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    11.
    发明专利
    未知

    公开(公告)号：DE69728366D1

    公开(公告)日：2004-05-06

    申请号：DE69728366

    申请日：1997-12-12

    Applicant: JSR CORP

    Inventor： SUWA MITSUHITO ,  IWASAWA HARUO ,  KAJITA TORU ,  IWANAGA SHIN-ICHIRO

    IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039

    Abstract: A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R , R , R , and R are an alkyl group , R and R are a hydroxyl group or -OR (wherein R is an organic group), A1 and A2 indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.

    12.
    发明专利
    未知

    公开(公告)号：DE69220257T3

    公开(公告)日：2002-06-13

    申请号：DE69220257

    申请日：1992-01-24

    Applicant: JSR CORP

    Inventor： KAJITA TORU ,  OTA TOSHIYUKI ,  YUMOTO YOSHIJI ,  MIURA TAKAO

    IPC: C08G8/24 ,  G03F7/022 ,  G03F7/023 ,  H01L21/70

    Abstract: 1. An i-ray sensitive positive resist composition: which (A) comprises an alkali-soluble novolak resin obtained by subjecting (a) a phenolic mixture of 5 to 95 mol% of 2,3-xylenol with 95 to 5 mol% of a phenol selected from mon-, di- and tri-methyl phenols other than 2,3-xylenol or (b) a phenolic mixture of 5 to 50 mol% of 3,4-xylenol with 95 to 50 mol% of a phenol selected from mono-, di- and trimethyl phenols other than 3,4-xylenol to polycondensation together with an aldehyde, and a 1,2-quinonediazide compound, and (B) which has sensitivity to i-ray. There is also provided a method of forming a pattern, which comprises: (1) applying the i-ray sensitive positive resist composition to a wafer to form a photosensitive layer, (2) irradiating the photosensitive layer with i-ray through a predetermined pattern, and (3) developing the pattern with a developer.

    13.
    发明专利
    未知

    公开(公告)号：DE60235663D1

    公开(公告)日：2010-04-29

    申请号：DE60235663

    申请日：2002-01-17

    Applicant: JSR CORP

    Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASAFUMI ,  KATAOKA ATSUKO ,  KAJITA TORU

    IPC: G03F7/038 ,  G03F7/039 ,  G03F7/004

    Abstract: A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.

    16.
    发明专利
    未知

    公开(公告)号：AT315245T

    公开(公告)日：2006-02-15

    申请号：AT00120000

    申请日：2000-09-14

    Applicant: JSR CORP

    Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

    IPC: G03F7/027 ,  G03F7/004 ,  G03F7/039

    Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

    Radiation-sensitive composition, color filter, black matrix, and liquid crystal display element
    19.
    发明专利
    Radiation-sensitive composition, color filter, black matrix, and liquid crystal display element 审中-公开
    辐射敏感组合物，彩色滤光片，黑色矩阵和液晶显示元件

    公开(公告)号：JP2010061041A

    公开(公告)日：2010-03-18

    申请号：JP2008228954

    申请日：2008-09-05

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： MINOWA TAKAKI ,  KAJITA TORU

    IPC: G03F7/031 ,  C09B67/20 ,  C09B67/46 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/038

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming a color layer, which forms a fine pattern without causing chipping in a pattern edge or undercut even when the luminous energy of exposure is low, without generating an undissolved substance remaining during development or scum on a pattern edge, and forms a color filter with high color purity and a black matrix having high light-shielding property. SOLUTION: The radiation-sensitive composition contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a specific photopolymerization initiator represented by a compound No.1. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于形成彩色层的辐射敏感性组合物，其即使在曝光的光能量低的情况下也形成精细图案而不会在图案边缘或底切中产生切屑，而不产生未溶解的物质 在图案边缘的显影或浮渣期间保留，并且形成具有高纯度的滤色器和具有高遮光性的黑色矩阵。 解决方案：辐射敏感性组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）由化合物1表示的特定光聚合引发剂。 版权所有（C）2010，JPO＆INPIT

    Thermosetting resin composition, method for producing color filter protective film, and color filter protective film
    20.
    发明专利
    Thermosetting resin composition, method for producing color filter protective film, and color filter protective film 审中-公开
    热固性树脂组合物，生产彩色滤光片保护膜的方法和彩色滤光片保护膜

    公开(公告)号：JP2009203345A

    公开(公告)日：2009-09-10

    申请号：JP2008046791

    申请日：2008-02-27

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： ICHINOHE DAIGO ,  KAJITA TORU

    IPC: C08L63/00 ,  C08G59/32 ,  C08G59/40 ,  C08K5/13 ,  G02B5/20

    Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition, which is suitably used to form a color filter protective film having excellent adhesiveness to an ITO film even under high temperature and high humidity, high in transparency and surface hardness, and excellent in various resistances such as sputtering resistance. SOLUTION: The thermosetting resin composition comprises: [A] a polymer having a repeating unit derived from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group; and [B] a calixarene compound having a specific structure. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 解决的问题：为了提供一种热固性树脂组合物，其适用于形成即使在高温高湿下也具有优异的与ITO膜的密合性的滤色器保护膜，透明性和表面硬度高， 在各种电阻例如溅射电阻。 解决方案：热固性树脂组合物包含：[A]具有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物; 和[B]具有特定结构的杯芳烃化合物。 版权所有（C）2009，JPO＆INPIT

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