公开(公告)号：WO2020035201A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/066584

申请日：2019-06-24

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  F21V8/00

Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

公开(公告)号：WO2019063313A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/074841

申请日：2018-09-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： SHMAREV, Yevgeniy, Konstantinovich ,  PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20 ,  H01L21/66

Abstract: An inspection apparatus, including: an objective configured to receive diffracted radiation from a metrology target having positive and negative diffraction order radiation; an optical element configured to separate the diffracted radiation into portions separately corresponding to each of a plurality of different values or types of one or more radiation characteristics and separately corresponding to the positive and negative diffraction orders; and a detector system configured to separately and simultaneously measure the portions.

公开(公告)号：WO2018188891A1

公开(公告)日：2018-10-18

申请号：PCT/EP2018/056554

申请日：2018-03-15

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  LIAN, Jin ,  REHMAN, Samee Ur ,  JAK, Martin, Jacobus, Johan

IPC: G03F7/20

Abstract: Methods and apparatus for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method comprises obtaining data from a first measurement process. The first measurement process comprises individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process comprises illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：WO2018036828A1

公开(公告)日：2018-03-01

申请号：PCT/EP2017/070302

申请日：2017-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95

CPC classification number: G03F7/70633 ,  G01J1/0411 ,  G01J1/0488 ,  G01N21/9505 ,  G01N21/956 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70625

Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a metrology apparatus comprises an optical system that illuminates a structure with measurement radiation and detects the measurement radiation scattered by the structure. The optical system comprises an array of lenses that focusses the scattered measurement radiation onto a sensor. A dispersive element directs scattered measurement radiation in each of a plurality of non-overlapping wavelength bands exclusively onto a different respective lens of the array of lenses.

Abstract translation: 公开了计量装置和方法。 在一种布置中，度量设备包括光学系统，该光学系统用测量辐射照射结构并检测由该结构散射的测量辐射。 该光学系统包括将散射的测量辐射聚焦到传感器上的透镜阵列。 色散元件仅将多个非重叠波长带中的每一个中的散射测量辐射引导到透镜阵列的不同透镜上。

公开(公告)号：WO2017102304A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/079105

申请日：2016-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： SOCHA, Robert, John ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/956

CPC classification number: G03F7/70633 ,  G01N21/956 ,  G03F7/70641

Abstract: Disclosed herein is a method of adjusting a metrology apparatus, the method comprising: spatially dividing an intensity distribution in a pupil plane of the metrology apparatus into a plurality of pixels; reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting, using a computer, intensities of the plurality of pixels.

Abstract translation: 本文公开了一种调节度量装置的方法，该方法包括：将度量衡装置的光瞳平面中的强度分布空间分割成多个像素; 通过使用计算机调整多个像素的强度，减少目标中的结构不对称对测量装置对目标的测量结果的影响。

公开(公告)号：WO2017036833A1

公开(公告)日：2017-03-09

申请号：PCT/EP2016/069776

申请日：2016-08-22

Applicant: STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  WITTE, Stefan, Michiel ,  EIKEMA, Kjeld, Sijbrand, Eduard

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7046 ,  G03F9/7092

Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.

Abstract translation: 光刻设备包括：衬底台，用于保持衬底; 以及传感器，其被配置为感测设置在由所述基板台保持的所述基板上的对准标记的位置。 传感器包括被配置为用辐射束照射对准标记的辐射源，检测器被配置为检测与对准标记相互作用的辐射束，作为失焦光学图案，以及数据处理系统。 数据处理系统被配置为接收表示失焦光学图案的图像数据，并处理用于确定对准信息的图像数据，包括将无镜头成像算法应用于失焦光学图案。

公开(公告)号：WO2021032369A1

公开(公告)日：2021-02-25

申请号：PCT/EP2020/069935

申请日：2020-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01M11/02

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.

公开(公告)号：WO2020074412A1

公开(公告)日：2020-04-16

申请号：PCT/EP2019/077016

申请日：2019-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Zili ,  PANDEY, Nitesh ,  ZWIER, Olger, Victor ,  WARNAAR, Patrick ,  VAN DER SCHAAR, Maurits ,  MC NAMARA, Elliott, Gerard ,  DEN BOEF, Arie, Jeffrey ,  HINNEN, Paul, Christiaan ,  BOZKURT, Murat ,  OTTENS, Joost, Jeroen ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20

Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shifht (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.

公开(公告)号：WO2019145101A1

公开(公告)日：2019-08-01

申请号：PCT/EP2018/086276

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  AKBULUT, Duygu ,  POLO, Alessandro ,  GOORDEN, Sebastianus, Adrianus

IPC: G01N29/06 ,  G01N29/22 ,  G01N29/24 ,  G01N21/55 ,  G03F1/84 ,  G01R31/303 ,  G03F7/20 ,  G03F9/00

Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.

公开(公告)号：WO2018184802A1

公开(公告)日：2018-10-11

申请号：PCT/EP2018/056357

申请日：2018-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： POLO, Alessandro ,  PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20 ,  G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G01J3/36

Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.