MULTI GAP INDUCTOR CORE, MULTI GAP INDUCTOR, TRANSFORMER AND CORRESPONDING MANUFACTURING METHOD AND WINDING
    11.
    发明申请
    MULTI GAP INDUCTOR CORE, MULTI GAP INDUCTOR, TRANSFORMER AND CORRESPONDING MANUFACTURING METHOD AND WINDING 审中-公开
    多孔隙电感核,多孔电感,变压器及相应的制造方法及绕组

    公开(公告)号:US20120299680A1

    公开(公告)日:2012-11-29

    申请号:US13116699

    申请日:2011-05-26

    Applicant: Franc Zajc

    Inventor: Franc Zajc

    Abstract: The invention provides a multi gap inductor core, a multi gap inductor, transformer, and a corresponding manufacturing method and winding. The multi gap inductor core (1; 1′; 1″; 1′″), comprises a first plurality of magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″) made of magnetic core material arranged in a stack and a second plurality of fixing layers (3a-3f; 3a′-3l′; 3a″-3l″) made of a fixing material. Each fixing layer (3a-3f; 3a′-3l′; 3a″-3l″) is arranged between a corresponding pair of adjacent magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″) and includes mechanical spacer means (4; 4′) which define a gap (G) having a predetermined thickness (d2) between a corresponding pair of adjacent magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″).

    Abstract translation: 本发明提供了多间隙电感器芯,多间隙电感器,变压器及相应的制造方法和绕组。 多间隙电感器芯(1; 1“; 1”; 1“”)包括由磁芯材料制成的第一多个磁性层压片(2a-2g; 2a'-2m'; 2a“-2n”) 在由固定材料制成的堆叠和第二多个固定层(3a-3f; 3a'-31'; 3a“-31”)中。 每个固定层(3a-3f; 3a'-31'; 3a“-31”)布置在相应的一对相邻的磁性层压片(2a-2g; 2a'-2m'; 2a“-2n”)之间,并且包括 在相应的一对相邻的磁性层叠片(2a-2g; 2a'-2m'; 2a“-2n”)之间限定具有预定厚度(d2)的间隙(G)的机械间隔装置(4; 4')。

    Electron Gun, Method of Controlling Same, and Electron Beam Additive Manufacturing Machine
    13.
    发明申请
    Electron Gun, Method of Controlling Same, and Electron Beam Additive Manufacturing Machine 有权
    电子枪,控制方法和电子束添加剂制造机

    公开(公告)号:US20150270088A1

    公开(公告)日:2015-09-24

    申请号:US14621526

    申请日:2015-02-13

    Applicant: JEOL Ltd.

    Inventor: Takashi Satoh

    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    Abstract translation: 如果不能使用限流孔,则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪(10)具有阴极(11),Wehnelt电极(12),控制电极(13),阳极(14)和控制器(22)。 Wehnelt电极(12)具有插入阴极顶端的第一开口(12c),并聚焦从阴极(11)的尖端发射的热电子。 从阴极(11)的顶端发射的热电子被控制电极(13)通入第二开口(13c)。 阳极(14)加速从阴极(11)发射的热电子,使得穿过第二开口(13c)的热电子通过第三开口(14b)并作为电子束(B1)撞击在粉末样品上 (8)。 控制器(22)基于偏置电压和控制电压的组合条件设置偏置电压和控制电压,以保持光束的亮度恒定。

    Ion gating grid
    14.
    发明授权
    Ion gating grid 失效
    离子门控网格

    公开(公告)号:US4150319A

    公开(公告)日:1979-04-17

    申请号:US835616

    申请日:1977-09-22

    CPC classification number: H01J49/061 G21K1/04 H01J1/88 H01J3/08 G01N27/622

    Abstract: A grid gates a stream of ions when a D.C. potential is applied between two sets of interdigitated wires included in the grid to produce a D.C. field. The improved grid disclosed herein contains the two sets of interdigitated wires in a single plane so that the D.C. field is precisely normal to the ion current flow direction to prevent a residual ion current flow when the grid provides the gating effect.

    Abstract translation: 当在电网中包括的两组交叉电线之间施加直流电位以产生直流电场时,栅极栅极离子流。 本文公开的改进的电网在单个平面中包含两组交叉导线,使得直流电场精确地垂直于离子电流流动方向,以防止当栅极提供门控效应时残留的离子电流流动。

    Electron gun, method of controlling same, and electron beam additive manufacturing machine
    15.
    发明公开
    Electron gun, method of controlling same, and electron beam additive manufacturing machine 有权
    电子枪和蛋鸡生产方式来控制方法的机器意味着电子

    公开(公告)号:EP2911181A1

    公开(公告)日:2015-08-26

    申请号:EP15154861.7

    申请日:2015-02-12

    Applicant: JEOL Ltd.

    Inventor: Satoh, Takashi

    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening pass through a third opening and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    Abstract translation: 有盘在游离缺失电子枪控制的方法,无需在电子束的亮度曹景伟跌幅如果限流孔,不能使用。 电子枪(10)具有一个阴极(11),文纳尔控制电极(12),一个控制电极(13)到阳极(14),以及控制器(22)。 文纳尔控制电极(12)具有在其中阴极的前端插入的第一开口,并聚焦从阴极(11)的尖端发射热电子。 从阴极(11)的尖端发射的热电子被导致传递到由所述控制电极(13)的第二开口。 阳极(14)加速从阴极(11)所发射的热电子审查并通过第二开口通过热电子穿过第三开口和撞击,以电子上的粉末状样品光束(B1)(8)。 该控制器(22),设定偏置电压,并根据上述偏置电压和控制电压,以保持光束恒定的亮度的组合条件的控制电压。

    DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS
    17.
    发明公开
    DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS 审中-公开
    双透镜电子枪法高分辨率成像和高标度的束流

    公开(公告)号:EP2896062A4

    公开(公告)日:2016-06-08

    申请号:EP13837241

    申请日:2013-09-13

    Abstract: One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.

    Charged particle beam irradiation device
    20.
    发明专利
    Charged particle beam irradiation device 有权
    充电颗粒光束辐射装置

    公开(公告)号:JP2014020800A

    公开(公告)日:2014-02-03

    申请号:JP2012156669

    申请日:2012-07-12

    Inventor: ASABA TORU

    Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation device capable of accurately performing the irradiation of a charged particle beam.SOLUTION: In a charged particle beam irradiation device 1, a degrader 30 is positioned to be on the upstream side of a charged particle beam R toward outer sides in a scan direction. Thus, the whole shape of the degrader 30 in the scan direction is curved with respect to scan electromagnets 3a, 3b being the start points of deflection of a charged particle beam R. Consequently, it is suppressed that the passage distance of a charged particle beam R with a large deflection angle θ in the degrader 30 is increased. Therefore, the irradiation of a charged particle beam is accurately performed.

    Abstract translation: 要解决的问题:提供一种能够精确地执行带电粒子束的照射的带电粒子束照射装置。解决方案:在带电粒子束照射装置1中,降解器30位于带电粒子束的上游侧 粒子束R朝向扫描方向的外侧。 因此,降解器30的扫描方向的整体形状相对于作为带电粒子束R的偏转的起点的扫描电磁体3a,3b弯曲。因此,抑制了带电粒子束的通过距离 R偏转角大; 在降解器30中增加。 因此,精确地进行带电粒子束的照射。

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