Abstract:
The invention provides a multi gap inductor core, a multi gap inductor, transformer, and a corresponding manufacturing method and winding. The multi gap inductor core (1; 1′; 1″; 1′″), comprises a first plurality of magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″) made of magnetic core material arranged in a stack and a second plurality of fixing layers (3a-3f; 3a′-3l′; 3a″-3l″) made of a fixing material. Each fixing layer (3a-3f; 3a′-3l′; 3a″-3l″) is arranged between a corresponding pair of adjacent magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″) and includes mechanical spacer means (4; 4′) which define a gap (G) having a predetermined thickness (d2) between a corresponding pair of adjacent magnetic lamination sheets (2a-2g; 2a′-2m′; 2a″-2n″).
Abstract:
When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.
Abstract:
There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.
Abstract:
A grid gates a stream of ions when a D.C. potential is applied between two sets of interdigitated wires included in the grid to produce a D.C. field. The improved grid disclosed herein contains the two sets of interdigitated wires in a single plane so that the D.C. field is precisely normal to the ion current flow direction to prevent a residual ion current flow when the grid provides the gating effect.
Abstract:
There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening pass through a third opening and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.
Abstract:
One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
Abstract:
An electron emission device (102) with improved electron emission efficiency and an electron emission type backlight unit with a new structure using the electron emission device in which an electric field between an anode electrode (80) and a cathode electrode (120) is effectively blocked, and electrons are emitted continuously and stably by a low gate voltage, thereby improving light-emitting uniformity and efficiency. Also provided is a flat display apparatus employing the electron emission type backlight unit (100) having the electron emission device. The electron emission device includes a base substrate (110); a cathode electrode formed on the base substrate having a cross-section whose height is greater than its width; a gate electrode (140) that is formed on the base substrate and alternately separated from the cathode electrode and has a cross-section whose height is greater than its width; and an electron emission layer (150) disposed on a surface of the cathode electrode toward the gate electrode.
Abstract:
PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation device capable of accurately performing the irradiation of a charged particle beam.SOLUTION: In a charged particle beam irradiation device 1, a degrader 30 is positioned to be on the upstream side of a charged particle beam R toward outer sides in a scan direction. Thus, the whole shape of the degrader 30 in the scan direction is curved with respect to scan electromagnets 3a, 3b being the start points of deflection of a charged particle beam R. Consequently, it is suppressed that the passage distance of a charged particle beam R with a large deflection angle θ in the degrader 30 is increased. Therefore, the irradiation of a charged particle beam is accurately performed.