公开(公告)号：EP2091063A2

公开(公告)日：2009-08-19

申请号：EP08019777.5

申请日：2008-11-12

Applicant: Hitachi Ltd.

Inventor： Kasai, Hiroto ,  Harada, Ken

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/141

CPC classification number: H01J37/26 ,  H01J37/141 ,  H01J37/20 ,  H01J2237/14 ,  H01J2237/20 ,  H01J2237/201 ,  H01J2237/2802

Abstract: An electron beam observation device includes a mechanism which disposes a specimen at an upstream side in an electron beam traveling direction outside an objective lens, from which an image is transferred under a magnification of 1/5 to 1/30, in addition to an inside of the objective lens in which a specimen is disposed at a time of ordinary observation.

Abstract translation: 一种电子束观察装置，其特征在于，具有将除了内部之外的1/5〜1/30的倍率下进行图像转印的物镜外的电子束行进方向的上游侧的试样配置的机构 在普通观察时放置样本的物镜。

公开(公告)号：EP2001038A2

公开(公告)日：2008-12-10

申请号：EP08157672.0

申请日：2008-06-05

Applicant: Carl Zeiss NTS GmbH

Inventor： Zeile, Ulrike ,  Schertel, Dr. Andreas

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/305

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/201 ,  H01J2237/20207 ,  H01J2237/206 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Die Erfindung betrifft ein Teilchenstrahlgerät (1) und ein Verfahren zur Anwendung bei einem Teilchenstrahlgerät (1), bei denen eine Probe auf einem Trägerelement (5) angeordnet ist. Der Erfindung liegt die Aufgabe zugrunde, ein Teilchenstrahlgerät und ein in diesem Teilchenstrahlgerät anwendbares Verfahren zur Probenpräparation und/oder Probenuntersuchung anzugeben, wobei die Vorrichtung einfach aufgebaut ist und wobei das Verfahren nicht sehr zeitaufwendig ist. Diese Aufgabe wird durch ein Teilchenstrahlgerät (1) gelöst, das ein bewegliches Trägerelement (5) mit zwei Aufnahmeelementen (6, 7) zur Aufnahme von jeweils einer Probe aufweist bzw. bei dem das Aufnahmeelement lösbar am Trägerelement angeordnet ist. Das erfindungsgemäße Verfahren sieht die Verwendung dieses Trägerelements (5) vor.

Abstract translation: 粒子束装置（1）具有带有光轴的粒子束（3,4）。 支撑元件（5）以垂直布置的三个空间方向（x，y，z）以移动的方式形成。 支撑元件绕轴线（8）旋转，该轴线（8）平行布置用于光轴，该轴线围绕另一个平行布置用于光轴的轴线旋转。 独立权利要求还包括以下内容：（1）电子显微镜，特别是扫描电子显微镜或透射电子显微镜（2）用于支撑一个或多个探针的系统（3），用于分析和制备探针的方法，特别是 用于粒子束装置。

公开(公告)号：EP1780764A1

公开(公告)日：2007-05-02

申请号：EP05110225.9

申请日：2005-11-01

Applicant: FEI COMPANY

Inventor： Tappel, Hendrik Gezinus ,  van Hees, Ian Johannes Bernardus ,  Lankers, Danny ,  Giannuzzi, Lucille ,  van Veen, Gerard Nicolaas Anne ,  Young, Richard

IPC: H01J37/20 ,  H01L21/68 ,  H01J37/30

CPC classification number: H01L21/68 ,  G01R31/2898 ,  H01J37/20 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20242 ,  H01L21/68764

Abstract: A particle-optical apparatus comprising:
- A first source, for generating a first irradiating beam along a first axis;
- A second source, for generating a second irradiating beam along a second axis that intersects the first axis at a beam intersection point, the first and second axes defining a beam plane,
- A stage assembly (3) for positioning a sample in the vicinity of the beam intersection point, provided with:
- A sample table (21) to which the sample can be mounted;
- A set of actuators, arranged so as to effect translation of the sample table along directions substantially parallel to an X-axis perpendicular to the beam plane, a Y-axis parallel to the beam plane, and a Z-axis parallel to the beam plane, said X-axis, Y-axis and Z-axis being mutually orthogonal and passing through the beam intersection point, wherein the set of actuators is further arranged to effect:
- rotation of the sample table about a rotation axis substantially parallel to the Z-axis, and;
- rotation of the sample table about a flip axis substantially perpendicular to the Z-axis, whereby the flip axis can itself be rotated about the rotation axis.

Abstract translation: 甲粒子光学设备，包括： - 第一源，用于产生沿着第一轴的第一照射束; - 第二源，用于沿第二轴线产生第二照射束确实相交的第一轴线在束交叉点，所述第一和第二轴线限定一个光束平面上， - 为在附近定位样品A级组件（3） 光束交点，设置有： - 以可安装样品的样品台（21）; - 一组致动器，布置成实现所述试样台的平移沿着方向基本上平行于在X轴垂直于光束平面，平行于束平面的Y轴，和平行Z轴的光束 规划所述X轴，Y轴和Z轴相互正交，并穿过分束交点，worin该组致动器进一步被布置成作用： - 样品台的旋转绕旋转轴线基本上平行于 Z轴，和; - 约倒装轴用的试样台大致垂直于所述Z轴，由此翻转轴线本身可以绕旋转轴线旋转。

公开(公告)号：EP0801810B1

公开(公告)日：2005-09-14

申请号：EP95942797.2

申请日：1995-12-28

Applicant: Technische Universiteit Delft ,  STICHTING SCHEIKUNDIG ONDERZOEK IN NEDERLAND (SON) ,  Stichting voor de Technische Wetenschappen

Inventor： ZANDBERGEN, Hendrik, Willem ,  LATENSTEIN VAN VOORST, André ,  WESTRA, Cornelis ,  HOVELING, Gerardus, Hendrikus

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204

Abstract: A specimen holder for an electron microscope, comprising a bar-shaped body provided adjacent one end with means for receiving a specimen, with means being present for screening the specimen from the environment at least temporarily in airtight and moisture-proof manner in a first position, which screening means comprise at least one elastic seal surrounding the bar-shaped body at least in the first position, and supporting means for arranging the specimen holder in a service position. In a second position, wherein the screening means have been removed from the first position, the bar-shaped body with the specimen-receiving means is supported by the supporting means without intermediacy of the elastic seal. The invention further relates to a device for mounting a specimen in an electron microscope.

公开(公告)号：EP1509761A2

公开(公告)日：2005-03-02

申请号：EP03725574.2

申请日：2003-06-01

Applicant: Quantomix Ltd.

Inventor： BEHAR, Vered ,  NECHUSHTAN, Amotz ,  KLIGER, Yossef ,  GILEADI, Opher

IPC: G01N23/00 ,  H01J37/256

CPC classification number: B01L3/50855 ,  B01L3/508 ,  B01L2200/0689 ,  B01L2300/042 ,  B01L2300/0654 ,  B01L2300/0829 ,  G01N1/36 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/2003 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/2608

Abstract: A B S T R A C T A method of visualizing a sample in a wet environment including introducing a sample into a specimen enclosure in a wet environment and scanning the sample in the specimen enclosure in a scanning electron microscope, thereby visualizing the sample.

公开(公告)号：US20240297016A1

公开(公告)日：2024-09-05

申请号：US18662669

申请日：2024-05-13

Applicant: APPLIED Materials, Inc.

Inventor： Anthony RENAU ,  Joseph C. OLSON ,  Peter F. KURUNCZI

IPC: H01J37/304 ,  H01J37/20

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J2237/201

Abstract: A system may include a substrate stage to support a substrate, and a plurality of beam sources. The plurality of beam sources may include an ion beam source, the ion beam source arranged to direct an ion beam to the substrate, and a radical beam source, the radical beam source arranged to direct a radical beam to the substrate. The system may include a controller configured to control the ion beam source and the radical beam source to operate independently of one another, in at least one aspect, wherein the at least one aspect includes beam composition, beam angle of incidence, and relative scanning of a beam source with respect to the substrate.

公开(公告)号：US20240249921A1

公开(公告)日：2024-07-25

申请号：US18156917

申请日：2023-01-19

Applicant: Tokyo Electron Limited

Inventor： Minjoon Park ,  Andrew Metz

IPC: H01J37/32 ,  H01L21/311

CPC classification number: H01J37/32477 ,  H01J37/32642 ,  H01J37/32743 ,  H01J37/32807 ,  H01L21/31116 ,  H01L21/31144 ,  H01J37/32091 ,  H01J37/3288 ,  H01J2237/201 ,  H01J2237/24585 ,  H01J2237/334

Abstract: A method of etching a substrate includes loading the substrate into a plasma etch chamber, the plasma etch chamber including a focus ring surrounding the substrate, the focus ring including a bulk material and a surface layer, the surface layer including a refractory metal; flowing a process gas including fluorine and carbon into the plasma etch chamber; coating a carbide layer over the surface layer of the focus ring, the coating including exposing the focus ring to a plasma generated from the process gas in the plasma etch chamber, the carbide layer including a carbide of the refractory metal; and etching the substrate, the etching including exposing the substrate to the plasma.

公开(公告)号：US11959834B2

公开(公告)日：2024-04-16

申请号：US18336039

申请日：2023-06-16

Applicant: Materials Analysis Technology Inc.

Inventor： Pin Chang ,  Ying-Chan Hung ,  Hung-Jen Chen

IPC: G01N1/02 ,  G01N23/2204 ,  G02B5/20 ,  G02B21/00 ,  H01J37/00 ,  H01J37/20 ,  B01L3/00 ,  G01N21/01 ,  G02B5/00 ,  G02B21/34

CPC classification number: G01N1/02 ,  G01N23/2204 ,  G02B5/208 ,  G02B21/00 ,  H01J37/00 ,  H01J37/20 ,  H01J2237/201

Abstract: A manufacturing method of a sample collection component, by which a removable light shielding component is disposed on a main body of the sample collection component to shield at least a portion of the light that passes through a storing space of the sample collection component.

公开(公告)号：US20240071712A1

公开(公告)日：2024-02-29

申请号：US18226644

申请日：2023-07-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SeungWan YOO ,  Jeongyeon LEE ,  Dohyung KIM ,  Jaehong PARK ,  Dong-Chan LIM

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3178 ,  H01J2237/201 ,  H01J2237/20214

Abstract: An ion beam deposition method includes placing a substrate into an ion beam deposition apparatus, irradiating an ion beam from an ion beam source toward a target plate, and rotating the target plate during the irradiating of the ion beam. The target plate includes a first region that includes a first material, and a second region that includes a second material different from the first material.

公开(公告)号：US20230402266A1

公开(公告)日：2023-12-14

申请号：US18312606

申请日：2023-05-05

Applicant: VON ARDENNE Asset GmbH & Co. KG

Inventor： Falk MILDE

IPC: H01J37/32 ,  C23C16/50 ,  C23C14/34

CPC classification number: H01J37/32715 ,  H01J37/32541 ,  H01J37/32568 ,  C23C16/50 ,  C23C14/34 ,  H01J2237/201 ,  H01J2237/032 ,  H01J2237/20221 ,  H01J2237/3321

Abstract: Disclosed herein are devices, systems, and methods for transporting a substrate for vacuum processing. The transport may be provided by a substrate carrying device that includes a support area by which a substrate carrier may be moveably supported. The substrate carrying device includes a plurality of electrodes that are galvanically separated from one another. The substrate carrying device includes a plurality of substrate carrying regions arranged consecutively in series with respect to one another, each substrate carrying region including an electrode of the plurality of electrodes and also including a substrate receiving device configured to receive a substrate placed in the substrate carrying region, preferably in physical contact with the electrode.