公开(公告)号：WO2018233966A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/063527

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method comprising: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：WO2018197144A1

公开(公告)日：2018-11-01

申请号：PCT/EP2018/057961

申请日：2018-03-28

Applicant: ASML NETHERLANDS B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  JOCHEMSEN, Marinus ,  JENSEN, Erik ,  WALLERBOS, Erik, Johannes, Maria ,  RIJNIERSE, Cornelis, Johannes ,  RAJASEKHARAN, Bijoy ,  WERKMAN, Roy ,  SCHOONUS, Jurgen, Johannes, Henderikus, Maria

IPC: G03F7/20 ,  G05B19/418

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating (406) measurement results of performance parameters (fingerprints) with the recorded process characteristics (context); obtaining (408) a characteristic (context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining (410) a characteristic (context) of a subsequent process (exposure) in the sequence to be performed on the product unit; determining (412) a predicted performance parameter (fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (fingerprints) corresponding to the recorded characteristics; and determining (414, 416) corrections to be applied (418) to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

公开(公告)号：EP3523698A1

公开(公告)日：2019-08-14

申请号：EP18727761.1

申请日：2018-05-23

Applicant: ASML Netherlands B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66