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公开(公告)号:SG11201907747XA
公开(公告)日:2019-10-30
申请号:SG11201907747X
申请日:2018-03-28
Applicant: KLA TENCOR CORP
Inventor: MANASSEN AMNON , NEGRI DARIA , HILL ANDREW V , BACHAR OHAD , LEVINSKI VLADIMIR , PASKOVER YURI
IPC: H01L21/66
Abstract: PUBLISHEDUNDER THE PATENT COOPERATION TREATY (PCT) IiiimmomiolollmonolomolmomEmmomoun () International Publication Number WO 2018/187108 Al WIPO I PCT (12) INTERNATIONAL APPLICATION (19) World Intellectual Property Organization International Bureau (43) International Publication Date 11 October 2018 (11.10.2018) (51) International Patent Classification: HO1L 21/66 (2006.01) (21) International Application Number: PCT/US2018/024702 (22) International Filing Date: 28 March 2018 (28.03.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/481,685 05 April 2017 (05.04.2017) US 15/608,766 30 May 2017 (30.05.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (72) Inventors: MANASSEN, Amnon; 10 Golda Meir Street, 34892 Haifa (IL). NEGRI, Dania; Ha'Alon Street 38/1, 36811 Nesher (IL). HILL, Andrew V.; 2112 Los Ange- les Avenue, Berkeley, California 94707 (US). BACHAR, Ohad; 29 He'elah Street, 36576 Timrat (IL). LEV- INSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). PASKOVER, Yuri; 32A Seora Str, 30560 Binyamina (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (54) Title: SYSTEMS AND METHODS FOR METROLOGY WITH LAYER-SPECIFIC ILLUMINATION SPECTRA 126 CONTROLLER 128 PROCESSORS 130 MEMORY 100 122 108 40111111111110- 104 —120 102 n 124 114 V 112 110 106 116 1-1 cc O N cc 00 O O FIG.1 (57) : A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumi- nation device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers. [Continued on next page] WO 2018/187108 Al MIDEDIMOMOIDEIREEMOMOHOMOIDIMMIOMMIS MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
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公开(公告)号:SG178432A1
公开(公告)日:2012-04-27
申请号:SG2012010575
申请日:2010-09-01
Applicant: KLA TENCOR CORP
Inventor: KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
Abstract: Various metrology systems and methods are provided.
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3.
公开(公告)号:WO2012018674A3
公开(公告)日:2012-05-18
申请号:PCT/US2011045784
申请日:2011-07-28
Applicant: KLA TENCOR CORP , MANASSEN AMMON , KANDEL DANIEL , BARUCH MOSHE , SELIGSON JOEL , SVIZHER ALEXANDER , COHEN GUY , ROTEM EFRAIM , BACHAR OHAD , NEGRI DARIA , SAPIENS NOAM
Inventor: MANASSEN AMMON , KANDEL DANIEL , BARUCH MOSHE , SELIGSON JOEL , SVIZHER ALEXANDER , COHEN GUY , ROTEM EFRAIM , BACHAR OHAD , NEGRI DARIA , SAPIENS NOAM
IPC: H01L21/027
CPC classification number: G03F7/70633 , G01N21/55 , G03F7/70616
Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
Abstract translation: 本发明包括照明源,至少一个照明对称化模块(ISM),被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器,被配置为将由ISM处理的光的第一部分沿着 一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器,其中检测器被配置为收集从表面反射的光的一部分 的一个或多个标本。
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公开(公告)号:WO2011028807A3
公开(公告)日:2011-06-16
申请号:PCT/US2010047539
申请日:2010-09-01
Applicant: KLA TENCOR CORP , KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
Inventor: KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
IPC: H01L21/66
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided.
Abstract translation: 提供了各种计量系统和方法。
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公开(公告)号:EP2474027A4
公开(公告)日:2013-03-20
申请号:EP10814430
申请日:2010-09-01
Applicant: KLA TENCOR CORP
Inventor: KANDEL DANIEL , LEVINSKI VLADIMIR , SVIZHER ALEXANDER , SELIGSON JOEL , HILL ANDREW , BACHAR OHAD , MANASSEN AMNON , CHUANG YUNG-HO ALEX , SELA ILAN , MARKOWITZ MOSHE , NEGRI DARIA , ROTEM EFRAIM
IPC: G01N21/956
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided.
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公开(公告)号:EP2745313A4
公开(公告)日:2014-12-24
申请号:EP12823553
申请日:2012-07-30
Applicant: KLA TENCOR CORP
Inventor: MANASSEN AMNON , KANDEL DANIEL , BARUCH MOSHE , LEVINSKI VLADIMIR , SAPIENS NOAM , SELIGSON JOEL L , HILL ANDY , BACHAR OHAD , NEGRI DARIA , ZAHARAN OFER
CPC classification number: G03F7/70633
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