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    SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS
    11.
    发明申请
    SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS 审中-公开

    公开(公告)号：WO2021074260A1

    公开(公告)日：2021-04-22

    申请号：PCT/EP2020/078976

    申请日：2020-10-15

    Applicant: ASML NETHERLANDS B.V.

    Inventor： GOOSEN, Maikel, Robert ,  SMAKMAN, Erwin, Paul

    IPC: H01J37/04 ,  H01J37/28

    Abstract: Systems and methods of profiling a charged-particle beam are disclosed. The method of profiling a charged-particle beam may comprise activating a charged-particle source to generate the charged-particle beam along a primary optical axis, modifying the charged-particle beam by adjusting an interaction between the charged-particle beam and a standing optical wave, detecting charged particles from the modified charged-particle beam after the interaction with the standing optical wave, and determining a profile of the charged-particle beam based on the detected charged particles. Alternatively, the method may include activating an optical source, modifying the optical beam by adjusting an interaction between the optical beam and a charged-particle beam, detecting an optical signal from the modified optical beam, and determining a characteristic of the charged-particle beam based on the detected optical signal.

    APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARGED-PARTICLE BEAM
    12.
    发明申请
    APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARGED-PARTICLE BEAM 审中-公开

    公开(公告)号：WO2020164951A1

    公开(公告)日：2020-08-20

    申请号：PCT/EP2020/052662

    申请日：2020-02-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HASAN, Shakeeb Bin ,  REN, Yan ,  GOOSEN, Maikel, Robert ,  MANGNUS, Albertus, Victor, Gerardus ,  SMAKMAN, Erwin, Paul

    IPC: H01J37/04 ,  H01J37/05 ,  H01J37/26

    Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a structure defining a cavity, the cavity having an interior surface, and a metamaterial aborber provided on the interior surface. In operation, the cavity extends along a part of the beam path. In further embodiments, the metamaterial includes a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer. Further, a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate is disclosed.

    PULSED CHARGED-PARTICLE BEAM SYSTEM
    13.
    发明申请
    PULSED CHARGED-PARTICLE BEAM SYSTEM 审中-公开

    公开(公告)号：WO2020136044A2

    公开(公告)日：2020-07-02

    申请号：PCT/EP2019/085706

    申请日：2019-12-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BLEEKER, Arno, Jan ,  DE JAGER, Pieter, Willem, Herman ,  GOOSEN, Maikel, Robert ,  SMAKMAN, Erwin, Paul ,  MANGNUS, Albertus, Victor, Gerardus ,  REN, Yan ,  LASSISE, Adam

    IPC: H01J37/147 ,  H01J37/26 ,  H01J37/04

    Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

    METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
    16.
    发明申请
    METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY 审中-公开
    用于直写光罩光刻的方法和设备

    公开(公告)号：WO2017114653A1

    公开(公告)日：2017-07-06

    申请号：PCT/EP2016/080809

    申请日：2016-12-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DE JAGER, Pieter, Willem, Herman ,  VERSCHUREN, Coen, Adrianus ,  SMAKMAN, Erwin, Paul ,  VAN ZWET, Erwin, John ,  MULCKHUYSE, Wouter, Frans, Willem ,  VERHOEFF, Pieter ,  VAN DER WERF, Robert, Albertus, Johannes

    IPC: G03F7/20

    CPC classification number: G03F7/70383 ,  G03F7/70391 ,  G03F7/704

    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

    Abstract translation: 一种曝光设备，包括：衬底支架，构造成支撑衬底; 图案形成装置，被配置为提供根据期望的图案调制的辐射，所述图案形成装置包括多个辐射源的二维阵列，每个辐射源配置为发射辐射束; 投影系统，其被配置为将经调制的辐射投影到衬底上，所述投影系统包括并排布置的多个光学元件并且被布置为使得来自辐射源的二维阵列的辐射束的二维阵列撞击单个 所述多个光学元件的光学元件; 以及致动器，其被配置为在扫描方向上提供衬底与辐射源的多个二维阵列之间的相对运动以暴露衬底。

    METHOD AND APPARATUS FOR INSPECTION
    17.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION 审中-公开
    检测方法和设备

    公开(公告)号：WO2017108444A1

    公开(公告)日：2017-06-29

    申请号：PCT/EP2016/080374

    申请日：2016-12-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KASTRUP, Bernardo ,  MULKENS, Johannes, Catharinus, Hubertus ,  VAN DEN BRINK, Marinus, Aart ,  BENSCHOP, Jozef, Petrus, Henricus ,  SMAKMAN, Erwin, Paul ,  DRUZHININA, Tamara ,  VERSCHUREN, Coen, Adrianus

    IPC: H01J37/065 ,  H01J37/15

    CPC classification number: H01J37/023 ,  H01J37/15 ,  H01J37/22 ,  H01J2237/0245 ,  H01J2237/2817

    Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns (600), each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system (600, 610) configured to move (640, 630) one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

    Abstract translation: 电子束检测设备，该设备包括多个电子束柱（600），每个电子束柱被配置为提供电子束并检测来自物体的散射或二次电子，以及致动器 系统（600,610），被配置为相对于另一个或多个电子束列移动（640,630）一个或多个电子束列。 致动器系统可以包括与多个第二可移动结构至少部分重叠的多个第一可移动结构，第一可移动结构和第二可移动结构支撑多个电子束柱。

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