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    Lithographic apparatus, cover used for lithographic apparatus, and method of designing cover used for lithographic apparatus
    12.
    发明专利
    Lithographic apparatus, cover used for lithographic apparatus, and method of designing cover used for lithographic apparatus 有权
    光栅设备，用于光刻设备的封面及其设计用于光刻设备的封面

    公开(公告)号：JP2011192994A

    公开(公告)日：2011-09-29

    申请号：JP2011050955

    申请日：2011-03-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ROSET NIEK JACOBUS JOHANNES ,  KATE NICOLAAS TEN ,  SERGEI SHULEPOV ,  LAFARRE RAYMOND WILHELMUS LOUIS

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a system which reduces defects by improving stability of a meniscus of immersion exposure. SOLUTION: The lithographic apparatus includes a fluid handling structure configured such that a space adjoining a substrate table and/or an upper-part surface of a substrate arranged in a recess of the substrate table includes immersion fluid, a cover 25 including a plane-shaped body extending around the substrate from the upper-part surface to a peripheral part of an upper-part principal surface of the substrate so as to cover a gap between an edge of the recess and an edge of the substrate during use, and an immersion fluid film disrupter configured to destroy formation of an immersion fluid film between an edge 143 of the cover and the immersion fluid included in the fluid handling structure during a period of movement of the substrate table relative to the fluid handling structure. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种通过提高浸没曝光的弯液面的稳定性来减少缺陷的系统。 解决方案：光刻设备包括流体处理结构，其被配置为使得邻近衬底台的衬底台和/或布置在衬底台的凹部中的衬底的上表面的空间包括浸没流体，盖25包括 从基板的上部表面延伸到基板的上部主表面的周边部分的平面状体，以便在使用期间覆盖凹部的边缘和基板的边缘之间的间隙，以及 浸没流体膜破坏器被配置为在衬底台相对于流体处理结构的移动期间，破坏在盖的边缘143和包括在流体处理结构中的浸没流体之间的浸没流体膜的形成。 版权所有（C）2011，JPO＆INPIT

    Lithography apparatus and device manufacturing method
    13.
    发明专利
    Lithography apparatus and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2011129914A

    公开(公告)日：2011-06-30

    申请号：JP2010276686

    申请日：2010-12-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ROSET NIEK JACOBUS JOHANNES ,  KATE NICOLAAS TEN ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  ZDRAVKOV ALEXANDER NIKOLOV

    IPC: H01L21/027

    CPC classification number: G03F7/70716 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus for reducing the possibility of, for example, a leak of drops from an immersion space or generation of air bubbles into the immersion space. SOLUTION: An immersion lithography apparatus is disclosed. The apparatus has: a fluid handling system for supplying an immersion fluid between a projection system final component and a surface having a characteristic portion in a cross section thereof; and an adjustment fluid source for locally changing the composition of the immersion fluid such that at least surface tension of the immersion fluid locally decreases when the meniscus of the immersion fluid contacts the characteristic portion. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于降低例如从浸没空间泄漏液滴或产生气泡进入浸入空间的可能性的光刻设备。 解决方案：公开了一种浸没式光刻设备。 该装置具有：流体处理系统，用于在投影系统最终部件和具有其截面中的特征部分的表面之间提供浸没流体; 以及用于局部地改变浸没流体的组成的调节流体源，使得当浸没流体的弯月面接触特征部分时，浸入流体的至少表面张力局部减小。 版权所有（C）2011，JPO＆INPIT

    Assembly having adjustment system and at least one object, adjustment system, lithography device, and method therefor
    14.
    发明专利
    Assembly having adjustment system and at least one object, adjustment system, lithography device, and method therefor 有权
    具有调整系统和至少一个对象的装配，调整系统，平面设备及其方法

    公开(公告)号：JP2007266602A

    公开(公告)日：2007-10-11

    申请号：JP2007071761

    申请日：2007-03-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER HAM RONALD ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  VOGEL HERMAN ,  ROSET NIEK JACOBUS JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70933 ,  G03F7/70775 ,  G03F7/70858 ,  G03F7/70866 ,  Y10T137/8593

    Abstract: PROBLEM TO BE SOLVED: To provide an adjustment system capable of performing accurate and stable measurement by properly controlling gas-pressure-temperature conditions in a space in which beams propagate, in an interferometer system that measures a table position.
    SOLUTION: The adjustment system is configured so that the system is provided with a fluid discharge passage that supplies an adjusted fluid to a beam space, at least a part of the space can be moved in the beam space and/or the outside of the beam space, and the discharge of an adjusted fluid is adjusted from the fluid discharge passage in accordance with the positions of the table.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够通过在测量台位置的干涉仪系统中适当地控制光束传播的空间中的气压 - 温度条件来进行精确和稳定的测量的调节系统。 解决方案：调节系统构造成使得系统设置有流体排放通道，该流体排放通道将调节的流体供应到梁空间，空间的至少一部分可以在梁空间和/或外部移动 并且根据台的位置从流体排出通道调节调节流体的排出。 版权所有（C）2008，JPO＆INPIT

    LITHOGRAPHIC APPARATUS AND METHOD FOR CONDITIONING AN INTERIOR SPACE OF A DEVICE MANUFACTURING APPARATUS
    15.
    发明专利
    LITHOGRAPHIC APPARATUS AND METHOD FOR CONDITIONING AN INTERIOR SPACE OF A DEVICE MANUFACTURING APPARATUS 未知

    公开(公告)号：SG131088A1

    公开(公告)日：2007-04-26

    申请号：SG2006066419

    申请日：2006-09-25

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN EMPEL TJARKO ADRIAAN RUDOL ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES

    Abstract: A lithographic apparatus, comprising at least a first gas shower (1) which is configured to supply a first gas flow (g 1 ) to an interior space of the apparatus, and at least a second gas shower (2) which is configured to supply a second gas flow (g 2 ) to the interior space of the apparatus, wherein the gas showers are configured to direct the first gas flow and the second gas flow at least partly towards each other. Also provided is a method for conditioning an interior space of a device manufacturing apparatus, wherein a first conditioned gas flow and a second conditioned gas flow are being supplied to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.

    16.
    发明专利
    未知

    公开(公告)号：DE602006008549D1

    公开(公告)日：2009-10-01

    申请号：DE602006008549

    申请日：2006-09-29

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN EMPEL TJARKO ADRIAAN RUDOLF ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES

    IPC: G03F7/20

    Abstract: A lithographic apparatus, comprising at least a first gas shower (1) which is configured to supply a first gas flow (g 1 ) to an interior space of the apparatus, and at least a second gas shower (2) which is configured to supply a second gas flow (g 2 ) to the interior space of the apparatus, wherein the gas showers are configured to direct the first gas flow and the second gas flow at least partly towards each other. Also provided is a method for conditioning an interior space of a device manufacturing apparatus, wherein a first conditioned gas flow and a second conditioned gas flow are being supplied to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.

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