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    12.
    发明专利
    未知

    公开(公告)号：DE68917310D1

    公开(公告)日：1994-09-08

    申请号：DE68917310

    申请日：1989-12-13

    Applicant: IBM

    Inventor： FINK HANS-WERNER DR ,  SCHMID HEINZ ,  STOCKER WERNER

    IPC: H01J37/073 ,  H01J37/08 ,  H01J37/12

    Abstract: The Delta-Phi microlens consists of a first foil (3) of a metal or alloy from the group of transition metals and a second foil (4) of a metal or alloy from the group comprising the elements of IA or IIA groups of the periodic system of elements, the second foil (4) being coated onto one surface of said first foil (3). A hole (2) extends through both foils (3, 4) in precise alignment with the axis (6) of a sharply pointed tip (1) made of conductive material and placed at a distance of the order of 1 mu m from that surface of said first foil (3) opposite said second foil (4). With the first foil (3) connected to ground and a potential on the order of -30 V applied at said tip (1), at ultra-high vacuum conditions, a beam of low-energy electrons will have trajectories (5) deviated towards a focal point (7). With a positive potential of more than 30 V applied to said tip (1), and in a noble gas atmosphere, a beam of ions passing through the microlens of the invention will have trajectories (5) deflected towards said focal point (7).

    13.
    发明专利
    未知

    公开(公告)号：DE3887891D1

    公开(公告)日：1994-03-24

    申请号：DE3887891

    申请日：1988-11-01

    Applicant: IBM

    Inventor： FINK HANS-WERNER DR ,  MORIN ROGER DR ,  SCHMID HEINZ ,  STOCKER WERNER

    IPC: H01J27/26 ,  G01Q40/02 ,  G01Q70/12 ,  G01Q70/16 ,  G01Q90/00 ,  H01J1/304 ,  H01J37/06 ,  H01J37/073 ,  H01J37/08

    Abstract: This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single atom or a trimer of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electroms beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold. The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is

    Producing a mono-crystalline sheet
    14.
    发明专利
    Producing a mono-crystalline sheet 未知

    公开(公告)号：GB2494565A

    公开(公告)日：2013-03-13

    申请号：GB201221842

    申请日：2011-05-23

    Applicant: IBM

    Inventor： RIEL HEIKE E ,  SCHMID HEINZ ,  BJOERK MIKAEL T

    IPC: C30B11/10 ,  C30B11/12 ,  C30B13/18 ,  C30B15/08 ,  H01L31/18

    Abstract: A method for producing a mono-crystalline sheet (11), in particular a silicon sheet (11), comprises: providing at least two aperture elements (1, 2) forming a gap (3) in-between; providing a molten alloy (4) comprising silicon in the gap (3) between said at least two aperture elements (1, 2); providing a gaseous precursor medium (5) comprising silicon in the vicinity of the molten alloy (4); providing a silicon nucleation crystal (6) in the vicinity of the molten alloy (4); and bringing in contact said silicon nucleation crystal (6) and the molten alloy (4). A device (10, 20) for producing a mono-crystalline sheet (11), in particular a silicon sheet (11), comprises at least two aperture elements (1, 2) at a predetermined distance (D) from each other thereby forming a gap (3), and being adapted to be heated for holding a molten alloy (4) comprising silicon by surface tension in the gap (3) between the aperture elements (1,2 ); a means (15) for supplying a gaseous precursor medium (5) comprising silicon in the vicinity of the molten alloy (4); and a positioning means (16) for holding and moving a nucleation crystal (6) in the vicinity of the molten alloy (2).

    16.
    发明专利
    未知

    公开(公告)号：DE68917310T2

    公开(公告)日：1995-03-09

    申请号：DE68917310

    申请日：1989-12-13

    Applicant: IBM

    Inventor： FINK HANS-WERNER DR ,  SCHMID HEINZ ,  STOCKER WERNER

    IPC: H01J37/073 ,  H01J37/08 ,  H01J37/12

    Abstract: The Delta-Phi microlens consists of a first foil (3) of a metal or alloy from the group of transition metals and a second foil (4) of a metal or alloy from the group comprising the elements of IA or IIA groups of the periodic system of elements, the second foil (4) being coated onto one surface of said first foil (3). A hole (2) extends through both foils (3, 4) in precise alignment with the axis (6) of a sharply pointed tip (1) made of conductive material and placed at a distance of the order of 1 mu m from that surface of said first foil (3) opposite said second foil (4). With the first foil (3) connected to ground and a potential on the order of -30 V applied at said tip (1), at ultra-high vacuum conditions, a beam of low-energy electrons will have trajectories (5) deviated towards a focal point (7). With a positive potential of more than 30 V applied to said tip (1), and in a noble gas atmosphere, a beam of ions passing through the microlens of the invention will have trajectories (5) deflected towards said focal point (7).

    LOW-VOLTAGE SOURCE FOR NARROW ELECTRON/ION BEAMS
    17.
    发明专利
    LOW-VOLTAGE SOURCE FOR NARROW ELECTRON/ION BEAMS 未知

    公开(公告)号：CA1311863C

    公开(公告)日：1992-12-22

    申请号：CA607014

    申请日：1989-07-28

    Applicant: IBM

    Inventor： FINK HANS-WERNER ,  MORIN ROGER ,  SCHMID HEINZ ,  STOCKER WERNER

    IPC: H01J27/26 ,  G01Q40/02 ,  G01Q70/12 ,  G01Q70/16 ,  G01Q90/00 ,  H01J1/304 ,  H01J37/06 ,  H01J37/073 ,  H01J37/08 ,  H01J27/02

    Abstract: This source for charged particles, comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of tip (1) is made sharp enough, i.e., if it ends in a single atom or a triter of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electrons beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold. The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is

    19.
    发明专利
    未知

    公开(公告)号：AT396048T

    公开(公告)日：2008-06-15

    申请号：AT04292954

    申请日：2004-12-10

    Applicant: ESSILOR INT ,  IBM

    Inventor： SCHMID HEINZ ,  MICHEL BRUNO ,  KLOTER URS ,  KELLER GERHARD ,  CANO JEAN-PAUL

    IPC: B41F17/00 ,  B29C33/30 ,  B29C33/42 ,  B29C39/02 ,  B29C39/10 ,  B41F17/30

    Abstract: A stamp for patterning onto a receiving surface (103) of an object (101) according to a defined pattern (P) comprises a stamping surface (21) of a resilient diaphragm (20). The stamping surface (21) is planar at rest. The pattern (P) is reproduced on the stamping surface (21) and the diaphragm (20) is affixed to a rigid body (13) along a peripheral edge, so that a middle part of the diaphragm (20) can move along a direction perpendicular to the stamping surface (21). The diaphragm (20) is more flexible near the peripheral edge than in the middle part. Then, the pattern (P) printed on a pseudo-spherical receiving surface (103) using the stamp exhibits few distortion.

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