公开(公告)号：DE69801261T2

公开(公告)日：2002-05-16

申请号：DE69801261

申请日：1998-04-14

Applicant: IBM

Inventor： RATH DAVID L ,  JAGANNATHAN RANGARAJAN ,  MCCULLOUGH KENNETH J ,  OKORN-SCHMIDT HARALD F ,  MADDEN KAREN P ,  POPE KEITH R

IPC: C03C15/00 ,  C09K13/08 ,  H01L21/308 ,  H01L21/311

Abstract: A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.

公开(公告)号：DE69524011D1

公开(公告)日：2002-01-03

申请号：DE69524011

申请日：1995-07-19

Applicant: IBM

Inventor： CANAPERI DONALD FRANCIS ,  JAGANNATHAN RANGARAJAN ,  KRISHNAN MAHADEVAIVER

IPC: C23C18/31 ,  C23C18/16 ,  C23C18/44 ,  C23C18/42

公开(公告)号：DE19824046A1

公开(公告)日：1999-01-14

申请号：DE19824046

申请日：1998-05-29

Applicant: IBM

Inventor： HUYNH CUC ,  JAGANNATHAN RANGARAJAN ,  JHA AMARNATH ,  MARTIN THOMAS ,  POPE KEITH ,  SANDWICK THOMAS

IPC: H01L21/304 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00 ,  H01L21/306 ,  C23G5/036 ,  C23G3/00 ,  C07C215/08 ,  C09G1/02 ,  B08B3/08

Abstract: Removal of emulsion from semiconductor wafers in a chemical-mechanical polishing (CMP) process uses an aqueous solution of a trialkanolamine (I) for cleaning. Also claimed is a CMP wafer planarisation process using a colloidal suspension containing alumina during polishing and a cleaning solution containing (I) during or after polishing.

公开(公告)号：DE68902551T2

公开(公告)日：1993-04-29

申请号：DE68902551

申请日：1989-02-03

Applicant: IBM

Inventor： JAGANNATHAN RANGARAJAN ,  KRISHNAN MAHADEVAIYER ,  WANDY GREGORY P

IPC: C23C18/40

公开(公告)号：MY118712A

公开(公告)日：2005-01-31

申请号：MYPI9802282

申请日：1998-05-22

Applicant: IBM

Inventor： RATH DAVID L ,  JAGANNATHAN RANGARAJAN ,  MCCLLOUGH KENNETH J ,  OKORN-SCHMIDT HARALD F ,  MADDEN KAREN P ,  POPE KEITH R

IPC: H01L21/302 ,  B44C1/22 ,  C03C15/00 ,  C09K13/08 ,  H01L21/308 ,  H01L21/311

Abstract: A SILICATE GLASS IS SELECTIVELY ETCHED EMPLOYING A COMPOSITION CONTAINING A FLUORIDE CONTAINING COMPOUND AND CERTAIN ORGANIC SOLVENTS. PREFERRED COMPOSITIONS ALSO INCLUDE WATER.

公开(公告)号：DE69801261D1

公开(公告)日：2001-09-06

申请号：DE69801261

申请日：1998-04-14

Applicant: IBM

Inventor： RATH DAVID L ,  JAGANNATHAN RANGARAJAN ,  MCCULLOUGH KENNETH J ,  OKORN-SCHMIDT HARALD F ,  MADDEN KAREN P ,  POPE KEITH R

IPC: C03C15/00 ,  C09K13/08 ,  H01L21/308 ,  H01L21/311

Abstract: A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.

公开(公告)号：DE69003728T2

公开(公告)日：1994-05-05

申请号：DE69003728

申请日：1990-03-20

Applicant: IBM

Inventor： JAGANNATHAN RANGARAJAN ,  KNARR RANDOLPH FREDERICK ,  KRISHNAN MAHADEVAIYER ,  WANDY GREGORY PETER

IPC: C23C18/40

公开(公告)号：DE68902551D1

公开(公告)日：1992-10-01

申请号：DE68902551

申请日：1989-02-03

Applicant: IBM

Inventor： JAGANNATHAN RANGARAJAN ,  KRISHNAN MAHADEVAIYER ,  WANDY GREGORY P

IPC: C23C18/40