公开(公告)号：WO2013029893A2

公开(公告)日：2013-03-07

申请号：PCT/EP2012064755

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER ,  BLEEKER ARNO ,  DEN BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

Inventor： DE JAGER PIETER ,  BLEEKER ARNO ,  DEN BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70525 ,  G03F7/70675

Abstract: A lithographic system has a lithographic apparatus, an inspection system and a controller. The lithographic apparatus includes a projection system configured to project a radiation beam onto a layer of material on or above a substrate. The inspection system is configured to inspect a pattern formed on the substrate. The pattern is formed on the substrate by application of the radiation beam. The controller is configured to control the lithographic apparatus to form a pattern based on data from an inspection by the inspection system of a previously exposed pattern.

Abstract translation: 光刻系统具有光刻设备，检查系统和控制器。 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基底上或上方的材料层上。 检查系统被配置为检查形成在基板上的图案。 通过施加辐射束在衬底上形成图案。 控制器被配置为基于来自检查系统对先前曝光的图案的检查的数据来控制光刻设备以形成图案。

公开(公告)号：NL2010242A

公开(公告)日：2013-10-01

申请号：NL2010242

申请日：2013-02-05

Applicant: ASML NETHERLANDS BV

Inventor： HOEKS MARTINUS ,  BLEEKER ARNO

IPC: G03F7/20

公开(公告)号：NL2012052A

公开(公告)日：2014-08-04

申请号：NL2012052

申请日：2014-01-07

Applicant: ASML NETHERLANDS BV

Inventor： SMEETS DRIES ,  BLEEKER ARNO ,  LEE CHRIS ,  JAGER PIETER ,  MULDER HEINE ,  PELLENS RUDY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010176A

公开(公告)日：2013-08-26

申请号：NL2010176

申请日：2013-01-24

Applicant: ASML NETHERLANDS BV

Inventor： KOEK WOUTER ,  BLEEKER ARNO ,  LOOPSTRA ERIK ,  MULDER HEINE ,  ZWET ERWIN ,  SMEETS DRIES ,  EBELING ROBERT

IPC: G03F7/20

公开(公告)号：NL2010020A

公开(公告)日：2013-07-18

申请号：NL2010020

申请日：2012-12-20

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  BLEEKER ARNO

IPC: G03F7/20

公开(公告)号：NL2009761A

公开(公告)日：2013-05-30

申请号：NL2009761

申请日：2012-11-06

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  BLEEKER ARNO ,  LOOPSTRA ERIK

IPC: G03F7/20

Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.

公开(公告)号：NL2009222A

公开(公告)日：2013-03-04

申请号：NL2009222

申请日：2012-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  PHILIPS DANNY ,  BEERENS RUUD

IPC: G03F7/20

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

公开(公告)号：NL2006935A

公开(公告)日：2011-12-29

申请号：NL2006935

申请日：2011-06-15

Applicant: ASML NETHERLANDS BV

Inventor： STEVENS LUCAS ,  BLEEKER ARNO

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：AU2003216005A1

公开(公告)日：2003-10-08

申请号：AU2003216005

申请日：2003-03-19

Applicant: MICRONIC LASER SYSTEMS AB ,  ASML NETHERLANDS BV

Inventor： THUREN ANDERS ,  MAST KAREL VAN DER ,  BLEEKER ARNO

IPC: G03F7/20 ,  H01L21/027

Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.

公开(公告)号：NL2009213A

公开(公告)日：2013-02-19

申请号：NL2009213

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  WINTER LAURENTIUS

IPC: G03F7/20