中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

191 records (took 0.017 seconds)

    SYSTEM FOR MAGNETIC SHIELDING
    11.
    发明申请
    SYSTEM FOR MAGNETIC SHIELDING 审中-公开
    磁屏蔽系统

    公开(公告)号：WO2012110465A2

    公开(公告)日：2012-08-23

    申请号：PCT/EP2012/052431

    申请日：2012-02-13

    Applicant: MAPPER LITHOGRAPHY IP B.V. ,  ROSENTHAL, Alon

    Inventor： ROSENTHAL, Alon

    IPC: G03F7/20

    CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

    Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

    Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

    Vacuum deposition apparatus
    14.
    发明公开
    Vacuum deposition apparatus 有权
    真空沉积设备

    公开(公告)号：EP2548992A1

    公开(公告)日：2013-01-23

    申请号：EP12004988.7

    申请日：2012-07-05

    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)

    Inventor： Yamamoto, Kenji ,  Hirota, Satoshi

    IPC: C23C14/32 ,  C23C14/35 ,  C23C14/50 ,  C23C14/34 ,  H01J37/00

    CPC classification number: C23C14/3492 ,  C23C14/325 ,  C23C14/352 ,  C23C14/505 ,  H01J37/32055 ,  H01J37/3402 ,  H01J37/3447 ,  H01J2237/0264

    Abstract: Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber, a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon closing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.

    Abstract translation: 公开了一种真空沉积设备，其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。 真空沉积设备包括沉积室; 设置在沉积室内的溅射蒸发源的磁场施加机构，设置在同一沉积室内的电弧蒸发源的磁场施加机构， 以及磁场屏蔽单元，该磁场屏蔽单元布置成部分或全部地覆盖这些用于蒸发源的磁场施加机构（优选为溅射蒸发源的磁场施加机构）中的至少一个。 可打开单元的磁场屏蔽单元的部分（在闭合时面对目标材料的部分）优选由非磁性材料制成。

    NANO-PATTERNED SYSTEM AND MAGNETIC-FIELD APPLYING DEVICE THEREOF
    16.
    发明公开
    NANO-PATTERNED SYSTEM AND MAGNETIC-FIELD APPLYING DEVICE THEREOF 有权
    纳米结构和设备以便在其是应用磁FIELDS

    公开(公告)号：EP2835688A1

    公开(公告)日：2015-02-11

    申请号：EP12873678.2

    申请日：2012-07-17

    Applicant: Institute Of Physics Chinese Academy Of Sciences

    Inventor： YU, Guoqiang ,  GUO, Peng ,  HAN, Xiufeng ,  GUO, Chaohui ,  SUN, Xiaoyu ,  ZHOU, Xiangqian

    IPC: G03F7/20 ,  G01R31/00

    CPC classification number: H01J37/09 ,  G01R33/093 ,  G01R33/096 ,  H01F7/202 ,  H01F7/204 ,  H01F41/00 ,  H01J37/141 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/28 ,  H01J2237/31754 ,  H01L43/12

    Abstract: Disclosed are a nano-patterned system and a magnetic-field applying device thereof. The nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device. The magnetic-field applying device comprises a power supply, a magnetic-feld generation device and a pair of magnetic poles. The magnetic-field generation device comprises a coil and a magnetic conductive soft iron core. The power supply is connected to the coil, and the coil is wound on the magnetic conductive soft iron core to generate a magnetic field. The magnetic conductive soft iron core is of a semi-closed frame structure, and the magnetic poles are respectively arranged at the two ends of the semi-closed frame structure. The sample stage is arranged inside a vacuum chamber of the nano-patterned system. The magnetic poles are oppositely arranged inside the vacuum chamber relative to the sample stage. The coil and the magnetic conductive soft iron core are arranged outside the vacuum chamber. The magnetic conductive soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles are used for locating a sample on the sample stage and applying a local magnetic field.

    CHARGED PARTICLE LITHOGRAPHY SYSTEM AND BEAM GENERATOR
    18.
    发明申请
    CHARGED PARTICLE LITHOGRAPHY SYSTEM AND BEAM GENERATOR 审中-公开
    充电颗粒光刻系统和光束发生器

    公开(公告)号：WO2013171214A1

    公开(公告)日：2013-11-21

    申请号：PCT/EP2013/059945

    申请日：2013-05-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： VAN VEEN, Alexander Hendrik Vincent

    IPC: H01J37/09 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

    Abstract: The present invention relates to a charged particle lithography system. The system has a beamlet generator including a beam generator for generating a charged particle beam and an aperture array (6) for forming a plurality of beamlets from the charged particle beam, and a beamlet projector for projecting the beamlets onto a target surface. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam, a collimator system (5a, 5b, 5c), one or more pumps (220), a high voltage shielding arrangement (201) for shielding components outside the high voltage shielding arrangement from high voltages within the high voltage shielding arrangement, and a cooling arrangement (203, 204) for removing heat. The one or more pumps are located between the high voltage shielding arrangement and the cooling arrangement.

    Abstract translation: 本发明涉及带电粒子光刻系统。 该系统具有一个子束发生器，其包括用于产生带电粒子束的束发生器和用于从带电粒子束形成多个子束的孔径阵列（6），以及用于将子束投影到目标表面上的小射线投影仪。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3），准直器系统（5a，5b，5c），一个或多个泵（220），用于屏蔽的高压屏蔽装置（201） 在高压屏蔽装置外部的高电压屏蔽装置之外的部件与高电压屏蔽装置内的高电压，以及用于去除热量的冷却装置（203,204）。 一个或多个泵位于高压屏蔽装置和冷却装置之间。

    SYSTEM FOR MAGNETIC SHIELDING
    19.
    发明申请
    SYSTEM FOR MAGNETIC SHIELDING 审中-公开
    磁屏蔽系统

    公开(公告)号：WO2012110465A4

    公开(公告)日：2012-12-27

    申请号：PCT/EP2012052431

    申请日：2012-02-13

    Applicant: MAPPER LITHOGRAPHY IP BV ,  ROSENTHAL ALON

    Inventor： ROSENTHAL ALON

    IPC: G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/67

    CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

    Abstract: The invention relates to a system (100) for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber (102) and a set of two coils (120a; 120b). The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

    Abstract translation: 本发明涉及用于对带电粒子光刻设备进行磁屏蔽的系统（100）。 该系统包括第一室，第二室（102）和一组两个盘管（120a; 120b）。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

    SCANNING BEAM INSTRUMENTS
    20.
    发明申请
    SCANNING BEAM INSTRUMENTS 审中-公开
    扫描光束仪器

    公开(公告)号：WO0106536A3

    公开(公告)日：2002-01-31

    申请号：PCT/GB0002676

    申请日：2000-07-12

    Applicant: LEO ELECTRON MICROSCOPY LTD ,  SHAH JITENDRA SHANTILAL

    Inventor： SHAH JITENDRA SHANTILAL

    IPC: H01J37/244

    CPC classification number: H01J37/244 ,  H01J2237/0264

    Abstract: A scanning beam instrument, such as a scanning electron microscope has a beam column (2) which generates a beam of charged particles which are focussed on a specimen (6) in a specimen chamber (4). Charged particles from the specimen (6) and the vicinity of the specimen are detected by a suitable detector. In one aspect, an arrangement is disclosed in which a magnetic field is generated (70, 72) in the vicinity of the specimen and magnetic shielding is provided in the specimen chamber (4) for containing the field. The magnetic field may be substantially parallel to the surface of the specimen (6) and may also be substantially perpendicular to the axis of the beam (8). In another aspect an electric field is generated (54, 56) substantially parallel to the surface of the specimen (6), and preferably substantially perpendicular to the axis of the beam (8), this electric field is crossed with the magnetic field, and the detector has an electrode (54) substantially perpendicular to the surface of the specimen. In another aspect, the electric and magnetic fields are such as to direct charged particles from the specimen and the vicinity of the specimen to the perpendicular detector electrode (54).

    Abstract translation: 诸如扫描电子显微镜的扫描光束仪器具有光束柱（2），其产生聚焦在样本室（4）中的样本（6）上的带电粒子束。 通过合适的检测器检测样品（6）和样品附近的带电粒子。 在一个方面，公开了一种在样本附近产生磁场（70,72）的装置，并且在用于容纳场的样本室（4）中设置磁屏蔽。 磁场可以基本上平行于试样（6）的表面，并且也可以基本上垂直于梁（8）的轴线。 在另一方面，产生基本上平行于样品（6）表面的电场（54,56），优选基本上垂直于光束（8）的轴线，该电场与磁场交叉，并且 检测器具有基本上垂直于样品表面的电极（54）。 另一方面，电场和磁场使得带电粒子从试样和样品附近引向垂直检测器电极（54）。

Patent Agency Ranking