公开(公告)号：US20210063898A1

公开(公告)日：2021-03-04

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20190235397A1

公开(公告)日：2019-08-01

申请号：US16376535

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20170139333A1

公开(公告)日：2017-05-18

申请号：US15417005

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC: G03F7/20 ,  C02F1/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.