公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008300824A

公开(公告)日：2008-12-11

申请号：JP2008120654

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304 ,  H01L21/68

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus. SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009016838A

公开(公告)日：2009-01-22

申请号：JP2008173127

申请日：2008-07-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOO ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN BOGAARD FREDERICK JOHA ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method for removing contamination from a device used for lithography as an immersion liquid may be contaminated by resist separated from a substrate or the layer deposited on the substrate or particles or flakes of other materials and such contamination, and can make it difficult or impossible to correctly project a (patterned) beam of radiation on the substrate via the immersion liquid. SOLUTION: The method comprises mounting the substrate on a device, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the device from which the contamination is removed, and introducing a relative motion between the deformable layer and the surface of the device from which the contamination is removed, thereby separating the contamination from the surface for removal, taking and removing the separated contamination. Other embodiments are described and claimed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种从用于平版印刷的装置中去除污染物的方法作为浸没液体可能被从基底或沉积在基底上的层或其它材料的颗粒或薄片等分离的抗蚀剂污染 污染，并且可能使得难以或不可能通过浸没液体将（图案化的）辐射束正确投影到基底上。 解决方案：该方法包括将衬底安装在器件上，衬底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得衬底的可变形层与器件的表面接触， 污染被去除，并且在可变形层和去除污染物的装置的表面之间引入相对运动，从而将污染物与表面分离，以除去，取出和除去分离的污染物。 描述和要求保护其他实施例。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009177183A

公开(公告)日：2009-08-06

申请号：JP2009012975

申请日：2009-01-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which can clean a surface of a liquid immersion lithography apparatus which comes into contact with immersion liquid during exposure of a substrate, whereon contaminant sometimes accumulates, and a device manufacturing method. SOLUTION: Ultraviolet radiation can be provided to a surface in cleaning without making the apparatus offline. Ultraviolet radiation is sent to an exit disposed in a desired position for cleaning operation from a remote radiation source by using a guide member. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其可以在暴露有时积聚的污染物的基板的曝光期间清洁与浸没液接触的液浸式光刻设备的表面，以及器件制造方法。

解决方案：可以在清洁中将紫外线辐射提供给表面，而不会使设备脱机。 通过使用引导构件将紫外线辐射送到设置在期望位置的出口，用于从远程辐射源进行清洁操作。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009152555A

公开(公告)日：2009-07-09

申请号：JP2008274272

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  BLOM PAUL ,  KRAMER RONALD HARM GUNTHER ,  VAN PUTTEN MICHEL ,  DE GRAAF ARIEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus, and an immersion lithographic apparatus including an apparatus for cleaning one or more surfaces. SOLUTION: The cleaning apparatus 42 may comprise a plasma radical source, a conduit, and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to a surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and the substrate table and/or the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于清洗浸没式光刻设备的基板或部件的清洁设备，以及包括用于清洁一个或多个表面的设备的浸没式光刻设备。 解决方案：清洁设备42可以包括等离子体激光源，导管和激光束限制系统。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供给待清洁的表面。 自由基限制系统可以引导自由基清洁表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 浸没式光刻设备可以包括用于支撑衬底的衬底台和用于将浸没流体限制在投影系统和衬底台和/或衬底之间的流体限制结构。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033162A

公开(公告)日：2009-02-12

申请号：JP2008187824

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  VAN DOMMELEN YOURI JOHANNES LA ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  DE JONG ANTHONIUS MARTINUS COR ,  CROMWIJK JAN WILLEM ,  THOMAS LAURSEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus. SOLUTION: The lithographic apparatus that includes a reflector for reflecting a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system used for cleaning. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。 公开了一种光刻设备，其包括用于将通过投影系统投射的清洁光束反射到液体回收系统的下侧的反射器。 还公开了用于照射用于清洁的液体供应系统的下侧的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2009267404A

公开(公告)日：2009-11-12

申请号：JP2009100474

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WATSO ROBERT DOUGLAS ,  VAN DOMMELEN YOURI JOHANNES LA ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  JEROEN JOHANNES SOPHIA MARIA M ,  STEIJAART PETER PAUL ,  DE JONG ANTHONIUS MARTINUS COR ,  VAN DE WINKEL JIMMY MATHEUS WI ,  DA PAZ SENA JOAO PAULO ,  VAN DER LEE MAURICE MARTINUS J ,  VAN LIER HENRICUS MARTINUS DOR ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus including a cleaning station. SOLUTION: Several embodiments of a cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with a final element of a projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括清洁站的光刻投影设备。 解决方案：公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。 版权所有（C）2010，JPO＆INPIT