Abstract:
본 발명의 일 실시예는 복수 개의 발광 다이오드 셀 및 상기 복수 개의 발광 다이오드 셀 중 서로 인접한 발광 다이오드 셀을 전기적으로 연결하는 도전성 브릿지를 포함하고, 상기 복수 개의 발광 다이오드 셀의 각각은, 제1 질화물계 반도체층, 상기 제1 질화물계 반도체층의 상부에 배치되는 제2 질화물계 반도체층 및 상기 제1 질화물계 반도체층과 제2 질화물계 반도체층 사이에 배치되는 활성층을 구비하는 구조물, 상기 구조물의 하부로부터 연장되어 상기 제2 질화물계 반도체층과 접촉하고, 상기 제1 질화물계 반도체층 및 활성층과 절연되는 제2 도전성 콘택부 및 상기 제1 질화물계 반도체층과 접하고, 상기 제2 도전성 콘택부와 이격되도록 형성된 제1 도전성 콘택부를 포함하는 발광 다이오드 장치를 개시한다.
Abstract:
The present invention relates to a light emitting device and a manufacturing method thereof. The light emitting device comprises: a PCB substrate on which an electrode connection part is formed; an LED chip of which an electrode formation surface is arranged toward the PCB substrate; and a fluorescent body layer formed on a substrate of the LED chip. According to the present invention, a space, needed for mounting the LED chip on the PCB substrate on which the electrode connection part is formed, is small. Therefore, a package can: have a large capacity; be miniaturized; and reduce the power consumption.
Abstract:
The present invention is to disclose a light emitting diode and a method of manufacturing the same, which comprise: a reflection electrode layer; a lamination formed on the reflection electrode layer and having an n-type III-nitride group semiconductor layer, a p-type III-nitride group semiconductor layer, and an activating layer formed between the n-type III-nitride group semiconductor layer and the p-type III-nitride group semiconductor layer; a translucent conductive substrate formed on the lamination and having zinc oxide (ZnO); and a pad portion formed on the opposite side of the surface facing the lamination among the transparent conductive substrate, wherein the angle of adjacent sides among a plurality of sides of the lamination is less than 90 degrees or more than 90 degrees.
Abstract:
PURPOSE: A light emitting diode is provided to prevent the generation of the leakage current of a semiconductor device by combining the metal of a p-type electrode layer with the metal of an n-type electrode layer. CONSTITUTION: An etch stop layer (30) is formed in the outer surface of a semiconductor layer. A first metal layer (40) is formed in the front upper part of a reflection layer and a part of the etch stop layer. A second metal layer (90) is contacted with the first metal layer. An insulating protection layer (50) covers the front upper surface of the first metal layer and the inner surface of a via hole. An electrode (60) is formed in the front upper surface the insulating protection layer.
Abstract:
PURPOSE: A light emitting diode and a manufacturing method thereof are provided to improve performance by using a ceramic substrate including at least one substrate via hole. CONSTITUTION: At least one inner via hole is formed at in an n-type semiconductor layer(110) and an active layer. The via hole is formed in a p-type semiconductor layer(130) and a reflection layer(140). An electrode is formed in the via hole. A first electrode pad is connected to the electrode. A ceramic substrate electrically connects at least one substrate via hole. A second electrode pad is formed in the front surface or a part of the ceramic substrate.
Abstract:
PURPOSE: A light emitting diode and a manufacturing method thereof are provided to reduce internal reflection of light by including an anti-reflective structure having a cycle smaller than a multi-layer and a light emitting wavelength. CONSTITUTION: A barrier layer is formed on the upper end of a bottom contact layer. An active layer(120) has single and multiple quantum well structures. A top contact layer(130) is formed on the upper end of the active layer. A multi-layer(133) has a thickness smaller than a light emitting wavelength at an external part of the top contact layer and the bottom contact layer. The size of an anti-reflective structure is smaller than the light emitting wavelength of a light emitting diode.
Abstract:
PURPOSE: A method for manufacturing an active layer of a light emitting diode and the light emitting diode having a broad emission spectrum are provided to a wide wavelength region of an emission spectrum by including the active layer of a single or multiple quantum well which includes a quantum well layer formed into a dot shape. CONSTITUTION: A quantum barrier layer is formed on an upper portion of n n-type clad layer. A quantum well layer of a dot type is formed on the upper portion of the quantum barrier layers. The quantum barrier layer is formed on the upper portion of the quantum well layer. The quantum well layer is formed with a GaxIn1-xP(0