公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011187971A

公开(公告)日：2011-09-22

申请号：JP2011093700

申请日：2011-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种容易且有效地清洁的光刻设备，并提供一种有效地清洁液浸式光刻设备的清洁方法。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011129951A

公开(公告)日：2011-06-30

申请号：JP2011033186

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic apparatus.
SOLUTION: A cleaning apparatus for immersion lithographic apparatus comprises a substrate table so configured as to hold a substrate, a projection system PS configured to project a patterned radiation beam onto the substrate, a megasonic transducer 20 configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithographic projection apparatus is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 解决方案：一种用于浸没式光刻设备的清洁设备，包括：被配置为保持基板的基板台，配置成将图案化的辐射束投影到基板上的投影系统PS，配置成清洁表面的兆声换能器20，以及 液体供应系统，构造成在所述兆声换能器和待清洁表面之间提供液体。 浸没式光刻投影装置的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011097108A

公开(公告)日：2011-05-12

申请号：JP2011028118

申请日：2011-02-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which carries out cleaning readily and effectively, and also to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, and the liquid confinement system has an aperture to allow passage of a beam of radiation through the liquid confinement system of an immersion lithographic apparatus. The cleaning tool includes: a sonic transducer; a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned; and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种易于有效地进行清洁的光刻设备，并且还提供一种有效地清洗浸没式光刻设备的方法。 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，并且液体限制系统具有允许辐射束通过浸没式光刻的液体限制系统的孔 仪器。 清洁工具包括：声音换能器; 储存器，构造成在声音换能器和要清洁的表面之间保持液体; 以及位于孔下方的储存器中的屏障，在使用中形成对声波的屏蔽。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2008300824A

公开(公告)日：2008-12-11

申请号：JP2008120654

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304 ,  H01L21/68

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus. SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011071535A

公开(公告)日：2011-04-07

申请号：JP2010260034

申请日：2010-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic device. SOLUTION: The lithographic device includes: a substrate table WT configured to hold a substrate; a projection system configured to project a patterned radiation beam onto the substrate; a megasonic transducer 20 configured to clean a surface; and a liquid supply system configured to supply a liquid between the megasonic transducer 20 and the surface to be cleaned. A surface of an immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer 20 configured to clean the surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 光刻设备包括：被配置为保持衬底的衬底台WT; 投影系统，被配置为将图案化的辐射束投影到所述衬底上; 构造成清洁表面的兆声换能器20; 以及液体供应系统，其构造成在所述兆声换能器20和待清洁表面之间提供液体。 浸没光刻投影仪的表面使用被配置为清洁表面的兆声传感器20产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2008294439A

公开(公告)日：2008-12-04

申请号：JP2008120668

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic equipment. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic equipment is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供易于有效清洁的平版印刷设备，并提供清洁方法以有效地清洁液浸光刻设备。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277819A

公开(公告)日：2008-11-13

申请号：JP2008114096

申请日：2008-04-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can be cleaned easily and effectively, and to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool that cleans the surface of a liquid containment system of the immersionm lithoraphic apparatus is disclosed and the liquid containment system has an aperture, through which radial beams can pass the liquid containment system of an immersion lithographic apparatus; the cleaning tool commprises an sonic transducer; a reservoir that holds liquid between the sonic transducer and the surface to be cleaned, and a barrier disposed under the aperture within the reservoir, in order to form a shield against sonic waves, when it is used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效清洁浸没式光刻设备的方法。 公开了一种清洁浸渍液体装置的液体容纳系统的表面的清洁工具，并且液体容纳系统具有孔，径向束可以通过该孔径通过浸没式光刻设备的液体容纳系统; 清洁工具会使声音传感器发生变化; 储存器，其在声音换能器和待清洁表面之间保持液体，以及设置在储存器内的孔下方的屏障，以便在使用时形成防止声波的屏蔽。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG137811A1

公开(公告)日：2007-12-28

申请号：SG2007036841

申请日：2007-05-21

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHEMUS JAC ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.