14.
    发明专利
    未知

    公开(公告)号:DE50114591D1

    公开(公告)日:2009-01-29

    申请号:DE50114591

    申请日:2001-05-22

    Abstract: Production of a layer having a locally adapted and/or predefined layer thickness profile comprises applying a layer onto a substrate; determining a removal profile for the applied layer; and guiding an ion beam once over the layer so that the layer is locally etched at the site of the ion beam corresponding to the removal profile and a layer having a locally adapted and/or predefined layer thickness profile is produced. Preferably the spread of the ion beam is more than 1, preferably more than 5 mm, or less than 100 mm, preferably less than 50 mm. The ion beam is an argon ion beam with a gauss-like current density distribution. The ion beam is guided in traces over the layer and the trace distance is less than the half-width spread of the beam.

    RESONADOR ACUSTICO.
    16.
    发明专利

    公开(公告)号:ES2276835T3

    公开(公告)日:2007-07-01

    申请号:ES01976209

    申请日:2001-09-10

    Abstract: Resonador acústico con un primer electrodo (E1), un segundo electrodo (E2) y una capa piezoeléctrica (P) dispuesta en medio, disponiéndose entre el primer electrodo (E1) y la capa piezoeléctrica (P) una primera capa de compresión acústica (V1), que presenta una mayor impedancia acústica que el primer electrodo (E1), caracterizado porque la razón de la impedancia acústica de la primera capa de compresión acústica (V1) respecto a la impedancia acústica de la capa piezoeléctrica (P) es mayor que 2.

    18.
    发明专利
    未知

    公开(公告)号:AT268056T

    公开(公告)日:2004-06-15

    申请号:AT01962822

    申请日:2001-07-03

    Abstract: A semiconductor component is provided having a layer sequence for conversion of acoustic to thermal signals and electrical voltage changes to one another, as well as a process for its production. The layer sequence has a lower electrode, an upper electrode and a layer which is arranged between them and is piezoelectrical or pyroelectrical. An auxiliary layer is arranged between the lower electrode and the layer and is used for homogeneously oriented growth of the layer during the production process. The auxiliary layer preferably consists essentially of amorphous silicon, amorphous silicon oxide or amorphous silicon nitride.

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