볼로메타용 산화물 박막 및 이를 이용한 적외선 감지소자
    21.
    发明授权
    볼로메타용 산화물 박막 및 이를 이용한 적외선 감지소자 有权
    氧化薄膜用于测辐射热计和红外探测器使用氧化物薄膜

    公开(公告)号:KR100596196B1

    公开(公告)日:2006-07-03

    申请号:KR1020040005559

    申请日:2004-01-29

    CPC classification number: G01J5/046 G01J5/20 H01C7/006 H01C7/047 H01C17/12

    Abstract: 본 발명은 고감도 특성을 갖는 볼로메타형 비냉각 적외선 감지소자를 위한 볼로메타용 산화물 박막에 관한 것이다.
    현재 비냉각 적외선 감지소자의 적외선 감지물질로 사용되는 바나듐 산화물는 TCR값이 -2.0%/℃ 내외이며, 물질 특성상 무수히 많은 중간상의 존재로 인하여 정확한 상 조절과 재현성 달성이 어렵다. 이로 인하여 고가의 이온빔 장치 등이 달린 박막 증착장비를 이용하여 제조되며, 공정온도도 400℃ 이상으로 높은 편이다.
    본 발명에 따른 볼로메타용 산화물 박막은 바나듐에 텅스텐이 첨가된 바나듐 텅스텐 산화물(VW-Ox)로서, 300℃의 저온에서 바나듐-텅스텐 금속박막을 산화시켜 텅스텐 조성변화 및 산화시간 변화에 따라 5∼200㏀의 저항 범위내에서 -1.5 내지 -4.1 %/℃의 다양한 TCR값을 갖는 볼로메타용 산화물의 제조가 가능하다. 또한, 본 발명에 의해 고가의 이온빔 장치없이 저가의 박막증착 장비로 저온에서 재현성 있는 박막의 제조가 가능하다. 본 발명의 결과로 100㏀ 이내의 낮은 저항에서 -3%/℃ 이상의 높은 TCR값을 갖는 볼로메타 물질을 재현성 있게 제조할 수 있으며, 고감도를 갖는 비냉각형 적외선 소자의 제조가 가능하다.
    바나듐, 텅스텐, 볼로메타, 저온 산화법, TCR

    광스위칭 장치의 패키징
    22.
    发明授权
    광스위칭 장치의 패키징 失效
    광스위칭장치의패키징

    公开(公告)号:KR100402992B1

    公开(公告)日:2003-10-23

    申请号:KR1020010066263

    申请日:2001-10-26

    Abstract: PURPOSE: A packaging of an optical switching device is provided to secure a stable operation without influence from the external environment when the optical switching device is packaged. CONSTITUTION: A packaging of an optical switching device includes a lower substrate(10) provided with a driving member(20) for driving the mirror surface of the reflection plate, an upper substrate(50) formed thereon a polymer pattern(40) provided with an insertion path of an optical fiber(60) and provided with a structure(30) at both inner sides of the polymer pattern(40) and an upper substrate(50) coupled to the top surface of the lower substrate(10), wherein the optical fiber(60) is inserted into the insertion path of the optical fiber(60).

    Abstract translation: 目的:提供光开关器件的封装,以确保在光开关器件封装时不受外部环境影响的稳定操作。 本发明的目的在于提供一种光开关装置的组装体,其包括:设置有驱动反射板的镜面的驱动部件(20)的下部基板(10);形成有聚合物图案(40)的上部基板(50) 光纤(60)的插入路径并且在所述聚合物图案(40)的两个内侧处设置有结构(30),并且所述上基板(50)联接到所述下基板(10)的顶表面,其中, 将光纤(60)插入光纤(60)的插入路径中。

    웨이브가이드형 안테나가 결합된 영상 감지소자의제조방법
    23.
    发明授权
    웨이브가이드형 안테나가 결합된 영상 감지소자의제조방법 失效
    웨이브가이드형안테나가결합된영상감지소자의제조방웨

    公开(公告)号:KR100395243B1

    公开(公告)日:2003-08-21

    申请号:KR1020010028894

    申请日:2001-05-25

    Inventor: 문성욱 김근태

    Abstract: PURPOSE: A method for fabricating an image sensing device combined with a waveguide type antenna is provided to combine a cylindrical antenna with a sensing element by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A metal layer(110) is formed on a surface of a semiconductor substrate(100) in order to form a seed layer on the surface of the semiconductor substrate(100). A photoresist layer(120) of predetermined thickness is applied on an upper face of the metal layer(110). The thickness of photoresist layer(120) is about 100 to 200 micro meter. A patterning process is performed using an exposure mask. A photoresist layer pattern is formed by removing partially the photoresist layer(120) from the metal layer(110). A circular pillar of a waveguide type antenna is formed by removing the photoresist layer pattern. A conductive layer(140) is deposited on a whole surface of the above structure by using an electroless plating method. The remaining photoresist pattern is removed. A structure of a waveguide is fabricated by separating the metal layer(110) from the above structure.

    Abstract translation: 目的:提供一种用于制造与波导型天线组合的图像感测装置的方法,以通过使用MEMS(微机电系统)将圆柱形天线与感测元件组合。 构成:在半导体衬底(100)的表面上形成金属层(110),以便在半导体衬底(100)的表面上形成晶种层。 预定厚度的光致抗蚀剂层(120)被施加在金属层(110)的上表面上。 光致抗蚀剂层(120)的厚度约为100至200微米。 使用曝光掩模进行构图工艺。 通过从金属层(110)中部分去除光致抗蚀剂层(120)来形成光致抗蚀剂层图案。 通过去除光刻胶层图案来形成波导型天线的圆柱。 通过使用无电电镀方法在上述结构的整个表面上沉积导电层(140)。 剩余的光致抗蚀剂图案被去除。 通过从上述结构分离金属层(110)来制造波导的结构。

    초저속 경사회전 노광을 이용한 3차원의 미소 구조안테나의 제조방법
    24.
    发明授权
    초저속 경사회전 노광을 이용한 3차원의 미소 구조안테나의 제조방법 失效
    초저속경사회전노광을이용한3차원의미소구조안테나의제조방초

    公开(公告)号:KR100387167B1

    公开(公告)日:2003-06-12

    申请号:KR1020010028897

    申请日:2001-05-25

    Inventor: 문성욱 박종연

    Abstract: PURPOSE: A method for fabricating a three-dimensional micro antenna using ultra low-speed gradient rotary exposure is provided to simplify a fabrication process of a structure of three-dimensional micro antenna and a waveguide by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A sacrificial oxide layer is formed on a semiconductor substrate(100). The first photoresist layer is deposited thereon. The first photoresist layer pattern is formed by using an exposure mask. The first metal layer is deposited thereon. The first photoresist layer pattern is exposed by polishing the first metal layer. A micro structure(110) is formed by removing the sacrificial oxide layer. A polymer layer is deposited on a whole surface of the above structure. The second photoresist layer is deposited thereon. The second photoresist layer pattern is formed by performing a patterning process. A round is formed on a surface of the polymer layer. The second metal layer is deposited thereon. The round of the second metal layer is removed by performing a polishing process. The third metal layer and the third photoresist layer are deposited thereon. The third photoresist layer pattern and the third metal layer pattern are formed by performing the patterning process. The third photoresist layer pattern is removed. A polymer layer pattern is formed. The fourth metal layer(124) is deposited thereon by using an electroless plating method. The third metal layer pattern and the polymer layer pattern are removed from the semiconductor substrate(100) by performing a plasma asher process.

    Abstract translation: 目的:提供一种使用超低速梯度旋转曝光制造三维微型天线的方法,以通过使用MEMS(微机电系统)简化三维微型天线和波导结构的制造过程。 构成:在半导体衬底(100)上形成牺牲氧化物层。 第一光致抗蚀剂层沉积在其上。 通过使用曝光掩模形成第一光致抗蚀剂层图案。 第一金属层沉积在其上。 通过抛光第一金属层来暴露第一光致抗蚀剂层图案。 通过去除牺牲氧化物层形成微结构(110)。 聚合物层沉积在上述结构的整个表面上。 第二光致抗蚀剂层沉积在其上。 通过执行构图工艺形成第二光致抗蚀剂层图案。 圆形形成在聚合物层的表面上。 第二金属层沉积在其上。 通过执行抛光工艺来去除第二金属层的圆形。 第三金属层和第三光致抗蚀剂层沉积在其上。 通过执行构图工艺形成第三光致抗蚀剂层图案和第三金属层图案。 第三光致抗蚀剂层图案被去除。 形成聚合物层图案。 通过使用无电电镀方法在其上沉积第四金属层(124)。 通过执行等离子体灰化工艺从半导体衬底(100)去除第三金属层图案和聚合物层图案。

    인체 등의 매질을 통신선로로 이용한 매질 내외간의 통신방법 및 장치
    25.
    发明公开
    인체 등의 매질을 통신선로로 이용한 매질 내외간의 통신방법 및 장치 有权
    使用中型人体作为通信线的内部和外部媒体之间的通信方法及其设备

    公开(公告)号:KR1020030039759A

    公开(公告)日:2003-05-22

    申请号:KR1020010070802

    申请日:2001-11-14

    CPC classification number: A61B5/0031 H04B13/005

    Abstract: PURPOSE: A device of communicating between internal and external media using a medium like human body as a communication line is provided to locate a transmitter inside of a medium, and to apply an electric signal by the transmitter through the medium, in order to receive the signal, thereby improving a receiving rate of the signal without damaging to the medium. CONSTITUTION: A sensor(2) collects information on human body(1) inside of the human body(1). A transmitter(3) receives an electric signal of the sensor(2), and applies the received signal through the human body(1). A receiver(4) receives the electric signal from the transmitter(3) on the surface of the human body(1). An analyzer(5) analyzes the signal received from the receiver(4). Except the human body(1), materials having high resistance are able to be used as media. Information on the human body(1) includes predetermined image information, sound information, and analyzed results on the media.

    Abstract translation: 目的:提供使用诸如人体之类的媒体作为通信线路的内部和外部介质之间的通信设备,以将发射机定位在介质内部,并通过介质施加电信号,以便接收 信号,从而提高信号的接收速率,而不损坏介质。 构成:传感器(2)收集人体内部人体(1)的信息(1)。 发射机(3)接收传感器(2)的电信号,并通过人体(1)施加接收到的信号。 接收器(4)从人体(1)的表面上的发射器(3)接收电信号。 分析器(5)分析从接收器(4)接收的信号。 除人体(1)以外,具有高阻力的材料可以作为介质。 关于人体(1)的信息包括媒体上的预定图像信息,声音信息和分析结果。

    초저속 경사 회전 노광장치
    26.
    发明公开
    초저속 경사 회전 노광장치 无效
    超低速斜坡旋转曝光装置

    公开(公告)号:KR1020020097425A

    公开(公告)日:2002-12-31

    申请号:KR1020010035359

    申请日:2001-06-21

    Inventor: 문성욱 박종연

    Abstract: PURPOSE: A super low speed slope rotation exposure device is provided to allow the three dimensional micro structure to be made by using the micro electromechanical system by controlling the slope degree, rotation number and rotation time of a chuck. CONSTITUTION: The exposure device comprises a power supply device(10) for supplying the operation power to the exposure device; a lamp cooling device(20) for cooling the parallel light lamp; an optical tube(30) for obtaining the output of the parallel light by the each reflective mirror(32); a chuck(40) for proceeding the exposure process in the sloped state by the super low speed using the parallel light output by the optical tube; a motor(50) for rotating the chuck; a vacuum device(60) for maintaining the chuck to be under vacuum; and a computer(70) for controlling the range of the rotation state of the chuck. The mask is formed on the wafer of the body of the chuck in a body.

    Abstract translation: 目的:提供超低速斜坡旋转曝光装置,通过控制卡盘的斜度,旋转次数和旋转时间,通过使用微机电系统来实现三维微结构。 构成:曝光装置包括用于向曝光装置提供操作电力的电源装置(10) 用于冷却所述平行光灯的灯冷却装置(20); 用于通过每个反射镜(32)获得平行光的输出的光学管(30); 用于使用由光管输出的平行光以超低速度在倾斜状态下进行曝光处理的卡盘(40) 用于旋转卡盘的马达(50); 用于将卡盘保持在真空下的真空装置(60); 以及用于控制卡盘的旋转状态的范围的计算机(70)。 掩模形成在卡盘的主体的晶片上。

    3차원의 혼 안테나가 결합된 영상 감지소자의 제조방법
    27.
    发明公开
    3차원의 혼 안테나가 결합된 영상 감지소자의 제조방법 失效
    用于制作与三维霍尔天线组合的图像感测装置的方法

    公开(公告)号:KR1020020090400A

    公开(公告)日:2002-12-05

    申请号:KR1020010028896

    申请日:2001-05-25

    Inventor: 문성욱 김근태

    CPC classification number: H01L27/146

    Abstract: PURPOSE: A method for fabricating an image sensing device combined with a three-dimensional horn antenna is provided to improve sensitivity of the image sensing device by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A sacrificial oxide layer is formed on a semiconductor substrate(100). A sacrificial oxide layer pattern is formed by performing a patterning process using an etch mask. The first silicon nitride layer(106) is deposited thereon. The first silicon nitride layer pattern is formed by performing the patterning process. A vanadium oxide layer(110) is deposited thereon. A vanadium oxide layer pattern is formed by the patterning process. A conductive layer(114) is deposited thereon. A conductive layer pattern is formed by performing the patterning process. The second silicon nitride layer(118) is deposited thereon. The second silicon nitride pattern is formed by performing the patterning process. The third silicon layer(122) is deposited thereon. A sidewall space is formed by performing the patterning process. The sacrificial oxide layer is removed. A sense device combined with a three-dimensional horn antenna is completed by using an etch mask.

    Abstract translation: 目的:提供一种用于制造与三维喇叭天线结合的图像感测装置的方法,以通过使用MEMS(微机电系统)来提高图像感测装置的灵敏度。 构成:牺牲氧化物层形成在半导体衬底(100)上。 通过使用蚀刻掩模进行图案化处理来形成牺牲氧化物层图案。 第一氮化硅层(106)被沉积在其上。 通过进行图案化工艺形成第一氮化硅层图案。 氧化钒层(110)沉积在其上。 通过图案化工艺形成氧化钒层图案。 导电层(114)沉积在其上。 通过进行图案化工艺形成导电层图案。 第二氮化硅层(118)沉积在其上。 通过进行图案化工艺来形成第二氮化硅图案。 第三硅层(122)沉积在其上。 通过进行图案化工艺形成侧壁空间。 去除牺牲氧化物层。 通过使用蚀刻掩模来完成与三维喇叭天线组合的感测装置。

    가이드를 이용한 3차원 미소구조체의 얼라인방법
    28.
    发明公开
    가이드를 이용한 3차원 미소구조체의 얼라인방법 失效
    用于对准三维微结构使用指南的方法

    公开(公告)号:KR1020020019856A

    公开(公告)日:2002-03-13

    申请号:KR1020000053217

    申请日:2000-09-07

    CPC classification number: B81C3/002 B81C2203/058

    Abstract: PURPOSE: A method for aligning a three-dimensional micro structure is provided to align and combine a three-dimensional micro structure without damage on a three-dimensional pattern by using a guide and to remove the necessity of expensive equipment. CONSTITUTION: An upper and a lower three-dimensional micro structures(10,12) having different patterns(10a,12a) are aligned. Array guides(18) are combined to the four areas of the upper structure. The upper structure and the lower structure are aligned by three-dimensionally lifting down the array guide through an aligning portion(16) formed between an align guide consisting of wall bodies(14a,14b) corresponding to the array guides. Herein, the size of the guide is large enough to be detected by the eyes of a worker. Therefore, the structures are aligned with a low magnification microscope.

    Abstract translation: 目的:提供一种用于对准三维微结构的方法,通过使用引导件对三维微结构进行三维微结构对准和组合而不损坏三维图案,并消除昂贵的设备的必要性。 构成:具有不同图案(10a,12a)的上部和下部三维微结构(10,12)被对准。 阵列引导件(18)组合到上部结构的四个区域。 上部结构和下部结构通过三维地将阵列引导件提升通过形成在对应于阵列引导件的壁体(14a,14b)的对准引导件之间的对准部分(16)而对齐。 这里,引导件的尺寸足够大以被工人的眼睛检测到。 因此,结构与低倍数显微镜对准。

    신호 전송 방법 및 이를 수행하는 통신 장치

    公开(公告)号:KR101883448B1

    公开(公告)日:2018-07-31

    申请号:KR1020160154158

    申请日:2016-11-18

    Abstract: 본발명은제1 통신장치와제2 통신장치를구비하는플러그앤플레이양자암호시스템에서수행되는신호전송방법에있어서, (a) 상기제1 통신장치에서발생된양자신호가서로경로가다른제1 경로와제2 경로로분할되어상기제2 통신장치에전송되되, 경로가긴 제1 경로를통하여제 1 양자신호, 경로가짧은제 2경로를통하여제2 양자신호를전송하는단계; 및 (b) 상기제2 통신장치로부터전송되어오는제1 양자신호와제2 양자신호를수신하고상기제1 경로와상기제2 경로로분할하여, 각제 1-1, 제 1-2 양자신호와제 2-1, 제 2-2 양자신호의도달시간을변경하는단계를포함하되, 상기양자신호들중 최단경로를통과한제 2-2 양자신호를최장경로를통과한제 1-1 양자신호와간섭이발생하도록도달시간을지연시킨다.

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