公开(公告)号：DE69831186D1

公开(公告)日：2005-09-22

申请号：DE69831186

申请日：1998-04-28

Applicant: JSR CORP

Inventor： HIRAOKA HIROYUKI ,  TAKEUCHI YASUMASA ,  KIMURA SHIN-ICHI ,  MATSUKI YASUO ,  OGAWA TOSHIHIRO ,  KIMURA MASAYUKI

IPC: G02F1/1337 ,  C08G73/10

Abstract: A method of producing a liquid crystal alignment layer comprising exposing an organic film to polarized pulse laser beam to align molecules in a surface portion of the organic film. There is provided a liquid crystal alignment layer composed of a polyamide film having aligned molecules in a surface portion.

公开(公告)号：AU2003272881A1

公开(公告)日：2004-06-23

申请号：AU2003272881

申请日：2003-09-17

Applicant: JSR CORP

Inventor： SAKAI TATSUYA ,  OKADA SACHIKO ,  MATSUKI YASUO

IPC: C07C51/00 ,  C23C16/18 ,  C07C11/12 ,  C07C13/263 ,  C07C53/124 ,  C07C53/18

Abstract: A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example

公开(公告)号：DE69700925D1

公开(公告)日：2000-01-20

申请号：DE69700925

申请日：1997-02-06

Applicant: JSR CORP

Inventor： KIMURA MASAYUKI ,  TOYOSHIMA TSUKASA ,  YAMAMOTO KEIICHI ,  WAKABAYASHI KENGO ,  MATSUKI YASUO ,  YASUDA KYOUYU

IPC: C08G73/10 ,  G02F1/1337 ,  C09K19/38

Abstract: There are provided a polyamic acid obtainable by reacting a diamine compound of the formula (1) wherein R is an alkyl group having 1 to 12 carbon atoms, a haloalkyl group having 1 to 12 carbon atoms or a halogen atom, each of X and Y is independently a divalent linking group, with a tetracarboxylic acid dianhydride; a polyimide obtainable by dehydrating and ring-closing the above polyamic acid; and a liquid crystal aligning agent containing the above polyamic acid and/or the above polyimide.

公开(公告)号：DE60041569D1

公开(公告)日：2009-04-02

申请号：DE60041569

申请日：2000-03-29

Applicant: SEIKO EPSON CORP ,  JSR CORP

Inventor： FURUSAWA MASAHIRO ,  SEKI SHUNICHI ,  MIYASHITA SATORU ,  SHIMODA TATSUYA ,  YUDASAKA ICHIO ,  MATSUKI YASUO ,  TAKEUCHI YASUMASA

IPC: H01L31/042 ,  H01L21/208 ,  H01L27/142 ,  H01L31/04 ,  H01L31/06 ,  H01L31/075 ,  H01L31/077 ,  H01L31/18 ,  H01L31/20

Abstract: In the manufacture of a solar battery having a structure in which at least two semiconductor thin-films are disposed one over the other between a pair of electrodes, each semiconductor thin-film differing from the other in the impurity concentration thereof and/or the type of semiconductor, the formation of at least one of the semiconductor thin-films comprises a step of coating a liquid coating composition containing a silicon compound so as to form a coating film and a step of converting the coating film into a silicon film by heat treatment and/or light treatment.

公开(公告)号：DE69732949T2

公开(公告)日：2006-02-23

申请号：DE69732949

申请日：1997-05-15

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  YASUDA KYOUYU ,  KAWAMURA SHIGEO ,  TOYOSHIMA TSUKASA ,  MATSUKI YASUO ,  WAKABAYASHI KENGO

IPC: C08G73/10 ,  G02F1/1337

Abstract: A liquid crystal alignment agent containing at least two kinds of polymers selected from the group consisting of polyamic acids and imidized polymers and having a structure obtained by dehydration and ring closure of polyamic acid. In the at least two kinds of polymers contained in the liquid crystal alignment agent, the polymer of higher imidization degree has a smaller surface free energy. The liquid crystal alignment agent gives a liquid crystal display device having less stuck image and high pretilt angle.

公开(公告)号：AU2003292754A1

公开(公告)日：2004-08-13

申请号：AU2003292754

申请日：2003-12-24

Applicant: JSR CORP

Inventor： MATSUKI YASUO ,  YOKOYAMA YASUAKI

IPC: C03C17/10 ,  C03C17/36 ,  C23C18/08 ,  C23C18/12 ,  C23C18/14 ,  H01B5/14 ,  H01B13/00 ,  H01L31/04

Abstract: A composition for forming a silicon.aluminum film, containing a silicon compound and an aluminum compound. The silicon.aluminum film is obtained by forming a coating film of the above composition and treating it with heat and/or light.

公开(公告)号：DE69530053T2

公开(公告)日：2003-12-11

申请号：DE69530053

申请日：1995-12-13

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  KAWAMURA SHIGEO ,  MATSUKI YASUO ,  YASUDA KYOUYU ,  MIYAMOTO TSUYOSHI

IPC: C08G73/10 ,  G02F1/1337

公开(公告)号：DE69530053D1

公开(公告)日：2003-04-30

申请号：DE69530053

申请日：1995-12-13

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  KAWAMURA SHIGEO ,  MATSUKI YASUO ,  YASUDA KYOUYU ,  MIYAMOTO TSUYOSHI

IPC: C08G73/10 ,  G02F1/1337

公开(公告)号：AU9593601A

公开(公告)日：2002-04-29

申请号：AU9593601

申请日：2001-10-16

Applicant: JSR CORP

Inventor： SHIHO HIROSHI ,  KATO HITOSHI ,  MATSUKI YASUO ,  EBATA SATOSHI ,  MARUYAMA YOICHIRO ,  YOKOYAMA YASUAKI

IPC: C07F15/00 ,  C07C13/263 ,  C07C49/92 ,  C07C69/72 ,  C07C53/02 ,  C07C53/08 ,  C07C53/126 ,  C07C55/06 ,  C23C18/08

Abstract: A composition capable of forming a metal ruthenium film and a ruthenium oxide film by a simple application/baking process, a process for forming a metal ruthenium film and a ruthenium oxide film from the composition, a metal ruthenium film and a ruthenium oxide film formed by the process, and electrodes formed of the films.A solution composition comprising a specific ruthenium complex. The coating film of this solution composition is heated in an atmosphere containing no oxygen or an atmosphere containing oxygen to form a metal ruthenium film or a ruthenium oxide film, respectively, and electrodes formed of the films.

公开(公告)号：EP1640342A4

公开(公告)日：2006-11-22

申请号：EP04746061

申请日：2004-06-11

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  WANG DAOHAI ,  MATSUKI YASUO ,  KATO HITOSHI

IPC: C01B33/04 ,  C01B33/02 ,  C01B33/021 ,  C01B33/08 ,  C08G77/60 ,  C08L83/16 ,  C09D4/00 ,  C09D183/16 ,  C23C18/08 ,  C23C18/14 ,  H01L21/208

CPC classification number: C09D183/16 ,  C01B33/08 ,  C09D4/00 ,  H01L21/02422 ,  H01L21/02425 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/02628 ,  C08G77/00

Abstract: A silane polymer is disclosed which has a larger molecular weight in view of boiling point, safety, and wetting property in case when it is applied to a substrate. In particular, a composition is disclosed which enables to form a good silicon film easily. A composition for forming a silicon film is disclosed which contains a silane polymer obtained by irradiating a photopolymerizable silane compound with light in a specific wavelength range for causing photopolymerization thereof. A method for forming a silicon film is also disclosed wherein such a composition is applied to a substrate and then subjected to heat treatment and/or photo treatment.