公开(公告)号：WO2010096615A3

公开(公告)日：2010-12-09

申请号：PCT/US2010024664

申请日：2010-02-19

Applicant: BREWER SCIENCE INC ,  MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

IPC: G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomelic units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti- reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

Abstract translation: 提供酸敏敏的显影剂可溶性底部抗反射涂层组合物，以及使用这种组合物和由其形成的微电子结构的方法。 该组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。 该聚合物优选包含具有金刚烷基的重复单体单元。 该组合物还优选包含与聚合物一起分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。 在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。 底部抗反射涂料组合物是可热交联的，但可以在酸存在下解交联以使显影剂可溶。

公开(公告)号：WO2004076465A3

公开(公告)日：2005-06-02

申请号：PCT/US2004005753

申请日：2004-02-24

Applicant: BREWER SCIENCE INC ,  MEADOR JIM D ,  NAGATKINA MARIYA ,  HOLMES DOUG

Inventor： MEADOR JIM D ,  NAGATKINA MARIYA ,  HOLMES DOUG

IPC: C07F20060101 ,  C08F230/08 ,  C08G77/20 ,  G03C1/76

CPC classification number: G03F7/0751 ,  C08F230/08 ,  Y10T428/31663

Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo­silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include -OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

Abstract translation: 提供了新的平版印刷组合物（例如，用作三层工艺中的中间层）。 在一个实施方案中，组合物包含分散或溶解在溶剂体系中，优选交联剂和催化剂的有机硅聚合物。 在另一个实施方案中，有机硅聚合物被多面体低聚倍半硅氧烷的聚合物和/或多面体低聚倍半硅氧烷代替。 在任一实施方案中，聚合物和/或化合物还应包括用于组合物正确交联的-OH基团。 当用作中间层时，这些组合物可以作为非常薄的膜施加，其中非常薄的光致抗蚀剂层被施加到中间层的顶部。 因此，与现有技术的堆叠相比，即使整个叠层（即，抗反射涂层加中间层加光致抗蚀剂）仍然很薄，底层的抗反射涂层仍然被保护。

公开(公告)号：WO2004076465A8

公开(公告)日：2006-11-30

申请号：PCT/US2004005753

申请日：2004-02-24

Applicant: BREWER SCIENCE INC ,  MEADOR JIM D ,  NAGATKINA MARIYA ,  HOLMES DOUG

Inventor： MEADOR JIM D ,  NAGATKINA MARIYA ,  HOLMES DOUG

IPC: C08F230/08 ,  C07F20060101 ,  C08G77/20 ,  G03C1/76

CPC classification number: G03F7/0751 ,  C08F230/08 ,  Y10T428/31663

Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo­silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include -OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

Abstract translation: 提供了新的平版印刷组合物（例如，用作三层工艺中的中间层）。 在一个实施方案中，组合物包含分散或溶解在溶剂体系中的有机硅聚合物，优选交联剂和催化剂。 在另一个实施方案中，有机硅聚合物被多面体低聚倍半硅氧烷的聚合物和/或多面体低聚倍半硅氧烷代替。 在任一实施方案中，聚合物和/或化合物还应包括用于组合物正确交联的-OH基团。 当用作中间层时，这些组合物可以用作非常薄的薄膜，其中非常薄的光致抗蚀剂层被施加到中间层的顶部。 因此，与现有技术的堆叠相比，即使整个叠层（即，抗反射涂层加中间层加光致抗蚀剂）仍然很薄，底层的抗反射涂层仍然被保护。

公开(公告)号：WO0057247A8

公开(公告)日：2001-03-15

申请号：PCT/US0007463

申请日：2000-03-21

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  NOWAK KELLY A ,  XU GU

IPC: G03F7/11 ,  C08F8/00 ,  C08F220/32 ,  C08F283/10 ,  C09D133/06 ,  G03F7/09 ,  G03C1/492

CPC classification number: C08F8/00 ,  C08F283/10 ,  C09D133/062 ,  G03F7/091 ,  C08F20/00 ,  C08L2666/14 ,  C08L2666/28

Abstract: Anti-reflective coating compositions having improved etch rate, inter alia, are prepared from certain acrylic polymers and copolymers, such as, glycidyl methacrylate reacted with non-polycyclic carboxylic acid dyes and non-polycyclic phenolic dyes, all light absorbing at a wavelength of 193 nm.

Abstract translation: 具有改善的蚀刻速率的抗反射涂料组合物，特别是由某些丙烯酸聚合物和共聚物制备，例如与非多环羧酸染料和非多环酚类染料反应的甲基丙烯酸缩水甘油酯，所有光在波长193处吸光 纳米。

公开(公告)号：EP1392508A4

公开(公告)日：2006-06-07

申请号：EP02762137

申请日：2002-04-15

Applicant: BREWER SCIENCE INC

Inventor： SHAO XIE ,  MEADOR JIM D ,  BHAVE MANDAR ,  KRISHNAMURTHY VANDANA ,  NOWAK KELLY A ,  FOWLER MICHELLE ,  DESHPANDE SHREERAM V

IPC: G03F7/11 ,  B32B7/02 ,  C08J3/24 ,  C09D5/00 ,  C09D7/12 ,  C09D105/00 ,  C09D133/00 ,  C09D161/20 ,  C09D163/00 ,  C09D167/00 ,  C09D171/00 ,  C09D179/08 ,  C09D201/00 ,  G03F7/004 ,  G03F7/09 ,  H01L21/027 ,  B32B27/36 ,  G03C1/492

CPC classification number: C08J3/241 ,  G03F7/091 ,  Y10S430/151

Abstract: Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0.3% by weight of a strong acid. In another embodiment, the weight ratio of strong acid to weak acid in the composition is from about 0:100 to about 25:75. Examples of preferred weak acid compounds include phenolic compounds (e.g., Bisphenol S, Bisphenol A, alpha-cyano-4-hydroxycinnamic acid), carboxylic acids (e.g., acetic acid), phosphoric acid, and cyano compounds. The polymer and other ingredients are preferably physically mixed in a solvent system. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature).

公开(公告)号：EP1023634A4

公开(公告)日：2002-02-13

申请号：EP98952017

申请日：1998-09-28

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  GUERRERO DOUGLAS J ,  SHAO XIE ,  KRISHNAMURTHY VANDANA

IPC: G03F7/11 ,  C08F8/00 ,  C08F220/32 ,  C08F283/10 ,  C09D133/06 ,  G03F7/09 ,  G03C1/492 ,  G03C1/815

CPC classification number: G03F7/091 ,  C08F8/18 ,  C08F283/10 ,  C08F2800/10 ,  C08F2800/20 ,  C08F2810/20 ,  C09D133/062 ,  C08L2666/14 ,  C08L2666/28 ,  C08F120/32 ,  C08F8/14 ,  C08F20/32 ,  C08F8/00

Abstract: Anti-reflective coating compositions having improved etchrate, inter alia, are prepared from certain high molecular weight polymers and copolymers, particularly glycidyl methacrylate.

公开(公告)号：EP2399169A4

公开(公告)日：2012-10-10

申请号：EP10744334

申请日：2010-02-19

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

IPC: G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

Abstract translation: 提供了酸敏感的，显影剂可溶的底部抗反射涂层组合物，以及使用这些组合物的方法和由其形成的微电子结构。 组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。 聚合物优选包含具有金刚烷基的重复单体单元。 组合物还优选包含与聚合物分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。 在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。 底部抗反射涂层组合物是可热交联的，但可以在酸的存在下去交联以显影剂可溶。

公开(公告)号：EP2207837A4

公开(公告)日：2010-12-01

申请号：EP08843358

申请日：2008-10-30

Applicant: BREWER SCIENCE INC

Inventor： XU HAO ,  MERCADO RAMIL-MARCELO L ,  GUERRERO DOUGLAS J ,  MEADOR JIM D

IPC: C08G65/30 ,  C08G65/48 ,  C08J3/28 ,  G03F7/038 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08L25/18 ,  Y10S430/151

公开(公告)号：EP1090332A4

公开(公告)日：2001-08-29

申请号：EP99921436

申请日：1999-04-20

Applicant: BREWER SCIENCE INC

Inventor： SHAO XIE ,  MEADOR JIM D ,  BREWER TERRY LOWELL

IPC: G03F7/11 ,  C08B15/06 ,  C08L1/10 ,  C08L1/26 ,  C08L61/32 ,  C09D5/00 ,  C09D101/08 ,  C09D101/14 ,  C09D161/20 ,  G02B1/11 ,  G03F7/09 ,  C09D101/10

CPC classification number: C09D101/14 ,  G02B1/111 ,  G03F7/091

Abstract: Anti-reflective compostions are prepared from cellulosic binders and alkylated aminoplast cross-linking agents derived from melamine, urea, benzoguanamine or glycoluril. These compositions are used to form bottom anti-reflective layers with high plasma etch selectivity when used in multilayer photoresist processes.