公开(公告)号：WO2015113724A1

公开(公告)日：2015-08-06

申请号：PCT/EP2014/079443

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： SMILDE, Hendrik, Jan, Hidde ,  AUER, Bastiaan, Onne, Fagginger ,  HARUTYUNYAN, Davit ,  WARNAAR, Patrick

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G01B9/04 ,  G01B2210/56 ,  G01N2021/8822 ,  G03F7/70633 ,  G03F7/70641 ,  G03F9/7092

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

Abstract translation: 在使用小目标的暗场测量方法中，通过将组合拟合函数拟合到测量图像来确定使用单个衍射级获得的目标图像的特性。 组合拟合功能包括用于表示物理传感器和目标的方面的术语。 基于测量过程和/或目标的参数来确定组合拟合函数的一些系数。 在一个实施例中，组合拟合功能包括表示成像系统中瞳孔停止点的点扩展函数的jinc函数。

公开(公告)号：WO2021028126A1

公开(公告)日：2021-02-18

申请号：PCT/EP2020/069355

申请日：2020-07-09

Applicant: ASML NETHERLANDS B.V.

Inventor： SU, Jing ,  CHENG, Yana ,  LIN, Chenxi ,  ZOU, Yi ,  HARUTYUNYAN, Davit ,  SCHMITT-WEAVER, Emil, Peter ,  BHATTACHARYYA, Kaustuve ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  YAGUBIZADE, Hadi

IPC: G03F7/20 ,  H01L21/66

Abstract: Described herein is a method for determining a model to predict overlay data associated with a current substrate being patterned. The method involves obtaining (i) a first data set associated with one or more prior layers and/or current layer of the current substrate, (ii) a second data set comprising overlay metrology data associated with one or more prior substrates, and (iii) de-corrected measured overlay data associated with the current layer of the current substrate; and determining, based on (i) the first data set, (ii) the second data set, and (iii) the de-corrected measured overlay data, values of a set of model parameters associated with the model such that the model predicts the overlay data for the current substrate, wherein the values are determined such that a cost function is minimized, the cost function comprises a difference between the predicted data and the de-corrected measured overlay data.

公开(公告)号：WO2020212057A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/057401

申请日：2020-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： WERKMAN, Roy ,  DECKERS, David, Frans, Simon ,  HASTINGS, Simon, Philip, Spencer ,  ZIEBARTH, Jeffrey, Thomas ,  REHMAN, Samee, Ur ,  HARUTYUNYAN, Davit ,  LIN, Chenxi ,  CHENG, Yana

IPC: G03F7/20

Abstract: There is provided a method for determining a correction for an apparatus used in a process of patterning substrates, the method comprising: obtaining a group structure associated with a processing history and/or similarity in fingerprint of to be processed substrates; obtaining metrology data associated with a plurality of groups within the group structure, wherein the metrology data is correlated between the groups; and determining the correction for a group out of the plurality of groups by applying a model to the metrology data, the model comprising at least a group-specific correction component and a common correction component.

公开(公告)号：WO2020114692A1

公开(公告)日：2020-06-11

申请号：PCT/EP2019/080129

申请日：2019-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： LIN, Chenxi ,  TABERY, Cyrus, Emil ,  CEKLI, Hakki, Ergun ,  HASTINGS, Simon, Philip, Spencer ,  MENCHTCHIKOV, Boris ,  ZOU, Yi ,  CHENG, Yana ,  GENIN, Maxime, Philippe, Frederic ,  CHEN, Tzu-Chao ,  HARUTYUNYAN, Davit ,  ZHANG, Youping

IPC: G03F7/20 ,  H01L21/66

Abstract: Described is a method for determining a root cause affecting yield in a process for manufacturing devices on a substrate, the method comprising; obtaining yield distribution data comprising the distribution of a yield parameter across the substrate or part thereof; obtaining sets of metrology data, each set comprising a spatial variation of a process parameter over the substrate or part thereof corresponding to a different layer of the substrate; comparing the yield distribution data and metrology data based on a similarity metric describing a spatial similarity between the yield distribution data and an individual set out of the sets of the metrology data; and determining a first similar set of metrology data out of the sets of metrology data, being the first set of metrology data in terms of processing order for the corresponding layers, which is determined to be similar to the yield distribution data.

公开(公告)号：WO2018233966A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/063527

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method comprising: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：EP3523698A1

公开(公告)日：2019-08-14

申请号：EP18727761.1

申请日：2018-05-23

Applicant: ASML Netherlands B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66

公开(公告)号：EP3891559A1

公开(公告)日：2021-10-13

申请号：EP19798274.7

申请日：2019-11-04

Applicant: ASML Netherlands B.V.

Inventor： LIN, Chenxi ,  TABERY, Cyrus Emil ,  CEKLI, Hakki Ergun ,  HASTINGS, Simon Philip Spencer ,  MENCHTCHIKOV, Boris ,  ZOU, Yi ,  CHENG, Yana ,  GENIN, Maxime Philippe Frederic ,  CHEN, Tzu-Chao ,  HARUTYUNYAN, Davit ,  ZHANG, Youping

IPC: G03F7/20 ,  H01L21/66