公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011071535A

公开(公告)日：2011-04-07

申请号：JP2010260034

申请日：2010-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic device. SOLUTION: The lithographic device includes: a substrate table WT configured to hold a substrate; a projection system configured to project a patterned radiation beam onto the substrate; a megasonic transducer 20 configured to clean a surface; and a liquid supply system configured to supply a liquid between the megasonic transducer 20 and the surface to be cleaned. A surface of an immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer 20 configured to clean the surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 光刻设备包括：被配置为保持衬底的衬底台WT; 投影系统，被配置为将图案化的辐射束投影到所述衬底上; 构造成清洁表面的兆声换能器20; 以及液体供应系统，其构造成在所述兆声换能器20和待清洁表面之间提供液体。 浸没光刻投影仪的表面使用被配置为清洁表面的兆声传感器20产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2012114469A

公开(公告)日：2012-06-14

申请号：JP2012055739

申请日：2012-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LEVACIA LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNARDUS ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。 排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。 这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011199304A

公开(公告)日：2011-10-06

申请号：JP2011115335

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。

公开(公告)号：JP2008300829A

公开(公告)日：2008-12-11

申请号：JP2008136199

申请日：2008-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHE ,  ANTONIUS LEENDERS MARTINUS HEN ,  LEVASIER LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNAR ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和设置有物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备具有用于排出液体通过衬底的边缘和其上支撑衬底的衬底台之间的间隙的排水口。 排水管设置有将液体供给到排水管的装置，而不管衬底台的位置和/或在排水管中使气体饱和的装置。 这些意味着减少由于排水管中的液体的蒸发导致的热损失的波动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011159986A

公开(公告)日：2011-08-18

申请号：JP2011065516

申请日：2011-03-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERICK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device.
SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device, the deformable layer 2 of the cleaning substrate CW1 is brought into contact with a surface of the device from which the contamination is removed, and a relative movement between the deformable layer 2 and the surface of the device from which the contamination is removed is introduced to remove the contamination separated from an immersion hood surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在浸没式光刻装置中去除浸没罩和/或浸液的污染物的方法。 解决方案：具有刚性支撑层和设置在刚性支撑层上的可变形层的清洁基板CW1装载在该装置中，清洁基板CW1的可变形层2与装置的表面接触 污染物被去除，并且引入可变形层2和去除污染物的装置的表面之间的相对运动，以去除与浸没罩表面分离的污染物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011129951A

公开(公告)日：2011-06-30

申请号：JP2011033186

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic apparatus.
SOLUTION: A cleaning apparatus for immersion lithographic apparatus comprises a substrate table so configured as to hold a substrate, a projection system PS configured to project a patterned radiation beam onto the substrate, a megasonic transducer 20 configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithographic projection apparatus is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 解决方案：一种用于浸没式光刻设备的清洁设备，包括：被配置为保持基板的基板台，配置成将图案化的辐射束投影到基板上的投影系统PS，配置成清洁表面的兆声换能器20，以及 液体供应系统，构造成在所述兆声换能器和待清洁表面之间提供液体。 浸没式光刻投影装置的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT