Abstract:
The present invention discloses an inverted ion-sensitive field effect transistor (ISFET) (10) and method of producing thereof, wherein ISFET comprises a substrate layer ( 11) , a sensing membrane (12) on said substrate layer (11), a layer of field oxide (19) on said sensing membrane (12), doped source (13) and drain (14) regions on said layer of field oxide (19), and characterized in that-electrical contacts (16, 17) are provided to the respective source (13) and drain (14) regions on the opposing side of said sensing membrane (12) and said substrate layer (11) is windowed with an opening access ( 18) to said sensing membrane ( 12) to provide electrical isolation of the electrical contacts ( 16, 1 7) from said sensing membrane (12).
Abstract:
DESCRIBED HEREIN IS A METAL ELECTRODE (100) HAVING AT LEAST ONE HIGH ASPECT RATIO STRUCTURE. THE METAL ELECTRODE (100) COMPRISES A SILICON LAYER (101) HAVING THE HIGH ASPECT RATIO STRUCTURE, AN OXIDE LAYER (102) ON TOP OF THE SILICON LAYER (101), AN ADHESIVE LAYER (103) ON TOP OF THE OXIDE LAYER (102), AND A METAL LAYER (104) ON TOP OF THE ADHESIVE LAYER (103). THE THICKNESS OF THE METAL LAYER (104) IS AT LEAST 15 TIMES LESSER THAN THE HEIGHT OF THE HIGH ASPECT RATIO STRUCTURE. DUE TO THIS PARTICULAR FEATURE, THE METAL LAYER (104) IS DEPOSITED ON TOP OF THE ADHESIVE LAYER (103) IN A SELF-ALIGNED MANNER, TAKING THE SHAPE OF THE HIGH ASPECT RATIO STRUCTURE, AND DISCONNECTED AT THE WALL OF THE HIGH ASPECT RATIO STRUCTURE. FURTHER, THE METAL ELECTRODE (100) CAN BE MODIFIED ACCORDINGLY TO SUIT DIFFERENT APPLICATIONS. ALSO DESCRIBED HEREIN IS A METHOD FOR FABRICATING THE AFOREMENTIONED METAL ELECTRODE (100). BEST ILLUSTRATIVE
Abstract:
The present invention disclosed a thin-film resistance temperature detector (RTD) device with a single RTD structure, dual interconnecting RTD structures, and dual interconnecting RTD structures paired to a plurality of sensor electrodes (60). A method for fabricating the thin-film RTD device with the single RTD structure, dual interconnecting RTD structures, and dual interconnecting RTD structures paired to the plurality of sensor electrodes (60) are also disclosed herein. The RTD pattern (10) (20) is connected in series, while the dual RTD structures are connected via a concentric square pad (30) in a stacking and parallel manner. Further, the RTD pattern (10) (20) is arranged in a continuous array and provides a localised and user-selectable point resistance value via a plurality of contact pads (50A) (50B) and a secondary busbar connection line (40) which allows the RTD device to continue operating even when any of the RTD patterns or the RTD structures are broken.
Abstract:
A pressure-sensing device (10) and a process for fabricating it is disclosed. In a preferred embodiment, a sacrificial oxide layer (11) is first formed onto a silicon substrate (30). A bottom polymer film (14) is then formed on oxide layer (11). Conductive elements including electrodes (12a, 12b) and/or contact pads (18a, 18b) are formed on the bottom polymer film (14). A graphene sheet (20) is deposited to electrically connect the electrodes (12a, 12b). A top polymer film (16) is then laid on top so that the conductive elements (12, 18) and graphene (20) are sandwiched and encapsulated in between the top and bottom polymer layers (14, 16) chosen from polyimide or poly dimethylsiloxane (PDMS). Openings (19a, 19b) on top polymer layer (16) may optionally be provided to allow for interconnection of the contact pads (18a, 18b). The sacrificial oxide (11) is then etched to release the completed device (10) from the substrate (30) may be reused.
Abstract:
The present invention describes a novel method of fabricating nano-resistors (22) which allows full integration with standard CMOS fabrication process. The resistor comprises long and thin nano-structures as resistive element. It is formed by conductive nano-spacers (18B) using oxide (16) as mould on insulating layer. An embodiment of such structure is polysilicon nano-structures doped or implanted with n-type or p-type ions (20) to improve material conductance. The electrical properties of the device will change with respect to the dimension of these nano-structures. Resistors with polysilicon nano-structures down to 10 nm can be produced with resulting measured resistance in the MOhm scale.
Abstract:
The present invention relates generally to a planar micropump with integrated passive micromixers (10} which enhances the mixing of two or more differing fluids thereby allowing an efficient and effective mixing action to be achieved thereby resulting in a more homogeneous mixture for a reliable chemical analysis.
Abstract:
THE PRESENT INVENTION RELATES TO A SENSOR SYSTEM (10). THE SENSOR SYSTEM COMPRISES AT LEAST TWO CONTACT PADS (11), A READ OUT INTEGRATED CIRCUIT (12), AND A SENSOR DEVICE (13). THE READ OUT INTEGRATED CIRCUIT (12) IS STACKED ON TOP OF THE SENSOR DEVICE (13), AND IT (12) IS CONNECTED TO THE SENSOR DEVICE (13) THROUGH A PLURALITY OF VIAS (16). THE AT LEAST TWO CONTACT PADS (11) ARE CONNECTED TO THE READ OUT INTEGRATED CIRCUIT (12) AND THE SENSOR DEVICE (13) THROUGH A PLURALITY OF VIAS (16) AND METAL LINES (15).
Abstract:
AN MTEGRATED ION SENSITIVE FIELD EFFECT TRANSISTOR SENSOR 5 A CHEMICAL SENSOR HAVING AN ION SENSITIVE FIELD EFFECT TRANSISTOR (ISFET) COMPRISING A SUBSTRATE (10) SITUATED WITH A SOURCE (4) AND A DRAIN (3); AN ION SENSING GATE (5) DISPOSED BETWEEN THE SOURCE AND THE DRAIN; AN ION-SENSITIVE FILM (1) FORMED ON THE SURFACE OF THE SUBSTRATE AND THE ION SENSING GATE-, AN ELECTRODE DOMAIN (6) FORMED ON 10 THE ION-SENSITIVE FILM SURROUNDING THE PERIPHERY OF THE ION SENSING GATE (5) CHARACTERIZED IN THAT THE ELECTRODE DOMAIN (6) IS MADE OF TUNGSTEN, TITANIUM OR TUNGSTEN SILICIDE. (MOST ILLUSTRATED BY
Abstract:
An integrated packaged microchip (100) including at least one environmental sensor (104) and at least one Read-Out Integrated Chip (ROIC) (102) is provided, characterized in that, the integrated packaged microchip (100) further includes an etched opening (108) of the environmental sensor (104) exposed to a sensable environment, using at least one layer of glass wafer (101,106) and at least one layer of silicon wafer (107).
Abstract:
The present invention provides a microfluidic device (100) comprises an adapting unit; a microvalve (120) adapted to removably couple with the adapting unit, the microvalve (120) having a fluid path (124) and a heat sensitive plug (126), the heat sensitive plug (126) is disposed to block the fluid path (124), wherein the microvalve (120) is adapted to be normally-closed by default by the heat sensitive plug (126); and a heater (114) disposed on a position having a close proximity to the heat sensitive plug (126), wherein the heater (114) is operable to melt the heat sensitive plug (126). Once the heat sensitive plug (126) is molten to open the fluid path (124), the fluid path (124) is not re-closable and a replacement microvalve is required for a new use. A microvalve and a method of fabricating the same is also provided herewith.