TRANSFER APPARATUS
    11.
    发明专利

    公开(公告)号:JPH0294542A

    公开(公告)日:1990-04-05

    申请号:JP24626488

    申请日:1988-09-30

    Applicant: CANON KK

    Abstract: PURPOSE:To get a substrate in and out of a substrate container without rubbing by so providing an attitude correcting means for correcting the attitude of a transfer hand that the substrate and the hand are not brought into contact with the container. CONSTITUTION:A push bar 9 with a top raised by an actuator 12 lifts a hand locking plate 6. A sucking hand 4 is lifted by pins at three points on the plate 6, and its attitude is positioned in parallel with respect to an initially set attitude. A wafer container of a wafer cassette 8 is so regulated in advance as to become parallel to the attitude of a wafer 15 of the lifted state. Thus, the wafer 15 is inserted into the cassette 8 in the state that its attitude is corrected. Accordingly, the wafer 15 and the cassette 8 are not rubbed with each other.

    POSITIONING DEVICE
    12.
    发明专利

    公开(公告)号:JP2001296926A

    公开(公告)日:2001-10-26

    申请号:JP2000114225

    申请日:2000-04-14

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To prevent the increase of heat generation or the damage of a bearing based on the driving load of a linear motor, to miniaturize this device, to reduce the weight, to maintain control characteristics, and to save a setting space. SOLUTION: This device is provided with a reference board 1 arranged along an erected plane, a guide member 2 whose cross-section is shaped like a circle extended in the direction crossing the reference board 1, a top plate 4 supported by the guide member 2 to be driven to an almost horizontal direction, a tilt direction, and a rotational direction, a θ linear motor 8 being a driving mechanism for driving the top plate, and a linear encoder 10 and a capacitor displacement gauge 11 constituting measuring equipment for measuring the position and attitude of the top plate 4. Also, this device is provided with a diaphragm cylinder 9 as a driving force generating means for allowing couple of forces to act on the top plate 4, and the diaphragm cylinder 9 is sealed by diaphragms 9e and 9f.

    POSITIONING STAGE DEVICE, METHOD FOR MEASURING ITS POSITION, EXPOSURE DEVICE WITH POSITIONING STAGE DEVICE, AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号:JPH11295031A

    公开(公告)日:1999-10-29

    申请号:JP11279898

    申请日:1998-04-08

    Applicant: CANON KK

    Inventor: MATSUI SHIN

    Abstract: PROBLEM TO BE SOLVED: To provide a positioning stage device wherein, independent of movement of range-finding reference of a laser interferometer, range-finding is performed with precision for high-precision positioning. SOLUTION: An XY reference corner cubes 12 and 13 are provided at a mask θ stage 2 which is, holding a mask 1, provided for free movement in rotational direction, XY range-finding mirrors 10 and 11 are provided at a wafer XY stage 4 which, holding a wafer 3, can move in the XY direction, and by laser interferometers 20x and 20y, the XY range-finding mirrors 10 and 11 are allowed for measurement in XY direction with the reference corner cubes 12 and 13 as a range-finding reference. Thus, regardless of rotational movement of the mask θ stage 2, position and movement amount of the wafer XY stage 4 in XY direction is measured with precision at always with the reference corner cubes 12 and 13 as a range-finding reference, and the wafer XY stage 4 is positioned with high-precision, for managing of alignment between the mask 1 and the wafer 3 with high precision.

    ELECTRON BEAM ALIGNER AND MASK FOR ELECTRON BEAM EXPOSURE

    公开(公告)号:JPH10135102A

    公开(公告)日:1998-05-22

    申请号:JP28381496

    申请日:1996-10-25

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To improve the throughput by correcting the aberration which occurs when the electron beam from an arcuate area of an object defined by two circular arcs with center at the optical axis of a microelectronic optical system passes through a projection optical system. SOLUTION: When an electron beam at a wire area is focused on a wafer, the aberration (esp. curvature of field, astigmatism) increases away from the optical axis (esp. raidally outward from the optical axis) of an electron optical system. An electron beam at an arcuate region defined between two circular arcs with center at the optical axis is used therefor to nearly eliminate the curvature of field at an exposed region but leaving an astigmatism which is also nearly eliminated by means for correcting the dispersion or convergence different in the radial and tangential directions of the electron beam in the exposed region, since this beam has focal positions nearly the same in the radial and tangential directions.

    WAFER CONVEYANCE MECHANISM OF X-RAY ALIGNER

    公开(公告)号:JPH04188713A

    公开(公告)日:1992-07-07

    申请号:JP31592290

    申请日:1990-11-22

    Applicant: CANON KK

    Inventor: MATSUI SHIN

    Abstract: PURPOSE:To simplify the arrangement and miniaturize a device by providing wafer conveyance means for containing a supplying wafer cassette and a recovering wafer cassette in the same subchamber and moving each wafer cassette to a transfer location of the wafer. CONSTITUTION:There is provided through a first subchamber 101 a conveyance hand 102 for sucking/holding a wafer for conveyance between an exposure chamber and a second subchamber 104. There is further provided in the second subchamber 104 for moving a supplying wafer cassette 105 and a recovery wafer cassette 106 to a predetermined location where wafer delivery is performed through the conveyance hand 102. Accordingly, since the conveyance hand 102 can perform the transfer of wafers at the same location, the amount of movement of the conveyance hand 2 is reduced and locations needed to be positioned are also reduced. Hereby, device arrangement can be simplified and miniaturized.

    VACUUM SUCTION AND HOLDING APPARATUS

    公开(公告)号:JPH03135049A

    公开(公告)日:1991-06-10

    申请号:JP27304689

    申请日:1989-10-19

    Applicant: CANON KK

    Abstract: PURPOSE:To realize a reliable delivery operation by a method wherein the following are installed on respective branched pipelines: opening and shutting valves which open and shut the pipelines and conductance-regulating valves which adjust a conductance of the pipelines. CONSTITUTION:First, a vacuum is produced by means of a vacuum pump 15, a valve 4 of an orientation-flat inspection chuck 1 is opened; a wafer is sucked. In order to attache the wafer to a hand chuck 2 in this state, a valve 5 in opened. At this time, a conductance is reduced and a fluid resistance is increased by using a fluid-regulating valve 8; a difference in a pressure is increased; as a result, an influx of a gas from the chuck 2 can be reduced, and the wafer can be held at the chuck 1. The chuck 2 is approached to the wafer from this state, and the wafer is sucked to the chuck 2. Then, a vacuum of the chuck 1 is released, and the wafer is sucked only to the chuck 2. Then, when the wafer which has been sucked to the chuck 2 is sucked to a wafer chuck 3, the operation if performed likewise.

    X-RAY EXPOSURE DEVICE
    17.
    发明专利

    公开(公告)号:JPH03101216A

    公开(公告)日:1991-04-26

    申请号:JP23730089

    申请日:1989-09-14

    Applicant: CANON KK

    Abstract: PURPOSE:To maintain accuracy of the parts installed in a stage housing chamber with high accuracy and to suppress transmissivity fluctuation of X-rays by controlling differential pressure between the inside and the outside of a stage housing chamber by means of the inner pressure of the stage housing chamber for adjusting the exposure time according to the inner pressure. CONSTITUTION:Evacuation inside a stage housing chamber 1 is performed up to prescribed pressure while introducing helium until differential pressure between the inside of the stage housing chamber 1 and the open air becomes prescribed differential pressure followed by continuing supply of a fixed amount of helium while constantly detecting differential pressure by means of a differential pressure sensor 17 so that differential pressure inside and outside the stage chamber is not changed due to the fluctuation of atmospheric pressure in order to perform pressure adjustment so that the differential pressure may always be constant. When at this time, for instance, atmospheric pressure is fluctuated, an absolute pressure sensor 15 constantly detects the pressure inside the stage housing chamber 1 while feeding back this to a motor 8 driving a shutter 7 through a controller 18 to correct the switching time of the shutter, that is, the exposure amount for suppressing X-ray transmissivity fluctuation.

    POSITIONING DEVICE
    18.
    发明专利

    公开(公告)号:JP2001297973A

    公开(公告)日:2001-10-26

    申请号:JP2000114224

    申请日:2000-04-14

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To provide a positioning device by which the air space of a static pressure bearing is not reduced by the own weight of a support even in the case of the static pressure bearing has a pressure in a vertical direction. SOLUTION: The positioning device is provided with a top plate 4 supported by a base plate 1 and a static pressure bearing opposed to it at least in one direction with respect to the base plate 1, and has a force generating mechanism which makes moving elements including the base plate 1 or the top 4 generate a force in the reverse direction of the force G. The force generating mechanism generates a force in the reverse direction of a specified force by porous pads 7u and 7d as static pressure bearing mechanism or a magnetic force. The supply pressure is individually adjusted for the opposed static pressure bearings.

    STAGE DEVICE ALIGNER USING THE SAME, AND DEVICE MANUFACTURING METHOD THEREOF

    公开(公告)号:JPH11297795A

    公开(公告)日:1999-10-29

    申请号:JP11420898

    申请日:1998-04-09

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To improve the dynamic characteristics of a vertical-type stage. SOLUTION: In a stage device, an X-stage 30 for retaining a wafer or the like is driven in the direction of an X-axis by a linear motor 50, and a Y-stage 20 for supporting the X-stage 30 is driven in the direction of a Y-axis (in the vertical direction) by a Y linear motor 40. The Y-stage 20 is connected to a counter mass 61 for compensating for a dead weight by a belt 62, and the Y-stage 20 and the belt 62 are connected via an actuator 70, such as a bellows phragm and an air cylinder for the control of air pressure. By controlling the actuator 70 based on the position information of the X-stage 30, rotating moment is corrected and a load which is applied to the a Y-guide 11 is reduced.

    STAGE EQUIPMENT, ALIGNER USING THE EQUIPMENT AND DEVICE-MANUFACTURING METHOD

    公开(公告)号:JPH11297616A

    公开(公告)日:1999-10-29

    申请号:JP11421998

    申请日:1998-04-09

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To improve dynamic characteristics of a vertical stage. SOLUTION: A Y-stage 20 driven in the Y-axis direction (vertical direction) by a Y-linear motor 40 is linked with a counter mass 61 for self-weight compensation by using a belt 62. The Y-stage 20 is coupled with the belt 62 via an actuator 70 such as a fellowfram and an air cylinder which can control air pressure. On the basis of position information of the X-stage 30, the actuator 70 is controlled. Thereby angular moment is corrected, and a load applied to a Y-guide 11 is reduced. A linear motor accelerating the counter mass 61 in the direction opposite to the Y-linear motor 40 is installed on the back side of a surface plate 10. Thereby natural vibration of the counter mass 61 is eliminated, and vibration removing property is improved, together with the actuator 70.

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