公开(公告)号：KR101621990B1

公开(公告)日：2016-05-17

申请号：KR1020110037938

申请日：2011-04-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  나가미네슈이치

IPC: H01L21/302

CPC classification number: H01L21/67051 ,  Y10T137/8593

Abstract: 본발명에따른기판액처리장치는, 기판을유지하는배치대와, 배치대를회전시키는회전구동부와, 배치대에배치된상기기판에액체를공급하는액체공급부와, 배치대에배치되어회전하는기판으로부터비산되는액체를아래쪽으로안내하기위해서, 위에서부터차례로마련된, 액체안내상부컵과, 액체안내중앙컵및 액체안내하부컵을포함하고있다. 액체안내상부컵, 액체안내중앙컵및 액체안내하부컵은, 구동기구에의해승강하도록되어있다. 구동기구는, 액체안내중앙컵에접속되어있다.

公开(公告)号：KR101373325B1

公开(公告)日：2014-03-10

申请号：KR1020110041924

申请日：2011-05-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  나가미네슈이치

IPC: H01L21/302

CPC classification number: H01L21/67051 ,  H01L21/6708

Abstract: 본 발명에 따른 기판 액처리 장치는, 기판 유지대에 유지되어 회전하는 기판으로부터 비산된 처리액을 안내하는 안내 회전컵과, 안내 회전컵에 의해 안내된 처리액을 하방으로 안내하는 안내컵을 포함하고 있다. 안내컵은, 안내컵 본체의 내주단부로부터 하방으로 연장되는 하방 연장부와, 이 내주단부로부터 하방 연장부보다 내주측으로 연장되고, 안내 회전컵 및 하방 연장부와 함께 안내 회전컵이 회전함으로써 선회하는 기체를 하방으로 안내하는 기체 안내 공간을 형성하는 내주측 연장부를 갖고 있다.

公开(公告)号：KR1020130126483A

公开(公告)日：2013-11-20

申请号：KR1020130049215

申请日：2013-05-02

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 하시모토유스케 ,  나가미네슈이치 ,  이토노리히로

IPC: H01L21/302 ,  H01L21/02

CPC classification number: H01L21/67051 ,  H01L21/67034

Abstract: The purpose of the present invention is to move a processing liquid supply nozzle of a substrate processing apparatus having a first processing unit and a second processing unit which is formed on the first processing unit to a suitable position according to performed processing. The substrate processing apparatus (100) of the present invention comprises the processing liquid supply nozzle (40) which supplies a second processing liquid for second liquid processing to the lower part of a substrate (W) and a nozzle elevating tool (44) for elevating the processing liquid supply nozzle. The processing liquid supply nozzle is positioned on a descending position when first liquid processing is performed in the first processing unit (1) and the processing liquid supply nozzle is positioned on an ascending position higher than the descending position when the second liquid processing is performed in the second processing unit (2).

Abstract translation: 本发明的目的是根据执行的处理将具有第一处理单元和第二处理单元的基板处理装置的处理液体供给喷嘴移动到第一处理单元上的适当位置。 本发明的基板处理装置（100）包括：向基板（W）的下部供给第二液体处理用的第二处理液的处理液供给喷嘴（40）和用于升降的喷嘴升降工具 处理液体供给喷嘴。 当在第一处理单元（1）中执行第一液体处理时，处理液体供给喷嘴位于下降位置，并且当执行第二液体处理时处理液体供给喷嘴位于比下降位置更高的上升位置 第二处理单元（2）。

公开(公告)号：KR1020130006349A

公开(公告)日：2013-01-16

申请号：KR1020120073413

申请日：2012-07-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 히가시지마지로 ,  이토노리히로 ,  오가타노부히로 ,  나가미네슈이치

IPC: H01L21/02 ,  H01L21/67 ,  B05B15/04 ,  B05C11/08 ,  B08B3/04 ,  B08B3/08 ,  B08B15/02

CPC classification number: H01L21/67017 ,  B05B14/00 ,  B05C11/08 ,  B08B3/04 ,  B08B3/08 ,  B08B15/02 ,  G03F7/40 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/02052

Abstract: PURPOSE: A substrate liquid processing apparatus and a substrate liquid processing method are provided to reduce the size of the substrate liquid processing apparatus by separating processing solutions from the atmosphere in a collecting cup to omit a gas-liquid separating device. CONSTITUTION: A substrate rotating device(23) rotates a griped substrate(2). A processing solution supply device(24) selectively supplies various kinds of processing solutions to the substrate. A collecting cup(56) collects the processing solutions supplied to the substrate. Liquid collecting units(61,62,63) are formed in the collecting cup to collect the processing solutions. Discharge parts(64,65,66) discharge the processing solutions collected from a solution collecting unit. Exhaust parts(70,71) are formed on the upper side of the discharge part.

Abstract translation: 目的：提供一种基板液体处理装置和基板液体处理方法，用于通过从处理溶液与收集杯中的大气分离来减小基板液体处理装置的尺寸，以省略气液分离装置。 构成：基板旋转装置（23）旋转夹持的基板（2）。 处理液供给装置（24）选择性地向基板供给各种处理方法。 收集杯（56）收集供应到基底的处理溶液。 液体收集单元（61,62,63）形成在收集杯中以收集处理溶液。 排放部件（64,65,66）排出从溶液收集单元收集的处理溶液。 排气部（70,71）形成在排出部的上侧。

公开(公告)号：KR1020110132971A

公开(公告)日：2011-12-09

申请号：KR1020110039569

申请日：2011-04-27

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  나가미네슈이치

IPC: H01L21/302

CPC classification number: H01L21/67051

Abstract: PURPOSE: A substrate liquid treatment apparatus is provided to improve the design freedom of a cup structure by installing a partition wall which prevents interference with a liquid guideline center cup between a tank for a first drain and a tank for a second drain. CONSTITUTION: A positional adjusting mechanism adjusts a position relation between a first guideline cup(131) and a second guideline cup(141). A tank(161) for collecting first treatment liquid collection is formed in the lower side of the first guideline cup and the second guideline cup. The tank for collecting the first treatment liquid collects treatment liquid which is guided by the first guideline cup. A tank(162) for collecting second treatment liquid is installed in the inner circumferential side of the tank for collecting the first treatment liquid. The tank for collecting the second treatment liquid collects treatment liquid which is guided by the second guideline cup.

Abstract translation: 目的：提供一种基板液体处理装置，通过安装隔离壁来改善杯形结构的设计自由度，防止与第一排水槽和第二排水槽之间的液体引导杯中心杯的干涉。 构成：位置调节机构调整第一准线杯（131）和第二准杯（141）之间的位置关系。 用于收集第一处理液体收集物的罐（161）形成在第一引导杯和第二引导杯的下侧。 用于收集第一处理液的罐收集由第一准线杯引导的处理液。 用于收集第二处理液体的罐（162）安装在用于收集第一处理液体的罐的内周侧。 用于收集第二处理液体的罐收集由第二准线杯引导的处理液。

公开(公告)号：KR1020110132969A

公开(公告)日：2011-12-09

申请号：KR1020110037938

申请日：2011-04-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오가타노부히로 ,  나가미네슈이치

IPC: H01L21/302

CPC classification number: H01L21/67051 ,  Y10T137/8593

Abstract: PURPOSE: A substrate liquid treatment apparatus and a method for controlling the substrate liquid treatment apparatus and a recording medium are provided to efficiently divide and collect mist more than 3 kinds by guiding distributed liquid to a cup by a driving tool. CONSTITUTION: A liquid supply part supplies liquid in a substrate which is arranged on an arrangement table. A liquid guideline top cup(21), a liquid guideline center cup(22), and a liquid guideline bottom cup(23) are successively included in order to guide liquid which is distributed from the substrate to lower side. A driving tool is connected to the liquid guideline center cup. The driving tool elevates the liquid guideline top cup, the liquid guideline center cup, and the liquid guideline bottom cup. The liquid guideline top cup rises by being supported to the liquid guideline center cup and comprises an outer flange on an outer circumferential wall.

Abstract translation: 目的：提供一种基板液体处理装置和用于控制基板液体处理装置和记录介质的方法，以通过驱动工具将分配的液体引导至杯子来有效地分割和收集3种以上的雾。 构成：液体供应部件在布置在布置台上的基板中供应液体。 依次包括液体引导杯顶盖（21），液体引导杯中心杯（22）和液体导向底杯（23），以将从基底分配的液体引导到下侧。 驱动工具连接到液体导向杯中心。 驱动工具提升液体导向杯，液体指南中心杯和液体指导底杯。 液体导向杯顶部通过支撑在液体引导杯中心杯上而升高，并且包括在外周壁上的外凸缘。

公开(公告)号：KR1020080007413A

公开(公告)日：2008-01-18

申请号：KR1020080000876

申请日：2008-01-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 나가미네슈이치

IPC: H01L21/027

CPC classification number: H01L21/67178 ,  G03F7/30 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/67196 ,  B05C11/10 ,  H01L21/6715

Abstract: A solution treatment method and a solution treatment unit are provided to maintain a temperature distribution of a surface of substrate uniformly by preventing impurities from being adhered to a substrate. A solution treatment method includes the steps of: supplying a gas from an upper part of a vessel inside a casing; adjusting a first flow rate of the supplied gas flowing into the vessel and a second flow rate of the supplied gas flowing out of the vessel; and exhausting the gas flown into the vessel and the gas flown out of the vessel outside the casing, wherein the solution treatment is a developing process. The first flow rate is adjusted to be smaller than the second flow rate during a substrate process by supplying a treating solution onto the substrate.

Abstract translation: 提供固溶处理方法和固溶处理单元，以通过防止杂质粘附到基底来均匀地保持基材表面的温度分布。 固溶处理方法包括以下步骤：从壳体内的容器的上部供应气体; 调节供应的气体流入容器的第一流量和从容器流出的供应气体的第二流量; 并且排出流入容器的气体，并且气体从壳体外的容器流出，其中固溶处理是显影过程。 通过将处理液供给到基板上，将基板处理中的第一流量调整为小于第二流量。

公开(公告)号：KR100618261B1

公开(公告)日：2006-09-04

申请号：KR1020010018860

申请日：2001-04-10

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이나다히로이치 ,  나가미네슈이치

IPC: H01L21/02

Abstract: 본 발명은 처리실내의 기판의 표면에 처리액의 막을 형성하는 막형성방법으로서, 처리실내에 기체를 공급하는 동시에, 처리실내의 분위기를 배기하는 상태에서, 처리실내의 유지부재에 얹어놓은 기판에 처리액을 공급하는 공정과, 처리액의 공급전에 기판 표면의 온도를 측정하는 공정을 가진다.
처리액의 공급전에, 기판 표면의 온도를 측정하면, 기판 표면의 온도나 온도분포를 확인할 수 있다. 그리고, 예를 들면 미리 구해 둔 균일한 막두께가 형성되는 경우의 이상적인 온도분포와 그 측정결과를 비교함으로써, 그 후의 처리에 의해 형성되는 막의 막두께를 예측할 수 있다. 또한, 온도를 측정한 후, 처리막을 형성하여, 그 처리막의 막두께를 평가함으로써, 그 데이터를 축적하여, 소위 최적의 조건을 찾아내어 설정할 수 있다. 따라서 이들 측정결과에 기초하여, 처리액 등의 온도 등을 조절하여, 막두께가 균일해지도록 보정할 수 있다.

公开(公告)号：KR1020020035758A

公开(公告)日：2002-05-15

申请号：KR1020010068755

申请日：2001-11-06

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 나가미네슈이치

IPC: H01L21/027

CPC classification number: H01L21/67178 ,  G03F7/30 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/67196

Abstract: PURPOSE: A solution treatment method and a solution treatment unit are provided to appropriately perform maintenance even when solution treatment units such as resist coating units and developing units are disposed in multi-tiers. CONSTITUTION: The solution treatment unit is for supplying a treatment solution to a substrate and treating the substrate inside an accommodating vessel, and comprises a frame for having the accommodating vessel mounted therein and in which the accommodating vessel is structured to be pulled out freely in a predetermined direction from the frame.

Abstract translation: 目的：提供固溶处理方法和固溶处理单元，以便即使在诸如抗蚀剂涂布单元和显影单元之类的溶液处理单元被多层设置的情况下也能适当地执行维护。 构成：溶液处理单元用于将处理液供给到基板并处理容纳容器内的基板，并且包括用于安装其中的容纳容器的框架，其中容纳容器被构造成在 从框架预定的方向。

公开(公告)号：KR101825412B1

公开(公告)日：2018-02-06

申请号：KR1020130061508

申请日：2013-05-30

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가이요시히로 ,  이시카와신야 ,  카미카와유지 ,  나가미네슈이치 ,  신도나오키

IPC: H01L21/302

CPC classification number: H01L29/1608 ,  B05B1/36 ,  B05B15/555 ,  B05B15/557 ,  B08B3/102 ,  B08B9/0321 ,  B08B9/0328 ,  H01L21/67051 ,  H01L29/7813

Abstract: 노즐의선단부터상부까지불균일없이세정하는것이다. 실시예에따른노즐세정장치는, 저류조와액 토출부와오버플로우배출부를구비한다. 저류조는원통형상의내주면을가지고, 기판처리에이용하는노즐을세정하는세정액이저류된다. 액토출부는, 저류조의내주면의중심축으로부터편심한위치를향해저류조내에세정액을토출함으로써저류조에세정액을저류하고, 또한저류조내를선회하는선회류를형성한다. 오버플로우배출부는저류조로부터오버플로우한세정액을배출한다.

Abstract translation: 喷嘴清洁装置能够从喷嘴的前端到其上部均匀地清洁喷嘴。 喷嘴清洁装置包括储存箱，液体排出部分和溢出排出部分。 储罐具有圆柱形内周表面并且构造成在其中储存清洁用于基板处理的喷嘴的清洁液。 液体排出部被构造成将清洁液体朝向相对于圆柱形内周表面的中心轴线偏心的位置排出到存储箱中，以将清洁液体存储在存储箱内并且构造成形成清洁的涡流 液体在储罐内旋转。 溢流排出部构造成排出溢出储罐的清洁液。