公开(公告)号：GB1523297A

公开(公告)日：1978-08-31

申请号：GB4443775

申请日：1975-10-28

Applicant: STEIGERWALD STRAHLTECH

IPC: H01J37/04 ,  B23K15/02 ,  G05F1/46 ,  H01J37/30 ,  H01J37/304 ,  H01J3/08

Abstract: 1523297 Automatic current control STEIGERWALD STRAHLTECHNIK GmbH 28 Oct 1975 [29 Oct 1974] 44437/75 Heading G3R The current in a charged particle beam is regulated by continuously measuring the emission current of the particle source, correcting the measured value by multiplying it by the ratio of workpiece current to emission current when the beam is first directed on to the workpiece, and comparing the corrected value with a desired workpiece current to produce a current control signal. As shown, electron beam apparatus 10 for boring, cutting or welding a workpiece 12 includes a cathode 14, anode 18 and Wehnelt cylinder control electrode 16, and is energized from a high voltage source 30. A deflection device 24 initially directs the beam on to a collector 26, but a start signal from a source 42 causes the beam to strike the workpiece 12 after passing through a coil 28 which produces a pulse with an amplitude proportional to the instantaneous value of the current striking the workpiece. This pulse is fed to a regulator 36 which effectively divides its amplitude by the total beam emission current as sensed by a resistor 32, thus producing a value for the beam current efficiency which is multiplied by the emission current during operation so as to provide a continuous signal representing actual workpiece current. This signal is compared with a reference voltage from a source 38 using a PI regulator circuit which feeds a signal to a control voltage source 34 connected to the current control electrode 16. Digital counting and logic circuitry for carrying out the functions of the regulator 36 is described with reference to Fig. 2 (not shown), and it is stated that analog circuitry may also be used.

公开(公告)号：PL201843A1

公开(公告)日：1978-06-19

申请号：PL20184377

申请日：1977-10-29

Applicant: RCA CORP

Inventor： GANGE ROBERT A

IPC: H01J31/12 ,  H01J1/20 ,  H01J3/08 ,  H01J29/04 ,  H01J29/52 ,  H01J1/28

公开(公告)号：FR2365203A1

公开(公告)日：1978-04-14

申请号：FR7628313

申请日：1976-09-21

Applicant: INST VYSOKIKH TEMPERATUR AKADE

IPC: H01J1/46 ,  H01J3/00 ,  H01J3/08

Abstract: The electric braking system for accelerated charged particle beam is intended for application in high voltage tubes with electron recovery. It has three electrodes mounted behind each other in the path of the beam. The first electrode is of the same potential as the particle beam energy, the second electrode is at a potential near zero, and the third electrode is at lower potential of the same sign as the first electrode, serving as a particle target. The second electrode (11) consists of a set of pointed elements (13), whose tips are directed to the particle beam (5) from two sides. Preferably the pointed elements are in the form of sharp edges in mutually parallel configuration. Alternately the edges may be arranged at mutually orthogonal directions, in order to form a grid structure.

公开(公告)号：DE2600137A1

公开(公告)日：1977-07-07

申请号：DE2600137

申请日：1976-01-03

Applicant: FROESCHLE ERNST PROF DIPL PHYS

Inventor： FROESCHLE ERNST PROF DIPL PHYS

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/312 ,  H01J3/08 ,  H01J37/28

Abstract: The electron beam irradiation is used in semiconductor elements production, applying photolithographic methods, utilising electron beam sensitive lacquers. For this purpose the photolacquer mask structures are irradiated by electron beams of different energy, ie the edge zones of the photolacquer masks are irradiated with electron beams of higher energy. Preferably these edge zones are irradiated with an energy corresponding to an acceleration voltage of 15 k V or more. Typically the edge zones irradiated with a higher energy are narrower than 015 microns. The diameter of the electron beam for the edge zones irradiation is smaller than that of the beam for inner zones irradiation.

公开(公告)号：US09287030B2

公开(公告)日：2016-03-15

申请号：US13116699

申请日：2011-05-26

Applicant: Franc Zajc

Inventor： Franc Zajc

IPC: H01F7/06 ,  H01F7/127 ,  H02K15/02 ,  H02K15/03 ,  H01F27/245 ,  H01F27/25 ,  H01F27/26 ,  H01F27/28 ,  H01J3/14 ,  G11B5/17 ,  H01J3/08

CPC classification number: H01F7/06 ,  G11B5/17 ,  H01F7/127 ,  H01F27/245 ,  H01F27/25 ,  H01F27/26 ,  H01F27/263 ,  H01F27/2828 ,  H01F27/2847 ,  H01F2027/2861 ,  H01J3/08 ,  H01J3/14 ,  H02K15/024 ,  H02K15/03 ,  Y10T29/4902 ,  Y10T29/49075 ,  Y10T29/49078 ,  Y10T29/49126

Abstract: A multi-gap inductor core includes magnetic lamination sheets made of magnetic core material arranged in a stack, and fixing layers made of a fixing material. Each fixing layer is arranged between a corresponding pair of adjacent magnetic lamination sheets. Each fixing layer also includes an embedded mechanical spacer that defines a gap having a predetermined thickness between a corresponding pair of adjacent magnetic lamination sheets.

Abstract translation: 多间隙电感器芯包括由堆叠形成的磁芯材料制成的磁性层压片和由固定材料制成的固定层。 每个固定层布置在相应的一对相邻的磁性层压片之间。 每个固定层还包括嵌入的机械间隔件，其限定了在相应的一对相邻的磁性层压片之间具有预定厚度的间隙。

公开(公告)号：US09269520B2

公开(公告)日：2016-02-23

申请号：US14621526

申请日：2015-02-13

Applicant: JEOL Ltd.

Inventor： Takashi Satoh

IPC: H01J29/58 ,  H01J3/08 ,  H01J3/02 ,  H01J37/063 ,  H01J37/305 ,  B23K15/00 ,  B23K15/06 ,  B33Y30/00

CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

Abstract translation: 如果不能使用限流孔，则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪（10）具有阴极（11），Wehnelt电极（12），控制电极（13），阳极（14）和控制器（22）。 Wehnelt电极（12）具有插入阴极顶端的第一开口（12c），并聚焦从阴极（11）的尖端发射的热电子。 从阴极（11）的顶端发射的热电子被控制电极（13）通入第二开口（13c）。 阳极（14）加速从阴极（11）发射的热电子，使得穿过第二开口（13c）的热电子通过第三开口（14b）并作为电子束（B1）撞击在粉末样品上 （8）。 控制器（22）基于偏置电压和控制电压的组合条件设置偏置电压和控制电压，以保持光束的亮度恒定。

公开(公告)号：US20100133445A1

公开(公告)日：2010-06-03

申请号：US12600540

申请日：2008-05-20

Applicant: Akira Noda ,  Toshiyuki Shirai ,  Masahiro Ikegami ,  Shu Nakamura ,  Hiroyuki Daido ,  Kouji Noda

Inventor： Akira Noda ,  Toshiyuki Shirai ,  Masahiro Ikegami ,  Shu Nakamura ,  Hiroyuki Daido ,  Kouji Noda

IPC: H01J3/08 ,  H01J27/00 ,  H01J3/12 ,  H01J3/14

CPC classification number: G21K1/087 ,  A61N2005/1087 ,  A61N2005/1088 ,  H05H7/12

Abstract: Provided are an ion beam control apparatus and a control method for controlling an ion beam energy expansion level and an ion beam size in a radial direction. An ion beam control apparatus Sa is provided with an ion beam generating unit 2, and an ion beam control unit 1a in which a generated ion beam (IB) is input and controlled to be output with the prescribed level of energy expansion and the prescribed diameter in the radial direction. In the ion beam control unit 1a, phase rotation by a radio frequency electric field that increases existing probability with the prescribed level of energy is at least used.

Abstract translation: 提供了一种用于控制离子束能量膨胀水平和离子束尺寸在径向方向上的离子束控制装置和控制方法。 离子束控制装置Sa设置有离子束产生单元2和离子束控制单元1a，其中生成的离子束（IB）被输入并被控制为以规定的能量膨胀水平和规定的直径输出 在径向方向。 在离子束控制单元1a中，至少使用通过以规定的能量水平增加现有概率的射频电场的相位旋转。

公开(公告)号：US20050156521A1

公开(公告)日：2005-07-21

申请号：US11035914

申请日：2005-01-14

Applicant: Zvi Yaniv ,  Igor Pavlovsky ,  Richard Fink

Inventor： Zvi Yaniv ,  Igor Pavlovsky ,  Richard Fink

IPC: H01J3/08 ,  H01J21/04 ,  H01J29/52 ,  H01J1/02

CPC classification number: H01J21/04 ,  H01J3/08 ,  H01J29/52

Abstract: An optoelectronic modulator is based on the concentration of an electron beam from an electron gun by a tapered cavity, which sides are photosensitive and change the electrical conductivity under the illumination of light (electromagnetic radiation). The light modulation causes the corresponding changes in the current transported across the walls of the cavity. The remaining part of the electron current exits the cavity aperture and forms an amplitude-modulated divergent electron beam.

Abstract translation: 光电子调制器基于来自电子枪的锥形空腔的电子束的浓度，这些侧面是光敏的并且在光的照射下（电磁辐射）改变电导率。 光调制导致当前在空腔壁上传输的电流的相应变化。 电子电流的剩余部分离开腔孔并形成幅度调制的发散电子束。

公开(公告)号：US5986388A

公开(公告)日：1999-11-16

申请号：US920508

申请日：1997-08-29

Applicant: Hideo Makishima

Inventor： Hideo Makishima

IPC: H01J23/04 ,  H01J1/304 ,  H01J3/02 ,  H01J3/08 ,  H01J3/18 ,  H01J23/06 ,  H01J23/075 ,  H01J29/04 ,  H01J1/02

CPC classification number: H01J23/075 ,  H01J3/022 ,  H01J2225/34

Abstract: A field-emission cathode comprises a substrate having a conductive surface, a gate electrode and a focusing electrode overlying the substrate with insulation layers interposed therebetween, a plurality of cavities formed by penetrating the gate electrode, focusing electrode and insulation layers, and an emitter formed in each of the cavities on the substrate for emission of an electron beam. The emitter has tip located at a level between the gate electrode and the focusing electrode, which receive therebetween a signal for modulating the electron beam at a high frequency.

Abstract translation: 场发射阴极包括具有导电表面的衬底，栅电极和聚焦电极，覆盖衬底上的绝缘层，穿过栅电极，聚焦电极和绝缘层形成的多个空腔和形成的发射极 在用于发射电子束的基板上的每个空腔中。 发射极具有位于栅电极和聚焦电极之间的电平上的尖端，其间接收高频调制电子束的信号。

公开(公告)号：US5185554A

公开(公告)日：1993-02-09

申请号：US497072

申请日：1990-03-21

Applicant: Ichiro Nomura ,  Toshihiko Takeda ,  Yoshikazu Banno ,  Tetsuya Kaneko ,  Haruhito Ono ,  Hidetoshi Suzuki

Inventor： Ichiro Nomura ,  Toshihiko Takeda ,  Yoshikazu Banno ,  Tetsuya Kaneko ,  Haruhito Ono ,  Hidetoshi Suzuki

IPC: H01J9/02 ,  G09F9/30 ,  H01J1/316 ,  H01J3/08 ,  H01J9/14 ,  H01J29/04 ,  H01J29/52 ,  H01J31/12

CPC classification number: B82Y10/00 ,  H01J1/316 ,  H01J31/127 ,  H01J2201/3165 ,  H01J2329/00

Abstract: An electron-beam generator includes an electron-emitting device and a modulating electrode capable of modulating an electron beam emitted from the electron-emitting device in response to an information signal. The modulating electrode and the electron-emitting device are laminated so as to interpose an insulating substrate therebetween.