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公开(公告)号：KR1020010017673A
公开(公告)日：2001-03-05
申请号：KR1019990033328
申请日：1999-08-13
Applicant: 삼성전자주식회사
IPC: H01L21/306
Abstract: PURPOSE: An apparatus for displaying a lamp state is provided to take a rapid action against a lamp when the lamp malfunctions, by detecting a quantity of current flowing through the lamp, and by displaying an on/off state of the lamp in a display unit, so that the on/off state of the lamp can easily be recognized from the exterior of the apparatus. CONSTITUTION: A current detecting unit(2) detects current flowing through a lamp(1). A driving unit(3) is operated according to a voltage outputted from the current detecting unit. A switching unit(4) is operated according to an output voltage of the driving unit. A display unit(5) emits light according to an operation of the switching unit. The switching unit may be a transistor.
Abstract translation: 目的：提供一种用于显示灯状态的装置，用于当灯发生故障时通过检测流过灯的电流量以及通过在显示单元中显示灯的开/关状态来快速地对灯进行动作 ，使得可以从设备的外部容易地识别灯的开/关状态。 构成：电流检测单元（2）检测流过灯（1）的电流。 驱动单元（3）根据从电流检测单元输出的电压进行动作。 开关单元（4）根据驱动单元的输出电压进行动作。 显示单元（5）根据切换单元的操作发光。 开关单元可以是晶体管。
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公开(公告)号：KR1019990053187A
公开(公告)日：1999-07-15
申请号：KR1019970072778
申请日：1997-12-23
Applicant: 삼성전자주식회사
Inventor： 김경대
IPC: F16K15/03
Abstract: 역류 방지가 가능한 게이트 밸브는 유체가 소정 방향으로 흐르도록 유로가 형성된 케이싱과 케이싱의 일면에서 유로와 수직되도록 형성되는 관통홀이 밀폐되도록 결합되는 커버와 케이싱의 내부에 설치되고, 케이싱 내부에서 유체가 흐르도록 하거나 흐르지 못하도록 하는 게이트와 게이트를 통과한 유체가 흐르는 케이싱의 내부에 설치되고, 게이트를 통과한 유체는 흐르도록 하고, 반대되는 방향으로 흐르는 유체는 흐르지 못하도록 하는 첵크와 일단이 게이트와 결합되고, 커버에 상하 운동이 가능하도록 결합되며, 케이싱의 외부로 소정 길이 돌출되는 밸브 로드 및 케이싱의 외부 면으로부터 소정 거리에서 밸브 로드의 일단에 결합되어 밸브 로드를 회전시킬 수 있는 핸들을 포함한다.
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公开(公告)号：KR1020030068324A
公开(公告)日：2003-08-21
申请号：KR1020020008218
申请日：2002-02-15
Applicant: 삼성전자주식회사
IPC: H01L21/3065
Abstract: PURPOSE: A method for manufacturing a semiconductor device is provided to be capable of restraining long cone shaped particles from being generated at the peripheral portion of a wafer by using an etching apparatus having a predetermined clamp while forming an OSC structure capacitor on the wafer. CONSTITUTION: A wafer(W) is loaded in a chamber(10) for carrying out an etching process. At this time, a lower metal line and a poly layer are formed at the upper portion of the wafer. Plasma is generated in the chamber by flowing etching gas. Then, the poly layer is entirely etched by using the plasma. At this time, a clamp(25) is used for preventing the poly layer formed at the peripheral portion of the wafer from being etched. Preferably, the peripheral portion of the wafer is covered with the clamp as much as 0.7-1.3 mm. Preferably, the clamp is spaced apart from the peripheral portion of the wafer as much as 0.5-1 mm.
Abstract translation: 目的：提供一种制造半导体器件的方法，其能够通过使用具有预定夹具的蚀刻装置在晶片上形成OSC结构电容器来限制在晶片的周边部分处产生长锥形颗粒。 构成：将晶片（W）装载在用于进行蚀刻工艺的室（10）中。 此时，在晶片的上部形成下金属线和多晶硅层。 通过流动蚀刻气体在腔室中产生等离子体。 然后，通过使用等离子体完全蚀刻多层。 此时，使用夹具（25）来防止在晶片的周边部分形成的多晶硅层被蚀刻。 优选地，晶片的周边部分被夹具覆盖多达0.7-1.3mm。 优选地，夹具与晶片的周边部分间隔开多达0.5-1mm。
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公开(公告)号：KR1020010105759A
公开(公告)日：2001-11-29
申请号：KR1020000026646
申请日：2000-05-18
Applicant: 삼성전자주식회사
IPC: H01L21/302
CPC classification number: B24B37/32
Abstract: The present invention concerns a data transfer process in a two-way communication via low voltage networks connected to a telecommunication network. The data transmission on the low voltage network is carried out in a high frequency range up to 30 mHz, with a strip display of data signals and a transmission level below the radio-and-line-interfering voltage-limit, while signals displayed by pseudo-random numbers are provided to ensure a multi-user structure with various sequences within a family in order to give a logical direction on the low voltage network with a directional codification, whereby the binary data sequences in the low voltage network which are displayed in relation to the users and those which are characterized in relation to the direction, are recognized in a correlator at intervals determined by the damping rate by means of the sequences which are prescribed, regenerated and evaluated with a new directional characteristic for rerouting signals.
Abstract translation: 本发明涉及通过连接到电信网络的低压网络进行双向通信中的数据传送过程。 低压网络上的数据传输在高达30 mHz的高频范围内进行，数据信号的条形显示和低于无线电和线路干扰电压限制的传输电平，而伪伪显示的信号 提供了随机数，以确保具有家族内各种序列的多用户结构，以便通过定向编码在低电压网络上给出逻辑方向，从而在低电压网络中显示关系的二进制数据序列 以相对于该方向为特征的用户，以相关器的形式，通过利用规定的序列确定的间隔，以规定的再生和评估的新的方向特性为重新路由信号，在相关器中识别。
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公开(公告)号：KR100456527B1
公开(公告)日：2004-11-09
申请号：KR1020010078159
申请日：2001-12-11
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/67034
Abstract: A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.
Abstract translation: 提供了用于干燥半导体衬底的干燥系统。 所述干燥系统包括：用于容纳蒸气分配器和流体浴的腔室，所述流体浴布置在所述腔室的下部中，并且所述分配器布置在所述腔室的上部中以分配用于干燥所述基底的蒸气; 以及流体流动系统，用于将流体流供应到所述流体浴中以用于清洁和干燥所述基体并用于从所述流体浴排出所述流体，其中所述室包括布置在所述上部用于排出所述蒸气的多个排气口。
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Patent Agency Ranking
公开(公告)号：KR100434491B1
公开(公告)日：2004-06-05
申请号：KR1020010049601
申请日：2001-08-17
Applicant: 삼성전자주식회사
IPC: G03F7/32
CPC classification number: C11D1/526 , C11D11/0047 , G03F7/425
Abstract: Resist-removing composition comprises an N-hydroxyalkyl alkoxyalkanamide (I) and a swelling agent. An independent claim is also included for a process for removing a resist layer from a substrate, comprising contacting the substrate with a composition as above.
Abstract translation: 抗蚀剂去除组合物包含N-羟烷基烷氧基链烷酰胺（I）和溶胀剂。 还包括独立权利要求用于从基材去除抗蚀剂层的方法，包括使基材与如上所述的组合物接触。
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公开(公告)号：KR1020030050098A
公开(公告)日：2003-06-25
申请号：KR1020010080490
申请日：2001-12-18
Applicant: 삼성전자주식회사
IPC: H05H1/00
Abstract: PURPOSE: A plasma measurement apparatus provided with an optical emission spectrometer is provided to detect the concentration of the plasma for each positions of the plasma chamber. CONSTITUTION: A plasma measurement apparatus provided with an optical emission spectrometer includes an optical transmission block(18) for converging the plasma light in the chamber and for transmitting the converged plasma light, a photoelectrical convert system(23) for converting the plasma light transmitted through the optical transmission block(18) into an electrical signal and a processor(26) for analyzing the electrical signal converted at the photoelectrical convert system(23). The optical transmission block(18) is provided with a lens unit having a predetermined focal length, a collimator for making the light parallel after passing therethrough and an optical fiber for transmitting the collimated light passing through the collimator to the photoelectrical convert system(23).
Abstract translation: 目的：提供具有光发射光谱仪的等离子体测量装置，以检测等离子体室的每个位置的等离子体的浓度。 构成：具有光发射光谱仪的等离子体测量装置包括：光传输块（18），用于会聚等离子体光在腔室中并用于透射会聚的等离子体光;光电转换系统（23），用于转换透射的等离子体光 所述光传输块（18）变为电信号，以及用于分析在所述光电转换系统（23）处转换的电信号的处理器（26）。 光传输块（18）设置有具有预定焦距的透镜单元，用于使光通过后的光平行的准直仪和用于将通过准直仪的准直光传输到光电转换系统（23）的光纤， 。
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公开(公告)号：KR1020030047511A
公开(公告)日：2003-06-18
申请号：KR1020010078159
申请日：2001-12-11
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/67034
Abstract: PURPOSE: A drying equipment and method are provided to be capable of maximizing Marangoni effect by controlling the flow and exhaust of liquid using a gas distributor and a liquid flow system. CONSTITUTION: A chamber is provided with a hood(11) and a cover(13). A gas distributor(15) is installed in the upper portion of the chamber for drying semiconductor substrate(9) using gas. A liquid storing bath(3a) is installed in the lower portion of the chamber for cleaning the semiconductor substrates. A liquid flow system is connected with the liquid storing bath for flowing liquid into the liquid storing bath and exhausting the liquid from the liquid storing bath. The chamber further includes a plurality of exhaust ports(11a) located opposite to each other. Preferably, Marangoni drying principle is achieved by controlling the flow and exhaust of the liquid using the gas distributor and the liquid flow system. Preferably, the liquid flow system includes a flexible pipe(19).
Abstract translation: 目的：提供一种干燥设备和方法，以通过使用气体分配器和液体流动系统控制液体的流动和排出来最大化马兰戈尼尼效应。 构成：室具有罩（11）和罩（13）。 气体分配器（15）安装在用于使用气体干燥半导体衬底（9）的室的上部。 液体储存槽（3a）安装在用于清洁半导体衬底的室的下部。 液体流动系统与储液槽连接，用于将液体流入液体储存槽并从储液槽中排出液体。 所述室还包括彼此相对定位的多个排气口（11a）。 优选地，Marangoni干燥原理通过使用气体分配器和液体流动系统控制液体的流动和排出来实现。 优选地，液体流动系统包括柔性管（19）。
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公开(公告)号：KR100355224B1
公开(公告)日：2002-10-11
申请号：KR1019990023490
申请日：1999-06-22
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: B24B37/32
Abstract: 연마헤드내부에유입된슬러리찌꺼기등 오염물질을효과적으로배출할수 있도록된 연마헤드의리테이너링과이를구비한화학기계적연마장치가개시된다. 개시된리테이너링은연마헤드의내부공간에유입된오염물질을배출하기위해링 몸체의내주면과외주면사이를관통하는다수의오염물질배출구를구비한다. 오염물질배출구는링 몸체의외주를따라실질적으로동일한간격으로적어도 6개가마련되고, 그내측개구와외측개구는횡방향이보다긴 장공형상으로되어있으며, 그각각은복수의내측구멍과복수의내측구멍을포괄하는하나의외측구멍으로이루어진다. 그리고, 개시된화학기계적연마장치는상술한리테이너링 이외에도오염물질배출구를통해연마헤드내부로순수를분사하는제3 노즐을구비한세척수단을포함한다. 오염물질배출구는제3 노즐로부터분사되는순수가연마헤드내부로보다쉽게유입될수 있도록외측으로갈수록그 단면의횡방향폭이커지도록되어있다.
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公开(公告)号：KR100335569B1
公开(公告)日：2002-05-08
申请号：KR1020000026646
申请日：2000-05-18
Applicant: 삼성전자주식회사
IPC: H01L21/302
Abstract: 저면을 경사지게 절삭 가공하여 연마패드와 밀착력을 향상시킨 리테이너 링을 구비하는 화학적 기계적 연마장치의 연마헤드가 개시되어 있다. 화학적 기계적 연마장치의 연마헤드에서, 상기 리테이너 링의 저면을 그 외주연에서 내주연 쪽으로 소정의 각도로 경사지도록 절삭 가공한다. 따라서, 상기 리테이너 링과 캐리어 사이에서 기밀 기능을 하는 고정판의 탄성력에 의해 상기 리테이너 링의 내주연 부분이 하방으로 밀리더라고 상기 리테이너 링이 상기 연마패드에 균일하게 밀착하게 된다.
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