公开(公告)号：SG11201704036UA

公开(公告)日：2017-06-29

申请号：SG11201704036U

申请日：2015-10-30

Applicant: ASML NETHERLANDS BV

Inventor： DEN BOEF ARIE JEFFREY ,  BHATTACHARYYA KAUSTUVE

IPC: G03F7/20

Abstract: A method including determining a type of structural asymmetry of the target from measured values of the target, and performing a simulation of optical measurement of the target to determine a value of an asymmetry parameter associated with the asymmetry type. A method including performing a simulation of optical measurement of a target to determine a value of an asymmetry parameter associated with a type of structural asymmetry of the target determined from measured values of the target, and analyzing a sensitivity of the asymmetry parameter to change in a target formation parameter associated with the target. A method including determining a structural asymmetry parameter of a target using a measured parameter of radiation diffracted by the target, and determining a property of a measurement beam of the target based on the structural asymmetry parameter that is least sensitive to change in a target formation parameter associated with the target.

公开(公告)号：NL2013838A

公开(公告)日：2015-06-18

申请号：NL2013838

申请日：2014-11-20

Applicant: ASML NETHERLANDS BV

Inventor： DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  ENGBLOM PETER DAVID ,  KESSELS LAMBERTUS GERARDUS MARIA ,  BOEF ARIE JEFFREY ,  BHATTACHARYYA KAUSTUVE ,  HINNEN PAUL CHRISTIAAN ,  PIETERS MARCO JOHANNES ANNEMARIE

IPC: G01N21/00 ,  G03F7/20

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

公开(公告)号：NL2008317A

公开(公告)日：2012-09-25

申请号：NL2008317

申请日：2012-02-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  WARNAAR PATRICK ,  BHATTACHARYYA KAUSTUVE ,  SMILDE HENDRIK ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20