公开(公告)号：JP2009188383A

公开(公告)日：2009-08-20

申请号：JP2008315117

申请日：2008-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN DOOL TEUNIS CORNELIS ,  OOSTERHUIS GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B08B3/02 ,  B08B5/02 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To solve a problem of contamination to a liquid immersed lithographic apparatus introduced via immersion liquid or via another mechanism. SOLUTION: The method for cleaning liquid immersed lithographic apparatus utilizes an aerosol spray to be guided to the surface to be cleaned. The aerosol spray utilizes an inert gas such as nitrogen or carbon dioxide, and as a solid or a liquid, water such as ultrapure water, another solvent or a cleaning fluid. Spray from the aerosol is enclosed in a space. If the aerosol collides with the surface to be cleaned, contaminated substances are removed. The removed contaminating substances are guided to an aerosol spray orifice or an outlet together with substances discharged from the outlet (a gas and a liquid and/or a solid). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：解决通过浸没液引入的液浸式光刻设备或通过其他机构的污染问题。 解决方案：用于清洗液浸光刻设备的方法利用气溶胶喷雾器被引导到待清洁的表面。 气溶胶喷雾使用惰性气体如氮气或二氧化碳，以及作为固体或液体的水，例如超纯水，另一溶剂或清洗液。 从气溶胶喷雾被封闭在一个空间中。 如果气溶胶与要清洁的表面碰撞，则污染物质被去除。 去除的污染物质与从出口排放的物质（气体和液体和/或固体）一起被引导到气溶胶喷雾孔或出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008294439A

公开(公告)日：2008-12-04

申请号：JP2008120668

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic equipment. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic equipment is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供易于有效清洁的平版印刷设备，并提供清洁方法以有效地清洁液浸光刻设备。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277819A

公开(公告)日：2008-11-13

申请号：JP2008114096

申请日：2008-04-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can be cleaned easily and effectively, and to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool that cleans the surface of a liquid containment system of the immersionm lithoraphic apparatus is disclosed and the liquid containment system has an aperture, through which radial beams can pass the liquid containment system of an immersion lithographic apparatus; the cleaning tool commprises an sonic transducer; a reservoir that holds liquid between the sonic transducer and the surface to be cleaned, and a barrier disposed under the aperture within the reservoir, in order to form a shield against sonic waves, when it is used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效清洁浸没式光刻设备的方法。 公开了一种清洁浸渍液体装置的液体容纳系统的表面的清洁工具，并且液体容纳系统具有孔，径向束可以通过该孔径通过浸没式光刻设备的液体容纳系统; 清洁工具会使声音传感器发生变化; 储存器，其在声音换能器和待清洁表面之间保持液体，以及设置在储存器内的孔下方的屏障，以便在使用时形成防止声波的屏蔽。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG137811A1

公开(公告)日：2007-12-28

申请号：SG2007036841

申请日：2007-05-21

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHEMUS JAC ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.