portion where the deflection plate is to be formed is exposed; a step of forming a second metal layer(16b) on the first metal layer of the exposed portion; a step of removing the second and first mask patterns; and a step of removing the seed metal layer of the exposed portion and the polymer from the hole.

Abstract translation: 目的：提供偏转器和方法，通过在基板上直接形成偏转板，导线和焊盘，实现偏转板对准的精度提高和结构稳定性。 构成：偏转器包括隔离衬底（11），其具有形成在隔离衬底的中心处的孔; 多个偏转板，沿着孔的圆周布置在隔离衬底的顶部和底部上; 沿隔离衬底的顶部和底部的边缘布置的多个焊盘; 以及用于连接偏转板和垫的多根线。 偏转板，线和垫整体形成为单个单元。 制造偏转器的方法包括在基板的中心形成孔，用聚合物（13）填充孔，并使所得结构固化的步骤; 在衬底的两侧形成种子金属层（14a，14b）的步骤，并且形成第一掩模图案，使得要形成偏转板，线和焊盘的部分的种子金属层 被暴露 在暴露部分的种子金属层上形成第一金属层（16a）的步骤; 以使得要形成偏转板的部分的第一金属层露出的方式在基板的两侧上形成第二掩模图案的步骤; 在暴露部分的第一金属层上形成第二金属层（16b）的步骤; 去除第二和第一掩模图案的步骤; 以及从孔中去除暴露部分的种子金属层和聚合物的步骤。

公开(公告)号：JP5697414B2

公开(公告)日：2015-04-08

申请号：JP2010259523

申请日：2010-11-19

Applicant: キヤノン株式会社

Inventor： 伊藤 博仁

IPC: G03F7/20 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

公开(公告)号：JP5438161B2

公开(公告)日：2014-03-12

申请号：JP2012091762

申请日：2012-04-13

Applicant: 株式会社アドバンテスト ,  株式会社日立情報通信エンジニアリング

Inventor： 高雅 佐藤 ,  亮三 吉野 ,  敦 東野

IPC: H03M1/66

CPC classification number: H03M1/66 ,  H01J3/26 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/1504

公开(公告)号：JP2011171009A

公开(公告)日：2011-09-01

申请号：JP2010031605

申请日：2010-02-16

Applicant: Sii Nanotechnology Inc ,  エスアイアイ・ナノテクノロジー株式会社

Inventor： OGAWA TAKASHI ,  NISHINAKA KENICHI ,  SUGIYAMA YASUHIKO

IPC: H01J37/317 ,  H01J27/26 ,  H01J37/04 ,  H01J37/08 ,  H01J37/09 ,  H01J37/147

CPC classification number: H01J3/14 ,  H01J3/26

Abstract: PROBLEM TO BE SOLVED: To achieve a stable irradiation of a beam without using a complicated adjusting mechanism. SOLUTION: A focused ion beam device includes: a needle-like chip 1; a gas-supplying part including a gas nozzle 2 for an ion source and a gas supply source 3 for the ion source to supply gas to the chip 1; an extraction electrode 4 applying voltage with the chip 1 and extracting ions by ionizing the gas adsorbed onto a surface of the chip 1; an ion gun part 19 including a cathode electrode 5 accelerating ions toward a sample 13; a gun alignment electrode 9 located closer to the sample 13 than the ion gun part 19 and adjusting an irradiation direction of an ion beam 11 emitted from the ion gun part 19; and a lens system including a focusing lens electrode 6 focusing the ion beam 11 on the sample 13 and an objective lens electrode 8. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了实现光束的稳定照射而不使用复杂的调节机构。 解决方案：聚焦离子束装置包括：针状芯片1; 气体供给部，其包括用于离子源的气体喷嘴2和用于离子源的气体供给源3，以向芯片1供应气体; 提取电极4，利用芯片1施加电压，并通过电离吸附在芯片1的表面上的气体提取离子; 离子枪部19，其具有将离子朝向样品13加速的阴极电极5; 比离子枪部19更靠近样本13的枪对准电极9，并且调节从离子枪部19发射的离子束11的照射方向; 以及透镜系统，其包括将离子束11聚焦在样品13上的聚焦透镜电极6和物镜电极8.版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP4673450B1

公开(公告)日：2011-04-20

申请号：JP2010543241

申请日：2010-08-20

Applicant: 三菱電機株式会社

Inventor： 雅 片寄

IPC: A61N5/10

CPC classification number: A61N5/1077 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K5/02 ,  H01J3/26

Abstract: The objective is to obtain a particle beam irradiation apparatus that can perform in a changeable manner the combination of a plurality of parameters in particle beam irradiation, such as the combination of irradiation fields and irradiation position accuracies, and that can perform diverse-variation irradiation. The particle beam irradiation apparatus (58) irradiates a charged particle beam (3) accelerated by a accelerator (54) onto an irradiation subject (11); the particle beam irradiation apparatus (58) includes a scanning electromagnet (1, 2) that scans the charged particle beam (3), and a scanning electromagnet moving apparatus (4) that moves the scanning electromagnet (1, 2) in such a way as to change the distance between the scanning electromagnet (1, 2) and the irradiation subject (11) in the beam axis direction of the charged particle beam (3).

公开(公告)号：JP2014165075A

公开(公告)日：2014-09-08

申请号：JP2013036257

申请日：2013-02-26

Applicant: Nuflare Technology Inc ,  株式会社ニューフレアテクノロジー

Inventor： MIYAMOTO FUSAO

IPC: H01J37/04 ,  G03F7/20 ,  H01J37/06 ,  H01J37/305 ,  H01L21/027

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

Abstract: PROBLEM TO BE SOLVED: To provide a method of optimizing a cathode temperature of an electron gun in a short time when regulating an emission current in order to obtain a desired current density.SOLUTION: An operation temperature adjustment method of a cathode includes the steps of: acquiring an approximation formula approximating a correlation between an emission current value and an operation temperature of the cathode; measuring a current density of an electron beam emitted from the cathode in the state where an n-th emission current value and an n-th operation temperature of the cathode are set to an electron beam source; determining whether the measured current density is within an allowable range; changing the set n-th emission current value into an (n+1)th emission current value in the case where the current density is not within the allowable range; and using the approximation formula to compute an operation temperature of the cathode corresponding to the (n+1)th emission current value and setting the computed operation temperature to the electron beam source as an (n+1)th operation temperature of the cathode.

Abstract translation: 要解决的问题：提供一种在调节发射电流时在短时间内优化电子枪的阴极温度以获得期望的电流密度的方法。解决方案：阴极的操作温度调节方法包括以下步骤： 获取逼近发射电流值与阴极的工作温度之间的相关性的近似公式; 在将阴极的第n发射电流值和第n工作温度设定为电子束源的状态下，测量从阴极发射的电子束的电流密度; 确定所测量的电流密度是否在容许范围内; 在电流密度不在容许范围的情况下，将第n次发射电流值改变为第（n + 1）发射电流值; 并且使用近似公式来计算对应于第（n + 1）个发射电流值的阴极的操作温度，并将计算出的工作温度设置为电子束源作为阴极的第（n + 1）个操作温度。

公开(公告)号：JP2013503452A

公开(公告)日：2013-01-31

申请号：JP2012527056

申请日：2010-08-28

Applicant: エフ・イ−・アイ・カンパニー

Inventor： ジーン・ミロ ,  コーネリス・サンデル・クイマン ,  ヘンドリック・ヤン・デ・フォス ,  トム・ミラー

IPC: H01J37/147 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: 荷電粒子ビームを導く改良された方法であり、１つまたは複数の偏向器信号を変化させることによって、荷電粒子がシステムを通過するのに要する時間を補償する方法。 本発明の一実施形態によれば、ＴＯＦエラーが原因で起こることがあるオーバシュート効果を低減させ、または排除するために、デジタル−アナログ（Ｄ／Ａ）変換の前に、走査パターンをデジタル・フィルタにかける。 他の実施形態では、ＴＯＦエラーを補償するのに、アナログ・フィルタ、またはより低い帯域幅を有する信号増幅器の使用を使用することもできる。 走査パターンを変化させることによって、オーバシュート効果をかなり低減させ、または排除することができる。

公开(公告)号：JP2012114123A

公开(公告)日：2012-06-14

申请号：JP2010259523

申请日：2010-11-19

Applicant: Canon Inc ,  キヤノン株式会社

Inventor： ITO HIROHITO

IPC: H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

Abstract: PROBLEM TO BE SOLVED: To provide a technique advantageous to achieve high throughput with a reduced buffer memory capacity in a charged particle beam lithography apparatus.SOLUTION: A charged particle beam lithography apparatus includes a deflector for deflecting a charged particle beam and a stage mechanism for driving a substrate. The deflector scans the charged particle beam in a main scanning direction, and the stage mechanism scans the substrate in a sub-scanning direction, so that a pattern is drawn on the substrate. The charged particle beam lithography apparatus further includes: a blanker unit for controlling irradiating or not irradiating the substrate with the charged particle beam; and a control unit for controlling, when the drawing on the substrate is resumed after suspended in a state the stage mechanism drives the substrate in the sub-scanning direction, the deflector to deflect the charged particle beam in the sub-scanning direction, by the drive amount of the substrate by the stage mechanism in the sub-scanning direction during a period from the suspension to the resumption of the drawing.

Abstract translation: 要解决的问题：提供一种有利于在带电粒子束光刻设备中以减小的缓冲存储器容量实现高吞吐量的技术。 解决方案：带电粒子束光刻设备包括用于偏转带电粒子束的偏转器和用于驱动衬底的平台机构。 偏转器沿主扫描方向扫描带电粒子束，并且载物台机构沿副扫描方向扫描基板，从而在基板上绘制图案。 带电粒子光刻设备还包括：用于控制用带电粒子束照射或不照射衬底的消隐单元; 以及控制单元，用于当在所述平台机构在副扫描方向上驱动所述基板的状态下暂停所述基板上的所述拉伸时，控制所述偏转器，以使所述带电粒子束沿副扫描方向偏转， 在从暂停到恢复的时间段期间，通过平台机构在副扫描方向上的基板的驱动量。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011159625A

公开(公告)日：2011-08-18

申请号：JP2011015823

申请日：2011-01-27

Applicant: Carl Zeiss Nts Gmbh ,  カール・ツァイス・エヌティーエス・ゲーエムベーハーCarl Zeiss NTS GmbH

Inventor： GLASMACHERS ALBRECHT ,  LAUE ALEXANDER ,  ALIMAN MICHEL ,  MANTZ HUBERT ,  ZEILE ULRIKE ,  DOEMER HOLGER

IPC: H01J49/06 ,  G01N27/62 ,  H01J49/10

CPC classification number: H01J37/265 ,  H01J3/26 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J49/063 ,  H01J49/065 ,  H01J49/10 ,  H01J2237/05 ,  H01J2237/2449 ,  H01J2237/2527

Abstract: PROBLEM TO BE SOLVED: To provide a device which is simple in design and easy in connection of respective elements in the device for transferring energy of ions to at least one gas particle and/or the device for transporting ions. SOLUTION: In the energy transfer and/or ion transportation devices 1200, 1300 for transferring energy of at least one ion to at least one gas particle in a gas, a container 1201 internally containing a gas is prepared, and the container 1201 has a transportation axis. Furthermore, at least one first multipole unit and at least one second multipole unit are arranged, and the first multipole unit and the second multipole unit are arranged along the transportation axis. The first multipole unit and the second multipole unit are formed by a printed circuit board. Furthermore, an electronic circuit is arranged to generate a potential gradient by applying potential to each multipole unit, and especially, the potential gradient is generated along the transportation axis. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种设备简单且容易连接设备中用于将能量离子转移至至少一个气体颗粒的装置和/或用于输送离子的装置的装置。 解决方案：在用于将至少一种离子的能量转移到气体中的至少一种气体粒子的能量转移和/或离子输送装置1200,1300中，制备内部容纳气体的容器1201，容器1201 有运输轴。 此外，布置至少一个第一多极单元和至少一个第二多极单元，并且第一多极单元和第二多极单元沿着输送轴线布置。 第一多极单元和第二多极单元由印刷电路板形成。 此外，电子电路被布置为通过向每个多极单元施加电位来产生电位梯度，并且特别地，沿着输送轴产生电位梯度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：US09748067B2

公开(公告)日：2017-08-29

申请号：US14709068

申请日：2015-05-11

Applicant: Jan Berk ,  Thomas Weidinger

Inventor： Jan Berk ,  Thomas Weidinger

IPC: H01J29/00 ,  H01J29/98 ,  H05G1/66 ,  H01J29/70 ,  H01J35/14 ,  H01J3/26

CPC classification number: H01J29/98 ,  H01J3/26 ,  H01J29/70 ,  H01J35/14 ,  H05G1/66

Abstract: A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potential level, and a deflection module, which has two inputs and at least one deflection coil, wherein the at least one deflection coil is connected between the two inputs of the deflection module.