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    RADIATION SOURCE
    25.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013041323A1

    公开(公告)日：2013-03-28

    申请号：PCT/EP2012/066449

    申请日：2012-08-23

    Applicant: ASML Netherlands B.V. ,  VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    Inventor： VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

    Abstract translation: 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件在等离子体形成位置处的燃料流处引导第一激光辐射束（100）以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴被引向燃料流。

    MIRROR, RADIATION SOURCE - COLLECTOR AND LITHOGRAPHIC APPARATUS
    26.
    发明申请
    MIRROR, RADIATION SOURCE - COLLECTOR AND LITHOGRAPHIC APPARATUS 审中-公开
    镜子，辐射源 - 收集器和光刻设备

    公开(公告)号：WO2012136420A1

    公开(公告)日：2012-10-11

    申请号：PCT/EP2012/053534

    申请日：2012-03-01

    Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim ,  WAGNER, Christian ,  SINGH, Harmeet

    Inventor： BANINE, Vadim ,  WAGNER, Christian ,  SINGH, Harmeet

    IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

    CPC classification number: G03F7/708 ,  B82Y10/00 ,  G02B5/0825 ,  G02B5/0891 ,  G03F7/70958 ,  G21K1/062

    Abstract: A mirror for reflection of EUV radiation having a wavelength from 5 to 20nm has a multilayer stack of pairs of alternating layers materials having different refractive indices with a protective region is disposed on the stack, the protective region having from 1 to 5 pairs of alternating layers of materials of differing refractive indices disposed on the multilayer stack, so that alternation of magnitude of refractive index continues from the multilayer stack through the protective region. The mirror is arranged so that radiation for reflection is incident upon the protective region before being incident upon the multilayer stack. The materials of the protective region are selected to have a high resistance to blister formation when subjected to bombardment by hydrogen atoms or ions, for instance from an EUV plasma source, in use. For instance, the multilayer stack may be of silicon/molybdenum, with the protective region of silicon nitride/molybdenum. The protective region acts to prevent hydrogen atoms or ions penetrating into and blistering the mirror, but without resulting in excessive losses in the reflectivity of the mirror. The mirror is particularly useful as a collector mirror such as a normal incidence collector for laser produced plasma EUV sources and is useful for device lithography and in lithography apparatus.

    Abstract translation: 用于反射具有5至20nm的波长的EUV辐射的反射镜具有在堆叠上设置具有不同折射率的具有不同折射率的交替层材料对的多层堆叠，所述保护区域具有1至5对交替层 的折射率不同的材料设置在多层堆叠上，使得折射率的大小的变化从多层堆叠继续通过保护区域。 反射镜被布置成使得用于反射的辐射在入射到多层堆叠之前入射到保护区域上。 选择保护区域的材料，以在使用时由氢原子或离子（例如来自EUV等离子体源）进行轰击时具有高的起泡形成能力。 例如，多层堆叠可以是具有氮化硅/钼的保护区域的硅/钼。 保护区域用于防止氢原子或离子渗入和起泡反射镜，但不会导致反射镜的反射率过度损失。 该反射镜特别适用于诸如用于激光产生的等离子体EUV源的正入射收集器的集电镜，并且可用于器件光刻和光刻设备。

    SPECTRAL PURITY FILTER
    29.
    发明申请
    SPECTRAL PURITY FILTER 审中-公开
    光谱滤光片

    公开(公告)号：WO2011134692A1

    公开(公告)日：2011-11-03

    申请号：PCT/EP2011/052573

    申请日：2011-02-22

    Applicant: ASML NETHERLANDS B.V. ,  SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

    Inventor： SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

    IPC: G03F7/20 ,  G02B5/20

    CPC classification number: G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

    Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

    Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃。

    OBJECT INSPECTION SYSTEMS AND METHODS
    30.
    发明申请
    OBJECT INSPECTION SYSTEMS AND METHODS 审中-公开
    对象检查系统和方法

    公开(公告)号：WO2011015412A1

    公开(公告)日：2011-02-10

    申请号：PCT/EP2010/059460

    申请日：2010-07-02

    Applicant: ASML Netherlands B.V. ,  IVANOV, Vitalii ,  DEN BOEF, Arie ,  BANINE, Vadim ,  SCACCABAROZZI, Luigi ,  IOSAD, Nikolay

    Inventor： IVANOV, Vitalii ,  DEN BOEF, Arie ,  BANINE, Vadim ,  SCACCABAROZZI, Luigi ,  IOSAD, Nikolay

    IPC: G03F1/00 ,  G03F1/14 ,  G01N21/64 ,  G01N21/95

    CPC classification number: G03F1/84 ,  G01N21/6408 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G03F1/24

    Abstract: Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.

    Abstract translation: 用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。 可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。 待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。 所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

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