公开(公告)号：IL316658A

公开(公告)日：2024-12-01

申请号：IL31665824

申请日：2024-10-29

Applicant: ASML NETHERLANDS BV ,  WARNAAR PATRICK ,  YOON CHANGSIK ,  ZHOU ZILI

Inventor： WARNAAR PATRICK ,  YOON CHANGSIK ,  ZHOU ZILI

IPC: G02B26/08 ,  G02B27/10

Abstract: Disclosed is an illumination module for a metrology device. The illumination module comprises a configurable illumination module operable to provide measurement illumination over a configurable range of illumination angles, a grating light valve module for controllably configuring a spectral configuration of the measurement illumination; and a controller operable to control the configurable illumination module and the grating light valve module such that the spectral configuration of the measurement illumination is varied in dependence with illumination angle within the range of illumination angles so as to obtain a desired detection condition for detection of diffracted radiation from a diffractive structure resultant from a measurement of the diffractive structure using the measurement illumination.

公开(公告)号：NL2014071A

公开(公告)日：2015-08-06

申请号：NL2014071

申请日：2014-12-30

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK JAN HIDDE ,  AUER BASTIAAN ONNE FAGGINGER ,  HARUTYUNYAN DAVIT ,  WARNAAR PATRICK

IPC: G01B11/30 ,  G03F7/20

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：NL2008317A

公开(公告)日：2012-09-25

申请号：NL2008317

申请日：2012-02-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  WARNAAR PATRICK ,  BHATTACHARYYA KAUSTUVE ,  SMILDE HENDRIK ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL1036351A1

公开(公告)日：2009-07-01

申请号：NL1036351

申请日：2008-12-22

Applicant: ASML NETHERLANDS BV

Inventor： HULSEBOS EDO MARIA ,  BIJNEN FRANCISCUS GODEFRIDUS CASPER ,  WARNAAR PATRICK

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

公开(公告)号：IL316705A

公开(公告)日：2024-12-01

申请号：IL31670524

申请日：2024-10-30

Applicant: ASML NETHERLANDS BV ,  VAN DER SCHAAR MAURITS ,  MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  DEN BOEF ARIE JEFFREY ,  ZACCA VINCENZO GIUSEPPE ,  WARNAAR PATRICK

Inventor： VAN DER SCHAAR MAURITS ,  MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  DEN BOEF ARIE JEFFREY ,  ZACCA VINCENZO GIUSEPPE ,  WARNAAR PATRICK

Abstract: Disclosed is a substrate comprising at least one target. The target comprises a plurality of sub-targets, the plurality of sub-targets comprising at least a first sub-target and second sub-target, each of the plurality of sub-targets comprising at least one subsegmented periodic structure having repetitions of a first region and a second region, wherein at least one of the first regions or second regions comprise subsegmented regions formed of periodic sub-features. The first sub-target comprises first subsegmentation characteristics for its subsegmented regions and the second sub-target comprises second subsegmentation characteristics for its subsegmented regions, the first subsegmentation characteristics and second subsegmentation characteristics being different in terms of at least one subsegmentation parameter.

公开(公告)号：NL2009079A

公开(公告)日：2013-02-27

申请号：NL2009079

申请日：2012-06-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHIJNDEL MARK ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2007765A

公开(公告)日：2012-05-15

申请号：NL2007765

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  COENE WILLEM ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G03F7/20

公开(公告)号：NL2007425A

公开(公告)日：2012-05-15

申请号：NL2007425

申请日：2011-09-15

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  WARNAAR PATRICK

IPC: G03F7/20

公开(公告)号：SG155136A1

公开(公告)日：2009-09-30

申请号：SG2009011396

申请日：2009-02-17

Applicant: ASML NETHERLANDS BV

Inventor： WARNAAR PATRICK

Abstract: A mark structure includes on a substrate, at least four lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the first direction. The pitch between each pair of selected lines differs from the pitch between each other pair of selected lines.