Abstract:
PURPOSE: A dicing die bonding film for a semiconductor wafer is provided to suppress the generation of fibrous burrs in the dicing process of a semiconductor wafer and to ensure excellent pick-up property of a chip, expandability and uniformity in an expanding process. CONSTITUTION: A dicing die bonding film for a semiconductor wafer comprises a base film and a monolayered or multilayered adhesive layer formed on one side thereof. The base film comprises an ethylene-α-olefin block copolymer in which a melting point is 80°C or greater and ethylene content is 60 mole% or greater. The ethylene-α-olefin block copolymer is included in the amount of 50-100 weight%. The base film further includes a hydrophilic functional group-containing polyethylene copolymer.
Abstract:
PURPOSE: A non-UV type die attach film is provided to lower an adhesion between a dicing film layer and an adhesive layer to strippability required for chip picup while maintaining the adhesion of the edge portion of the dicing film layer. CONSTITUTION: A method for manufacturing a die attach film comprises the steps of: introducing an adhesive layer(120) and a dicing film layer(110) of a photo-curable adhesive including an adhesive layer portion(113) and a ring frame portion(114); and irradiating ultraviolet ray to a back side of the dicing film layer and inducing the inflow of oxygen as a radical scavenger to an upper side of the exposed ring frame portion to suppress the photo-curing of the ring frame portion, and inducing the photo-curing of the adhesive layer portion in which the inflow of the oxygen is blocked by the adhesive layer.
Abstract:
PURPOSE: A photo-curable adhesive composition and an adhesive tape using thereof are provided to improve the material adhesion force before photo-curing, and to secure the low surface energy after photo-curing. CONSTITUTION: A photo-curable adhesive composition contains an acrylic adhesive binder, a photo-initiator, and a thermosetting material. The acrylic adhesive binder is produced by applying a vinyl group to an acrylic monomer obtained by polymerizing liquid silicon modified acrylrate resin and the acrylic monomer. The acrylic adhesive binder contains 3~5 parts of liquid silicon modified acrylrate resin by weight for 100 parts of acrylic monomer by weight. The liquid silicon modified acrylrate resin is mono-methacrylic functional polysiloxan with the water molecular weight of 12,000 grams per mol.
Abstract:
본 발명은, 접착제층; 및 상기 접착제층에 접한 점착제층을 포함하며, 상기 점착제층의 ASTM D2979-71에 따라 측정된 자외선 조사 전(A 0 )과 자외선 조사 후(A 1 )의 점착력의 비(A 0 /A 1 )가 11 이상이고, 상기 점착제층의 자외선 조사 후 25 ℃에서의 저장탄성율이 0.5 x 10 6 Pa 내지 5 x 10 8 Pa 범위인, 다이싱 다이본딩 필름에 관한 것이다.
Abstract:
The present invention relates to an adhesive film for protecting the surface of a semiconductor wafer to prevent damage to a wafer and a wafer bump formation surface and contamination during the grinding process of a bump non-formation surface of the surface of a semiconductor wafer. More specifically, the present invention relates an adhesive film for protecting the surface of a semiconductor wafer including a base film and an intermediate layer laminated on the base film. The intermediate layer includes an acrylic resin containing an alkyl (meth) acrylate monomer with two or more carbon atoms of an alkyl group. The elongation rate of the base film with laminated intermediate layer is 400 to 900%.
Abstract:
The present invention relates to an adhesive film including an adhesive layer and a substrate film, and specifically, to an adhesive film for a semiconductor, wherein a ratio (B/A) of an elongation rate of an adhesive film (B) on an elongation rate of a substrate film (A) is 0.7 or less. The thickness of the adhesive layer is 20-40% of the thickness of the substrate film. The adhesive layer contains an isocyanate based hardener. The isocyanate based hardener is an isocyanate trimer.
Abstract:
PURPOSE: A pressure-sensitive dicing die bonding film is provide to comprise adhesive layers having different adhesion each other to an adhesive layer and a ring frame, thereby having frame stability, and high pick-up success rate. CONSTITUTION: A pressure-sensitive dicing die bonding film comprises a base film(4), a tackifying layer(5) formed on the base film, and an adhesive layer formed on the top of the adhesive layer. The adhesive force between the tackifying layer and the ring frame(B) is B/A>=1.1. The slid distance of the tackifying layer is 0-0.1 mm, when applying force to the tackifying layer by 10 gf per unit area 1mm^2. The tackifying layer is a monolayer, the thickness of the tackifying layer is 3-40 micron, and the tackifying layer comprises silane coupling agent.
Abstract:
PURPOSE: An acrylate-adhesive composition is provided to obtain improved pick-up performance by revealing heterogeneity of a dimethysiloxane resin after a photocuring process and to be applied to a dicing or an adhesive tape of bonding the dicing. CONSTITUTION: An acrylate-adhesive composition includes 0.01-0.045 parts by weight of a dimethylsiloxane resin based on 100.0 parts by weight of an acrylic binder resin including ethylhexylacrylat. The dimethysiloxane resin is introduced to the backbone of the acrylic binder resin. The binder resin includes 2-ethylhexylacrylat 50-80 parts by weight, isooctylacrylate 20 parts by weight, 2-hydroxymethylmethacrylate 20 parts by weight, 2-hydroxy ethyl acrylate 20 parts by weight, and glycidyl methacrylate monomer 10 parts by weight.
Abstract:
A back grinding protection film for protecting a semiconductor wafer is disclosed. The back grinding protection film for protecting a semiconductor wafer, as a back grinding protection film for protecting a semiconductor wafer where a buffer layer and an adhesive layer are stacked on a base material film, features that elastic modulus of indentation of the buffer layer at 25°C can be increased four to eighty times by ultraviolet irradiation.
Abstract:
The present invention relates to an adhesive film for protecting the surface of a semiconductor wafer including an adhesive layer containing a silane coupling agent, and more specifically, to an adhesive film for protecting the surface of a semiconductor wafer, wherein the increase rate of a void area is 10% or less 12 hours after the film is attached to the bump forming face of the semiconductor wafer.