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    OVERLAY TARGETS WITH ORTHOGONAL UNDERLAYER DUMMYFILL
    11.
    发明专利
    OVERLAY TARGETS WITH ORTHOGONAL UNDERLAYER DUMMYFILL 未知

    公开(公告)号：SG2014008841A

    公开(公告)日：2015-01-29

    申请号：SG2014008841

    申请日：2013-05-21

    Applicant: KLA TENCOR CORP

    Inventor： AMIR NURIEL ,  COHEN GUY ,  LEVINSKI VLADIMIR ,  ADEL MICHAEL

    IPC: H01L21/027 ,  G03F1/42

    Abstract: The disclosure is directed to designing and using an overlay target with orthogonal underlayer dummyfill. According to various embodiments, an overlay target may include one or more segmented overlay pattern elements forming at least one overlay target structure. The overlay target may further include one or more inactive pattern elements forming at least one dummyfill target structure. Each of the one or more inactive pattern elements may include dummyfill segmented along an axis orthogonal to a segmentation axis of at least one proximately disposed overlay pattern element. In some embodiments, each of the target structures or layers may be formed from a separate process layer successively disposed upon a substrate, such as a silicon wafer. In some embodiments, the overlay and dummyfill target structures may be twofold or fourfold rotationally symmetric to allow for certain manufacturing or metrology advantages.

    MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS
    12.
    发明申请
    MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 审中-公开
    多层叠加计量目标和综合覆盖度量度测量系统

    公开(公告)号：WO2012018673A3

    公开(公告)日：2012-05-18

    申请号：PCT/US2011045778

    申请日：2011-07-28

    Applicant: KLA TENCOR CORP ,  KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  COHEN GUY

    Inventor： KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  COHEN GUY

    IPC: H01L21/027

    CPC classification number: G03F7/70633 ,  G03F7/70683

    Abstract: A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.

    Abstract translation: 公开了一种用于基于成像的计量学的多层覆盖目标。 覆盖目标包括包括三个或更多个目标结构的多个目标结构，每个目标结构包括一组两个或多个模式元素，其中目标结构被配置为在目标结构对准时共享公共对称中心，每个目标结构 目标结构相对于公共对称中心不变为N度旋转，其中N等于或大于180度，其中两个或更多个图案元素中的每一个具有单独的对称中心，其中两个或更多个图案 每个目标结构的元素对于单个对称中心的M度旋转是不变的，其中M等于或大于180度。

    METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES
    14.
    发明专利
    METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES 未知

    公开(公告)号：SG11201913459RA

    公开(公告)日：2020-07-29

    申请号：SG11201913459R

    申请日：2018-11-29

    Applicant: KLA TENCOR CORP

    Inventor： YOEL FELER ,  GHINOVKER MARK ,  SVIZHER ALEXANDER ,  LEVINSKI VLADIMIR ,  TARSHISH-SHAPIR INNA

    IPC: G03F7/20

    Abstract: Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool—enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.

    TOPOGRAPHIC PHASE CONTROL FOR OVERLAY MEASUREMENT
    15.
    发明专利
    TOPOGRAPHIC PHASE CONTROL FOR OVERLAY MEASUREMENT 未知

    公开(公告)号：SG10201912822UA

    公开(公告)日：2020-02-27

    申请号：SG10201912822U

    申请日：2016-05-19

    Applicant: KLA TENCOR CORP

    Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

    Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

    TOPOGRAPHIC PHASE CONTROL FOR OVERLAY MEASUREMENT
    16.
    发明专利
    TOPOGRAPHIC PHASE CONTROL FOR OVERLAY MEASUREMENT 未知

    公开(公告)号：SG10201912816UA

    公开(公告)日：2020-02-27

    申请号：SG10201912816U

    申请日：2016-05-19

    Applicant: KLA TENCOR CORP

    Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

    Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

    DISCRETE POLARIZATION SCATTEROMETRY
    18.
    发明申请
    DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
    离散极化分析

    公开(公告)号：WO2011159725A3

    公开(公告)日：2012-04-26

    申请号：PCT/US2011040389

    申请日：2011-06-14

    Applicant: KLA TENCOR CORP ,  HILL ANDREW V ,  MANASSEN AMNON ,  KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  WANG DAVID Y ,  ROTTER LAWRENCE D ,  DE VEER JOHANNES D

    Inventor： HILL ANDREW V ,  MANASSEN AMNON ,  KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  WANG DAVID Y ,  ROTTER LAWRENCE D ,  DE VEER JOHANNES D

    IPC: H01L21/027 ,  H01L21/66

    CPC classification number: G02B27/141 ,  G01N21/474 ,  G01N21/4788 ,  G01N2021/4792 ,  G02B27/145 ,  G03F7/70633

    Abstract: Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.

    Abstract translation: 提供了离散极化散射法的系统和方法。 一个实施例涉及一种散射仪的光学子系统。 光学子系统包括被配置为产生具有不同偏振的光的一个或多个光源。 光学子系统还包括偏振分束器，其被配置为将光分离成具有正交和相互排斥的极化的两个不同光束。 光学子系统还包括一个或多个第二光学元件，其被配置为在测量期间控制两个不同光束中的哪一个照射晶片。 光学子系统还包括被配置为分别检测由晶片的照明产生的两个不同散射光束的检测子系统。 两个不同的散射光束具有正交和相互排斥的偏振。 用于测量的光学子系统的所有光学表面在测量期间是静止的。

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