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公开(公告)号:WO2019206498A1
公开(公告)日:2019-10-31
申请号:PCT/EP2019/055262
申请日:2019-03-04
Applicant: ASML NETHERLANDS B.V.
Inventor: BASTANI, Vahid , YPMA, Alexander
IPC: G03F7/20 , G05B19/418
Abstract: A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method comprises obtaining first data associated with substrates before being subject to the process step and obtaining a plurality of sets of second data associated with substrates after being subject to the process step, each set of second data being associated with a different value of a characteristic of the first data. A distance metric is determined which describes a measure of distance between the sets of second data; and the second data is grouped based on a property of the distance metric.
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公开(公告)号:WO2018233966A1
公开(公告)日:2018-12-27
申请号:PCT/EP2018/063527
申请日:2018-05-23
Applicant: ASML NETHERLANDS B.V.
Inventor: HARUTYUNYAN, Davit , JIA, Fei , STAALS, Frank , WANG, Fuming , LOOIJESTIJN, Hugo, Thomas , RIJNIERSE, Cornelis, Johannes , PISARENCO, Maxim , WERKMAN, Roy , THEEUWES, Thomas , VAN HEMERT, Tom , BASTANI, Vahid , WILDENBERG, Jochem, Sebastiaan , MOS, Everhardus, Cornelis , WALLERBOS, Erik, Johannes, Maria
IPC: G03F7/20 , G05B13/04 , G05B19/418 , H01L21/66
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method comprising: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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公开(公告)号:EP4196851A1
公开(公告)日:2023-06-21
申请号:EP21740579.4
申请日:2021-07-14
Applicant: ASML Netherlands B.V.
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公开(公告)号:EP3785077A1
公开(公告)日:2021-03-03
申请号:EP19708314.0
申请日:2019-03-04
Applicant: ASML Netherlands B.V.
Inventor: BASTANI, Vahid , YPMA, Alexander
IPC: G03F7/20 , G05B19/418
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公开(公告)号:EP4139749A1
公开(公告)日:2023-03-01
申请号:EP21712845.3
申请日:2021-03-22
Applicant: ASML Netherlands B.V.
Inventor: SAHRAEIAN, Reza , BASTANI, Vahid , GKOROU, Dimitra , DOS SANTOS GUZELLA, Thiago
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公开(公告)号:EP3594749A1
公开(公告)日:2020-01-15
申请号:EP18182594.4
申请日:2018-07-10
Applicant: ASML Netherlands B.V.
Inventor: BASTANI, Vahid , YPMA, Alexander
IPC: G03F7/20 , G05B19/418
Abstract: A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method comprises obtaining first data associated with substrates before being subject to the process step and obtaining a plurality of sets of second data associated with substrates after being subject to the process step, each set of second data being associated with a different value of a characteristic of the first data in common. A distance metric is determined which describes a measure of distance between the sets of second data; and the second data is grouped based on a property of the distance metric.
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公开(公告)号:EP3523698A1
公开(公告)日:2019-08-14
申请号:EP18727761.1
申请日:2018-05-23
Applicant: ASML Netherlands B.V.
Inventor: HARUTYUNYAN, Davit , JIA, Fei , STAALS, Frank , WANG, Fuming , LOOIJESTIJN, Hugo, Thomas , RIJNIERSE, Cornelis, Johannes , PISARENCO, Maxim , WERKMAN, Roy , THEEUWES, Thomas , VAN HEMERT, Tom , BASTANI, Vahid , WILDENBERG, Jochem, Sebastiaan , MOS, Everhardus, Cornelis , WALLERBOS, Erik, Johannes, Maria
IPC: G03F7/20 , G05B13/04 , G05B19/418 , H01L21/66
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公开(公告)号:EP4174577A1
公开(公告)日:2023-05-03
申请号:EP21205825.9
申请日:2021-11-01
Applicant: ASML Netherlands B.V.
Inventor: BASTANI, Vahid , KNOPS, Raoul, Maarten, Simon , THEEUWES, Thomas , URBANCZYK, Adam, Jan , WILDENBERG, Jochem, Sebastiaan , VAN WIJK, Robert Jan
IPC: G03F7/20
Abstract: Disclosed is a method of determining a performance parameter distribution and/or associated quantile function. The method comprises obtaining a quantile function prediction model operable to predict a quantile value for a substrate position and given quantile probability such that the predicted quantile values vary monotonically as a function of quantile probability and using the trained quantile function prediction model to predict quantile values for a plurality of different quantile probabilities for one or more substrate positions.
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公开(公告)号:EP3994525A1
公开(公告)日:2022-05-11
申请号:EP20730276.1
申请日:2020-06-05
Applicant: ASML Netherlands B.V.
Inventor: BASTANI, Vahid , SONNTAG, Dag , SAHRAEIAN, Reza , GKOROU, Dimitra
IPC: G03F7/20 , G05B19/418 , H01L21/66
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公开(公告)号:EP3945548A1
公开(公告)日:2022-02-02
申请号:EP20188698.3
申请日:2020-07-30
Applicant: ASML Netherlands B.V.
Inventor: GKOROU, Dimitra , BASTANI, Vahid , SAHRAEIAN, Reza , TABERY, Cyrus, Emil
IPC: H01L21/66 , G03F7/20 , G05B19/418 , G05B23/02
Abstract: Methods and apparatus for classifying semiconductor wafers. The method comprises: sorting a set of semiconductor wafers, using a model, into a plurality of sub-sets based on parameter data corresponding to one or more parameters of the set of semiconductor wafers, wherein the parameter data for semiconductor wafers in a sub-set include one or more common characteristics; identifying one or more semiconductor wafers within a sub-set based on a probability of the one or more semiconductor wafers being correctly allocated to the sub-set; comparing the parameter data of the one or more identified semiconductor wafers to reference parameter data; and reconfiguring the model based on the comparison. The comparison is undertaken by a human to provide constraints for the model. The apparatus is configured to undertake the method.
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